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US4547395A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for the photochemical vapor deposition of hetero-linked polymers

Assignee: Raytheon Co
•
Filing: 1984-11-26
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Granted: 1985-10-15
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Expires: 2004-11-26
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Abstract

Abstract A low temperature photochemical vapor deposition process for the deposition of a layer of a chosen polymer on the surface of a substrate. The polymer comprises repeating hydrocarbon units linked through oxygen, nitrogen, or sulfur atoms and is formed by reacting a vapor phase monomer precursor containing the hydrocarbon units and a vapor phase precursor containing the oxygen, nitrogen, or sulfur under radiation inducement. The low temperature of the process avoids thermal damage to the substrate. Specifically disclosed polymers are polyphenylether and polyxyleneamine, which are useful, respectively, as insulator or passivation layers in semiconductor devices and circuits, and as adhesives.

Inventors

  • 👤 James T. Hall
  • 👤 Richard N. Leyden

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 14:31
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/68; H10P14/683; B; B05; B05D; B05D1/00; B05D1/60; C; C08; C08G; C08G75/00; C08G75/02; C08G75/0204; C08G75/025; C08G75/0272; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6338; B05D3/00; B05D3/06

Claims Analysis

Total Claims: 15
Claim 1
Independent Claim 103 words
Process for forming on the surface of a substrate a layer of a chosen organic polymer comprising repeating hydrocarbon units joined through an element selected from the group consisting of oxygen, nitrogen and sulfur, comprising exposing said substrate to a first vapor phase reactant comprising the monomer precursor of said repeating hydrocarbon units and a second vapor phase reactant comprising the precursor of said oxygen, nitrogen, or sulfur in the presence of radiation of a predetermined wavelength to bring about the reaction between said first and second vapor phase reactants to form said chosen polymer which deposits on said surface of said substrate.
Claim 2
Dependent Claim 103 words
Process for forming on the surface of a substrate a layer of a chosen organic polymer comprising repeating hydrocarbon units joined through an element selected from the group consisting of oxygen, nitrogen and sulfur, comprising exposing said substrate to a first vapor phase reactant comprising the monomer precursor of said repeating hydrocarbon units and a second vapor phase reactant comprising the precursor of said oxygen, nitrogen, or sulfur in the presence of radiation of a predetermined wavelength to bring about the reaction between said first and second vapor phase reactants to form said chosen polymer which deposits on said surface of said substrate.
Claim 3
Dependent Claim 35 words
The process as set forth in claim 1 wherein: (a) said exposing occurs in the presence of mercury vapor as a photosensitizer; and (b) said radiation is provided by a low pressure mercury vapor lamp.
Claim 4
Dependent Claim 34 words
The process as set forth in claim 1 wherein the relative proportions of said first and second vapor phase reactants are controlled to thereby produce said polymer comprising a predetermined proportion of said element.
Claim 5
Dependent Claim 26 words
The process set forth in claim 1 wherein said precursor of oxygen is selected from the group consisting of nitrous oxide, nitrogen dioxide, and molecular oxygen.
Claim 6
Dependent Claim 26 words
The process set forth in claim 1 wherein said precursor of nitrogen is selected from the group consisting of ammonia, hydrazine, and a primary alkyl amine.
Claim 7
Dependent Claim 30 words
The process set forth in claim 1 wherein said precursor of sulfur is selected from the group consisting of carbonyl sulfide, hydrogen sulfide, dialkyl sulfide, carbon disulfide, and methyl mercaptan.
Claim 8
Dependent Claim 31 words
The process set forth in claim 1 wherein said monomer precursor is selected from the group consisting of an aliphatic olefin, an aromatic, an alkyl aromatic, and a halogenated aromatic compound.
Claim 9
Dependent Claim 12 words
The process set forth in claim 7 wherein said monomer is bromobenzene.
Claim 10
Dependent Claim 12 words
The process set forth in claim 7 wherein said monomer is iodobenzene.
Claim 11
Dependent Claim 12 words
The process set forth in claim 7 wherein said monomer is m-xylene.
Claim 12
Dependent Claim 12 words
The process set forth in claim 7 wherein said monomer is isoprene.
Claim 13
Dependent Claim 48 words
The process set forth in claim 7 wherein: (a) said monomer precursor is bromobenzene; (b) said precursor of oxygen is molecular oxygen; (c) said exposing occurs in the presence of mercury vapors; (d) said predetermined wavelength of radiation is 2537 angstroms; and (e) said polymer comprises polyphenylether. PG,26
Claim 14
Dependent Claim 37 words
The process set forth in claim 7 wherein: (a) said monomer precursor is iodobenzene; (b) said precursor of oxygen is molecular oxygen; (c) said predetermined wavelength of radiation is 1849 angstroms; and (d) said polymer comprises polyphenylether.
Claim 15
Dependent Claim 36 words
The process set forth in claim 5 wherein: (a) said monomer precursor is m-xylene; (b) said precursor of nitrogen is ammonia; (c) said predetermined wavelength of radiation is 1849 angstroms; and (d) said polymer comprises polyxyleneamine.

References Cited (Backward Citations)

US3238113A Cited
US3264202A Cited
US3518111A Cited
US3619259A Cited
US3686022A Cited
US3959101A Cited
US4363829A Cited
US4330570A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-10-14 1989-04-15 1989-10-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-10-14 1993-04-15 1993-10-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-10-14 1997-04-15 1997-10-15 $7700.00 Window Closed / Lapsed

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