US4542009A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Synthesis of intercalatable layered stable transition metal chalcogenides and alkali metal-transition metal chalcogenides
Assignee: Combustion Engineering Inc
•
Filing: 1983-04-21
•
Granted: 1985-09-17
•
Expires: 2003-04-21
Abstract
Abstract Intercalatable layered or lamellar stable transition metal chalcogenides, such as CrS 2 , usable as cathode active materials and intercalatable layered or lamellar stable alkali metal-transition metal chalcogenides, such as LiCrS 2 , usable as cathode active materials as well as anode active materials are synthesized by ion implantation and annealing techniques.
Inventors
- 👤 David N. Palmer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 23:23
CPC Classifications
H; H01; H01M; H01M4/00; H01M4/02; H01M4/36; H01M4/58; H01M4/581; H01M4/5815; C; C01; C01G; C01G1/00; C01G1/12; C01G23/00; C01G23/007; C01G25/00; C01G31/00; C01G33/00; C01G37/00; C01G37/006; C01G49/00; C01G49/12; C01P; C01P2002/00; C01P2002/20; C01P2004/00; C01P2004/80; H01M10/00; H01M10/05; H01M10/052; H01M10/0525; Y; Y02; Y02E; Y02E60/00; Y02E60/10
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
138 words
A process for treating the surface of a transition metal substrate to form into the surface an intercalatable layered stable transition metal chalcogenide having the general formula MX n where M is a transition metal selected from the group consisting of Ti, V, Cr, Fe, Zr and Nb; X is sulfur; and n is 2-3; which comprises: ion implanting sulfur at an implantation energy in the range of about 150-200 kiloelectron volts and at a saturation dosage of about 10 18 sulfur atoms/cm 2 into the suface of the transition metal substrate to a depth of about 1300-2200Å; and annealing the sulfur-implanted substrate under a vacuum of from about 1×10 -5 torr to about 1×10 -6 torr at a temperature of from about 100° C. to about 300° C. for form about 8 hours to about 48 hours.
Claim 2
Dependent Claim
138 words
A process for treating the surface of a transition metal substrate to form into the surface an intercalatable layered stable transition metal chalcogenide having the general formula MX n where M is a transition metal selected from the group consisting of Ti, V, Cr, Fe, Zr and Nb; X is sulfur; and n is 2-3; which comprises: ion implanting sulfur at an implantation energy in the range of about 150-200 kiloelectron volts and at a saturation dosage of about 10 18 sulfur atoms/cm 2 into the suface of the transition metal substrate to a depth of about 1300-2200Å; and annealing the sulfur-implanted substrate under a vacuum of from about 1×10 -5 torr to about 1×10 -6 torr at a temperature of from about 100° C. to about 300° C. for form about 8 hours to about 48 hours.
Claim 3
Dependent Claim
17 words
The process according to claim 1 wherein M is Ti, X is S and n is 2.
Claim 4
Dependent Claim
17 words
The process according to claim 1 wherein M is V, X is S and n is 2.
Claim 5
Dependent Claim
17 words
The process according to claim 1 wherein M is Cr, X is S and n is 2.
Claim 6
Dependent Claim
17 words
The process according to claim 1 wherein M is Fe, X is S and n is 2.
Claim 7
Dependent Claim
17 words
The process according to claim 1 wherein M is Zr, X is S and n is 2.
Claim 8
Dependent Claim
17 words
The process according to claim 1 wherein M is Nb, X is S and n is 2.
Claim 9
Dependent Claim
244 words
The process for treating the surface of a transition metal substrate to form into the surface an intercalatable layered stable alkali metal-transition metal chalcogenide having the general formula A m MX n where A is an alkali metal selected from the group consisting of lithium, sodium and potassium; M is a transition metal selected from the group consisting of Ti, V, Cr, Fe, Zr and Nb; X is sulfur; m is 1-4; and n is 2-3; which comprises: ion implanting sulfur at an implantation energy in the range of about 150-200 kiloelectron volts and at a saturation dosage of about 10 18 sulfur atoms/cm 2 into the surface of the transition metal substrate to a depth of about 1300-2200Å; annealing the sulfur-implanted substrate under a vacuum of from about 1×10 -5 torr to about 1×10 -6 torr at a temperature of from about 100° C. to about 300° C. for from about 8 hours to about 48 hours; ion implanting the alkali metal at an implantation energy in the range of about 150-200 kiloelectron volts and at a saturation dosage of about 10 18 alkali metal atoms/cm 2 into the surface of the annealed sulfur-implanted substrate to a depth of about 1300-2200 Å; and annealing the alkali metal-implanted substrate under a vacuum of from about 1×10 -5 torr to about 1×10 -6 torr at a temperature of from about 80° C. to about 150° C. for from about 8 hours to about 48 hours.
Claim 10
Dependent Claim
244 words
The process for treating the surface of a transition metal substrate to form into the surface an intercalatable layered stable alkali metal-transition metal chalcogenide having the general formula A m MX n where A is an alkali metal selected from the group consisting of lithium, sodium and potassium; M is a transition metal selected from the group consisting of Ti, V, Cr, Fe, Zr and Nb; X is sulfur; m is 1-4; and n is 2-3; which comprises: ion implanting sulfur at an implantation energy in the range of about 150-200 kiloelectron volts and at a saturation dosage of about 10 18 sulfur atoms/cm 2 into the surface of the transition metal substrate to a depth of about 1300-2200Å; annealing the sulfur-implanted substrate under a vacuum of from about 1×10 -5 torr to about 1×10 -6 torr at a temperature of from about 100° C. to about 300° C. for from about 8 hours to about 48 hours; ion implanting the alkali metal at an implantation energy in the range of about 150-200 kiloelectron volts and at a saturation dosage of about 10 18 alkali metal atoms/cm 2 into the surface of the annealed sulfur-implanted substrate to a depth of about 1300-2200 Å; and annealing the alkali metal-implanted substrate under a vacuum of from about 1×10 -5 torr to about 1×10 -6 torr at a temperature of from about 80° C. to about 150° C. for from about 8 hours to about 48 hours.
Claim 11
Dependent Claim
23 words
The process according to claim 8 wherein A is Li, M is Cr, X is S, m is 1 and n is 2.
References Cited (Backward Citations)
US3622382A
Cited
US3666548A
Cited
GB1413813A
Cited
US4016389A
Cited
US4009052A
Cited
US4084046A
Cited
US4040917A
Cited
US4299892A
Cited
US4105443A
Cited
US4338190A
Cited
US4049887A
Cited
JPS53128727A
Cited
US4126732A
Cited
US4206276A
Cited
US4433305A
Cited
US4405695A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-09-16 | 1989-03-18 | 1989-09-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-09-16 | 1993-03-18 | 1993-09-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-09-16 | 1997-03-18 | 1997-09-17 | $7700.00 | Window Closed / Lapsed |