Patent US4542004A successfully refreshed from Google Patents.
US4542004A
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Process for the hydrogenation of silicon tetrachloride
Assignee: SOLAVOLT INTERNATIONAL A PARTNERSHIP OF TX
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Filing: 1984-03-28
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Granted: 1985-09-17
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Expires: 2004-03-28
Abstract
Abstract An improved process is disclosed for the high pressure plasma hydrogenation of silicon tetrachloride. Hydrogen and silicon tetrachloride are reacted in the presence of a high pressure plasma and further in the presence of a boron catalyst to form trichlorosilane and dichlorosilane. By adding the boron catalyst the overall conversion efficiency is increased and the dichlorosilane content in the reaction effluent is increased.
Inventors
- 👤 Kalluri R. Sarma
- 👤 Charles S. Chanley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:23
CPC Classifications
C; C01; C01B; C01B33/00; C01B33/08; C01B33/107; C01B33/1071; Y; Y10; Y10S; Y10S423/00; Y10S423/09; Y10S423/10
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
37 words
An improved process for the hydrogenation of SiCl 4 by the reaction of hydrogen and silicon tetrachloride in the presence of a high pressure plasma wherein the improvement comprises: adding a catalyst comprising boron to said reaction.
Claim 2
Dependent Claim
37 words
An improved process for the hydrogenation of SiCl 4 by the reaction of hydrogen and silicon tetrachloride in the presence of a high pressure plasma wherein the improvement comprises: adding a catalyst comprising boron to said reaction.
Claim 3
Dependent Claim
42 words
An improved process for the production of SiH 2 Cl 2 from SiCl 4 which comprises the steps of: reacting SiCl 4 and H 2 in the presence of a high pressure plasma and further in the presence of a boron catalyst.
Claim 4
Dependent Claim
42 words
An improved process for the production of SiH 2 Cl 2 from SiCl 4 which comprises the steps of: reacting SiCl 4 and H 2 in the presence of a high pressure plasma and further in the presence of a boron catalyst.
Claim 5
Dependent Claim
31 words
The improved process of claim 2 wherein said SiCl 4 and H 2 are present in said step of reacting in a ratio H 2 /SiCl 4 greater than about 6.
Claim 6
Dependent Claim
40 words
An improved process for the hydrogenation of SiCl 4 by the reaction of hydrogen and silicon tetrachloride in the presence of a high pressure plasma wherein the improvement comprises: adding a catalyst comprising B 2 H 6 to said reaction.
Claim 7
Dependent Claim
40 words
An improved process for the hydrogenation of SiCl 4 by the reaction of hydrogen and silicon tetrachloride in the presence of a high pressure plasma wherein the improvement comprises: adding a catalyst comprising B 2 H 6 to said reaction.
Claim 8
Dependent Claim
24 words
The improved process of claim 4 wherein said B 2 H 6 is added in an amount between about 0.1 ppm and 35 ppm.
Claim 9
Dependent Claim
38 words
An improved process for the hydrogenation of SiCl 4 by the reaction of hydrogen and silicon tetrachloride in the presence of a high pressure plasma wherein the improvement comprises: adding a catalyst comprising BCl 3 to said reaction.
Claim 10
Dependent Claim
38 words
An improved process for the hydrogenation of SiCl 4 by the reaction of hydrogen and silicon tetrachloride in the presence of a high pressure plasma wherein the improvement comprises: adding a catalyst comprising BCl 3 to said reaction.
Claim 11
Dependent Claim
58 words
An improved process for the production of SiH 2 Cl 2 from SiCl 4 which comprises the steps of: reacting SiCl 4 and H 2 in the presence of a high pressure plasma in a ratio of H 2 /SiCl 4 greater than about 6 further in the presence of a catalyst comprising B 2 H 6 .
Claim 12
Dependent Claim
58 words
An improved process for the production of SiH 2 Cl 2 from SiCl 4 which comprises the steps of: reacting SiCl 4 and H 2 in the presence of a high pressure plasma in a ratio of H 2 /SiCl 4 greater than about 6 further in the presence of a catalyst comprising B 2 H 6 .
Claim 13
Dependent Claim
23 words
The improved process of claim 7 wherein said B 2 H 2 is present in an amount between 0.1 ppm and 35 ppm.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-09-16 | 1989-03-18 | 1989-09-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-09-16 | 1993-03-18 | 1993-09-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-09-16 | 1997-03-18 | 1997-09-17 | $7700.00 | Window Closed / Lapsed |