← Back to Patent Explorer
US4539250A Expired / Lapsed US ⏱️ 0.0 years remaining

Resist material and process for forming fine resist pattern

Assignee: Daikin Industries Ltd
•
Filing: 1982-12-17
•
Granted: 1985-09-03
•
Expires: 2002-12-17
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R 1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an α-cyanoacrylate.

Inventors

  • 👤 Tsuneo Fujii
  • 👤 Hiroshi Inukai
  • 👤 Takayuki Deguchi
  • 👤 Toshihiko Amano
  • 👤 Masami Kakuchi
  • 👤 Hiroshi Asakawa
  • 👤 Osamu Kogure

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 14:00
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/24826

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 185 words
A resist material coated on a substrate, wherein portions of the material are irradiated and developed to form a pattern, which comprises a copolymer of a fluoroalkyl acrylate having the general formula (I): ##STR8## wherein R 1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, and an acrylic comonomer selected from the group consisting of a glycidyl acrylate having the general formula (II): ##STR9## wherein R 3 is hydrogen atom, methyl group or ethyl group, an acrylic acid having the general formula (III): ##STR10## wherein R 3 is as defined above, an acrylamide having the general formula (IV): ##STR11## wherein R 3 is as defined above, and an α-cyanoacrylate having the general formula (V): ##STR12## wherein R 4 is hydrogen atom or alkyl group having 1 to 5 carbon atoms and wherein the ratio of the fluoroalkyl acrylate (I) to the acrylic comonomer is from 60:40 to 99.9:0.1 by mole.
Claim 2
Dependent Claim 185 words
A resist material coated on a substrate, wherein portions of the material are irradiated and developed to form a pattern, which comprises a copolymer of a fluoroalkyl acrylate having the general formula (I): ##STR8## wherein R 1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, and an acrylic comonomer selected from the group consisting of a glycidyl acrylate having the general formula (II): ##STR9## wherein R 3 is hydrogen atom, methyl group or ethyl group, an acrylic acid having the general formula (III): ##STR10## wherein R 3 is as defined above, an acrylamide having the general formula (IV): ##STR11## wherein R 3 is as defined above, and an α-cyanoacrylate having the general formula (V): ##STR12## wherein R 4 is hydrogen atom or alkyl group having 1 to 5 carbon atoms and wherein the ratio of the fluoroalkyl acrylate (I) to the acrylic comonomer is from 60:40 to 99.9:0.1 by mole.
Claim 3
Dependent Claim 25 words
The resist material of claim 1, wherein the ratio of the fluoroalkyl acrylate (I) to the acrylic comonomer is from 80:20 to 99.9:0.1 by mole.
Claim 4
Dependent Claim 19 words
The resist material of claim 1, wherein said copolymer has a weight average molecular weight of 10,000 to 20,000,000.
Claim 5
Dependent Claim 19 words
The resist material of claim 1, wherein said copolymer has a weight average molecular weight of 50,000 to 10,000,000.

References Cited (Backward Citations)

US2834763A Cited
US3235421A Cited
US3637614A Cited
US4125672A Cited
US4147851A Cited
EP0016679A1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-09-02 1989-03-04 1989-09-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-09-02 1993-03-04 1993-09-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-09-02 1997-03-04 1997-09-03 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag