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US4536642A Expired / Lapsed US ⏱️ 0.0 years remaining

Device for treating gases at high temperatures

Assignee: Wacker Chemie AG
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Filing: 1983-07-13
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Granted: 1985-08-20
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Expires: 2003-07-13
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Abstract

Abstract A device is provided for treating gases or mixtures of gases at high temptures, such as, for example, for the reaction, known as tetraconversion, of silicon tetrachloride with hydrogen to form trichlorosilane. The device has a heat-insulated housing having gas-inlet and gas-outlet openings and a plurality of resistance heaters disposed in the housing that are directly electrically heated and around or through which the gases to be treated flow. According to a preferred embodiment, the device is also provided with an integrated heat-exchanger unit.

Inventors

  • 👤 Helmut Hamster
  • 👤 Franz Koppl

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 11:36
CPC Classifications
C; C01; C01B; C01B33/00; C01B33/08; C01B33/107; C01B33/1071; B; B01; B01J; B01J12/00; B01J12/005; B01J2219/00; B01J2219/00049; B01J2219/00051; B01J2219/00074; B01J2219/00076; B01J2219/00081; B01J2219/00132; B01J2219/00135; B01J2219/0015; B01J2219/00155

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 164 words
A device for treating silicon-containing gases at high temperatures, comprising: a heat-insulated, generally hollow housing having a top wall, a sidewall, and a bottom plate defining a reaction chamber and gas-inlet and gas-outlet openings respectively leading into and from said housing; and a plurality of inert resistance heaters which are heatable by the direct passage of an electric current therethrough and which are arranged in a standing, generally upright manner in said housing spaced from said top wall and bottom plate thereof such that they are arranged between said top wall and bottom plate in the general path of gases flowing between said openings so as to have direct contact therewith said gases, said standing resistance heaters terminating at their upper ends in an electrically conductive interconnection and each having at its lower end a separate lead leaving said housing through separate insulated openings in said bottom plate and terminating outside said reaction chamber and being star-connected in a balanced multiple-phase alternating current system.
Claim 2
Independent Claim 164 words
A device for treating silicon-containing gases at high temperatures, comprising: a heat-insulated, generally hollow housing having a top wall, a sidewall, and a bottom plate defining a reaction chamber and gas-inlet and gas-outlet openings respectively leading into and from said housing; and a plurality of inert resistance heaters which are heatable by the direct passage of an electric current therethrough and which are arranged in a standing, generally upright manner in said housing spaced from said top wall and bottom plate thereof such that they are arranged between said top wall and bottom plate in the general path of gases flowing between said openings so as to have direct contact therewith said gases, said standing resistance heaters terminating at their upper ends in an electrically conductive interconnection and each having at its lower end a separate lead leaving said housing through separate insulated openings in said bottom plate and terminating outside said reaction chamber and being star-connected in a balanced multiple-phase alternating current system.
Claim 3
Dependent Claim 50 words
The device according to claim 1, additionally including a pair of outer, concentric, forced-flow graphite cylinders which are arranged one inside the other and an inner concentric immersion tube which serves as the gas outlet opening which are disposed in said housing and between which said resistance heaters are arranged.
Claim 4
Dependent Claim 30 words
The device according to claim 1, additionally including a heat-exchanger unit comprising electrically-unheated gas conduits which are installed in said housing between said inert resistance heaters and said gas-outlet openings.

References Cited (Backward Citations)

DE574942C Cited
US2145084A Cited
DE1081426B Cited
US3497674A Cited
US3541304A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-08-19 1989-02-18 1989-08-20 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-08-19 1993-02-18 1993-08-20 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-08-19 1997-02-18 1997-08-20 $7700.00 Window Closed / Lapsed

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