Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone
Abstract
Abstract The photosensitive composition suitable as a posi-posi photosensitive composition for photosensitive lithographic printing plates is composed of a high molecular compound shown by following general formula I or II and an o-naphthoquinonediazide compound; <IMAGE> I <IMAGE> II wherein R1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms and R2 and R3 each is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. When the photosensitive composition is used as a photosensitive layer of a photosensitive lithographic printing plate and the plate is developed by rubbing with a sponge containing a developer, the photosensitive composition at the exposed areas is completely removed leaving no patches of the composition.
Inventors
- 👤 Akira Nagashima
- 👤 Akira Hasegawa
- 👤 Toshiaki Aoai
- 👤 Teruo Nagano
Bibliographic Details
Claims Analysis
Total Claims: 8References Cited (Backward Citations)
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