Optimum surface contour for conductive heat transfer with a thin flexible workpiece

Claim 2

Apparatus for removal of heat from a planar article under irradiation by a radiation source, said apparatus comprising: heat sink means for removal of heat transferred thereto from said article, said heat sink means including a nonplanar, nonspherical convex contact surface; and clamping means for securing a peripheral portion of said planar article to said contact surface such that said article conforms to said contact surface, said contact surface having a contour which cooperates with said clamping means to impose uniformity of contact pressure over the surface area of said article in contact with said contact surface and to stress said article to approach the limiting elastic stress thereof.

Claim 3

The apparatus of claim 1 wherein said article is a disc of radius r o and thickness t, said peripheral portion comprises a narrow continuous region at the periphery of said disc, and said contour has the general mathematical form ##EQU7## where α and β are constants, y max is the maximum deflection of the disc and y is the elevation of said contour from the radial plane at the radial coordinate r.

Claim 4

The apparatus as defined in claim 2 wherein said disc comprises a semiconductor wafer.

Claim 5

The apparatus of claim 2 wherein said clamping means cooperates with said contact surface to produce a tensile stress component at the outer convex surface of said disc which approaches the elastic limit.

Claim 6

The apparatus of claim 4 wherein the quantity α is given by ##EQU8## and the quantity β is given by ##EQU9## where ν is Poisson's ratio for said planar article.

Claim 7

Apparatus for transfer of thermal energy with a thin, flexible workpiece in vacuum comprising: a thermally conductive member for transfer of thermal energy to or from said workpiece, said member including a nonplanar, nonspherical contact surface; and clamping means for securing a peripheral portion of said workpiece to said contact surface such that said workpiece conforms to said contact surface, said contact surface having a contour which is selected to cooperate with said clamping means to impose uniformity of contact pressure over the surface area of said workpiece in contact with said contact surface and to stress said workpiece to approach the limiting elastic stress thereof, the selection of said contour being based on the geometry and material of said workpiece and the forces imposed upon said workpiece by said clamping means.

Claim 8

Apparatus for transfer of thermal energy with a thin, flexible workpiece in vacuum comprising: a thermally conductive member for transfer of thermal energy to or from said workpiece, said member including a nonplanar, nonspherical contact surface; and clamping means for securing a peripheral portion of said workpiece to said contact surface such that said workpiece conforms to said contact surface, said contact surface having a contour which is selected to cooperate with said clamping means to impose uniformity of contact pressure over the surface area of said workpiece in contact with said contact surface and to stress said workpiece to approach the limiting elastic stress thereof, the selection of said contour being based on the geometry and material of said workpiece and the forces imposed upon said workpiece by said clamping means.

Claim 9

The apparatus of claim 6 wherein said clamping means cooperates with said contact surface to produce a tensile stress component at the outer surface of said workpiece which approaches the elastic limit.

Claim 10

The apparatus of claim 6 wherein said workpiece is a disc of radius r o , said peripheral portion comprises a narrow continuous region at the periphery of said disc, and said contour has the general mathematical form ##EQU10## where α and β are constants, y max is the maximum deflection of the disc and y is the elevation of said contour from the radial plane at the radial coordinate r.

Claim 11

The apparatus as defined in claim 8 wherein said disc comprises a semiconductor wafer.

Claim 12

The apparatus as defined in claim 9 further including an ion source and means for directing an ion beam from said ion source to said semiconductor wafer and a vacuum chamber enclosing said ion source, said means for directing an ion beam, said thermally conductive member and said clamping means, said thermally conductive member comprising a heat sink for removal of heat from said semiconductor wafer during irradiation by said ion beam.