US4532427A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for performing deep UV photolithography
Assignee: Fusion Systems Corp
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Filing: 1982-03-29
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Granted: 1985-07-30
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Expires: 2002-03-29
Abstract
Abstract A method and apparatus for performing deep UV photolithography which utilizes a microwave generated electrodeless light source for producing deep UV radiation. This results in faster semiconductor exposure times and less system downtime for changing failed bulbs as well as other advantages which are detailed herein.
Inventors
- 👤 John C. Matthews
- 👤 Michael G. Ury
- 👤 Charles H. Wood
- 👤 Marshal Greenblatt
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 01:24
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70008; H; H01; H01J; H01J65/00; H01J65/04; H01J65/042; H01J65/044
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
172 words
An apparatus for performing deep UV photolithography in which deep UV radiation is emitted from a light source at brightness levels which are sufficient to provide exposure of a deep UV photoresist at an exposure plane at substantially faster exposure times than have been afforded with deep UV arc lamp photolithography systems, and wherein said light source at said high deep UV brightness levels has a relatively long lifetime and requires replacement at only relatively infrequent intervals, comprising, microwave generated electrodeless light source means for emitting said deep UV radiation, wherein said light source means comprises, (a) an envelope containing a plasma forming medium, (b) microwave energy generating means for generating power at microwave frequencies, (c) means for coupling said generated microwave power to said envelope at power densities of at least 250 (watts/cc), and optical imaging means for imaging the bright deep UV radiation which is provided by said electrodeless light source at said exposure plane, for rapidly exposing a deep UV photoresist-coated substrate which may be disposed at said plane.
Claim 2
Independent Claim
172 words
An apparatus for performing deep UV photolithography in which deep UV radiation is emitted from a light source at brightness levels which are sufficient to provide exposure of a deep UV photoresist at an exposure plane at substantially faster exposure times than have been afforded with deep UV arc lamp photolithography systems, and wherein said light source at said high deep UV brightness levels has a relatively long lifetime and requires replacement at only relatively infrequent intervals, comprising, microwave generated electrodeless light source means for emitting said deep UV radiation, wherein said light source means comprises, (a) an envelope containing a plasma forming medium, (b) microwave energy generating means for generating power at microwave frequencies, (c) means for coupling said generated microwave power to said envelope at power densities of at least 250 (watts/cc), and optical imaging means for imaging the bright deep UV radiation which is provided by said electrodeless light source at said exposure plane, for rapidly exposing a deep UV photoresist-coated substrate which may be disposed at said plane.
Claim 3
Dependent Claim
44 words
The apparatus of claim 1 wherein said microwave generated electrodeless light source means further includes a gaseous coupling medium between said microwave energy generating means and said envelope and wherein said means for coupling effects transfer of microwave energy through said gaseous coupling medium.
Claim 4
Dependent Claim
35 words
The apparatus of claim 1 further including, means for collimating the radiation provided by said source means, and means for controllably interrupting the radiation emitted by said source means to define a desired dose thereof.
Claim 5
Dependent Claim
23 words
The apparatus of claim 1 or 2 wherein said light source means further comprises a microwave chamber in which said envelope is disposed.
Claim 6
Dependent Claim
17 words
The apparatus of claim 4 wherein both said envelope and said microwave chamber are spherical in shape.
Claim 7
Dependent Claim
87 words
A microwave generated electrodeless light source for emitting radiation at relatively high brightness levels, comprising, a microwave chamber including a portion which does not allow microwaves to escape but which is relatively transmissive to said emitted radiation, a plasma-forming medium containing envelope disposed in said chamber, microwave energy generating means for generating power at microwave frequencies, and means for coupling said generated microwave power to said envelope in said chamber at power densities of at least 250(watts/cc), whereby said relatively bright radiation is emitted by said source.
Claim 8
Dependent Claim
87 words
A microwave generated electrodeless light source for emitting radiation at relatively high brightness levels, comprising, a microwave chamber including a portion which does not allow microwaves to escape but which is relatively transmissive to said emitted radiation, a plasma-forming medium containing envelope disposed in said chamber, microwave energy generating means for generating power at microwave frequencies, and means for coupling said generated microwave power to said envelope in said chamber at power densities of at least 250(watts/cc), whereby said relatively bright radiation is emitted by said source.
Claim 9
Dependent Claim
42 words
The microwave generated electrodeless light source of claim 6 wherein there is a gaseous coupling medium between said microwave energy generating means and said envelope, and wherein said means for coupling effects transfer of microwave energy solely through said gaseous coupling medium.
References Cited (Backward Citations)
US3518083A
Cited
US3596083A
Cited
US3695758A
Cited
US3872349A
Cited
US3860335A
Cited
US3943403A
Cited
US3993927A
Cited
US4042850A
Cited
US4041352A
Cited
JPS55102169A
Cited
US4215935A
Cited
US4485332A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-07-29 | 1989-01-28 | 1989-07-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-07-29 | 1993-01-28 | 1993-07-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-07-29 | 1997-01-28 | 1997-07-30 | $7700.00 | Window Closed / Lapsed |