US3695758A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Illumination device for projector type ic printer
Assignee: Nikon Corp
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Filing: 1970-06-22
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Granted: 1972-10-03
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Expires: 1990-06-22
Abstract
Abstract An improved IC printer which projects the pattern of an integrated circuit from a mask to form an image on a wafer includes a pair of similar illuminating optical systems arranged symmetrically with respect to a single light source and which are thermally isolated therefrom. One of the illuminating optical systems is used for illuminating the wafer when aligning the mask and wafer, the other is used for illuminating the mask when projecting the pattern of the mask on the wafer.
Inventors
- 👤 Hiroshi Tanaka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 13:56
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
182 words
In a device for printing an integrated circuit pattern of a mask by forming the image of the pattern on a wafer, the improvement comprising a first illumination optical system for illuminating the wafer; a second illumination optical system for illuminating the mask; a light source to impart light to each of the first and second illumination optical systems; a first shutter associated with the light source to regulate the first illumination optical system; a second shutter associated with the light source to regulate the second illumination optical system and coacting with the first shutter to provide alternative illumination by the first and second illumination optical systems; a projecting between the wafer and the mask to form the image of the illuminated wafer on the mask and to form the image of the integrated circuit pattern of the illuminated mask on the wafer; the first illuminating optical system including a filter to pass light having a wavelength suitable for observing the illuminated wafer; and a microscope associated with the mask for observing the mask and the image of the illuminated wafer thereon.
Claim 2
Dependent Claim
182 words
In a device for printing an integrated circuit pattern of a mask by forming the image of the pattern on a wafer, the improvement comprising a first illumination optical system for illuminating the wafer; a second illumination optical system for illuminating the mask; a light source to impart light to each of the first and second illumination optical systems; a first shutter associated with the light source to regulate the first illumination optical system; a second shutter associated with the light source to regulate the second illumination optical system and coacting with the first shutter to provide alternative illumination by the first and second illumination optical systems; a projecting between the wafer and the mask to form the image of the illuminated wafer on the mask and to form the image of the integrated circuit pattern of the illuminated mask on the wafer; the first illuminating optical system including a filter to pass light having a wavelength suitable for observing the illuminated wafer; and a microscope associated with the mask for observing the mask and the image of the illuminated wafer thereon.
Claim 3
Dependent Claim
29 words
In a device for printinG an integrated circuit pattern according to claim 1 wherein the first and second illumination optical systems each include a filter for reducing heat rays.
Claim 4
Dependent Claim
60 words
In a device for printing an integrated circuit pattern according to claim 2 wherein the first and second illumination optical systems and the light source constitute an illuminating unit; a projection printer unit including the mask, the wafer, and the lens between the wafer and the mask; and heat insulating means connecting the illuminating unit to the projection printer unit.
Claim 5
Dependent Claim
31 words
In a device for printing an integrated circuit pattern according to claim 3 wherein the first and the second illumination optical systems are disposed bi-symmetrically with relation to the light source.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-10-03 | 1976-04-03 | 1976-10-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-10-03 | 1980-04-03 | 1980-10-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-10-03 | 1984-04-03 | 1984-10-03 | $7700.00 | Window Closed / Lapsed |