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US4528080A
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Photochemical method for the separation of mixtures of xenon and krypton
Assignee: NAVY United States, AS REPRESENTED BY SECCRETARY OF
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Filing: 1984-05-01
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Granted: 1985-07-09
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Expires: 2004-05-01
Abstract
Abstract Xenon is isolated from a gaseous mixture containing xenon and krypton. Fluorine is added to the mixture and the resulting mixture then irradiated with light of about 250-370 nm to form crystals of xenon difluoride. The unreacted gases are removed and the remaining crystals are decomposed, typically by thermal means, to yield xenon and fluorine gas. The xenon gas may be easily isolated by conventional means from the fluorine gas. Krypton may also be easily isolated from the remaining gases by conventional means. The process is particularly applicable to the treatment of offgases from a nuclear reactor or reprocessing plant.
Inventors
- 👤 Terence Donohue
- 👤 Christine E. Geosling
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 00:56
CPC Classifications
G; G21; G21C; G21C19/00; G21C19/28; G21C19/30; G21C19/303; B; B01; B01J; B01J19/00; B01J19/08; B01J19/12; B01J19/122; B01J19/123; C; C01; C01B; C01B23/00; Y; Y02; Y02E; Y02E30/00; Y02E30/30
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
63 words
A method of separating xenon from a mixture comprising xenon and krypton, the steps of which comprise: selecting a light source; irradiating a gaseous mixture comprising xenon, krypton and fluorine with light from said light source at a wavelength of 250-370 nm to form crystals of XeF 2 ; decomposing said crystals of XeF 2 to form xenon and fluorine gas; isolating xenon.
Claim 2
Independent Claim
63 words
A method of separating xenon from a mixture comprising xenon and krypton, the steps of which comprise: selecting a light source; irradiating a gaseous mixture comprising xenon, krypton and fluorine with light from said light source at a wavelength of 250-370 nm to form crystals of XeF 2 ; decomposing said crystals of XeF 2 to form xenon and fluorine gas; isolating xenon.
Claim 3
Dependent Claim
18 words
The method of claim 1 wherein said irradiation step is performed at about -120° C. to 20° C.
Claim 4
Dependent Claim
42 words
The method of claim 1 wherein the amount of fluorine present in said gaseous mixture is in excess of the amount of fluorine required to stoichiometrically react with all of said xenon present in said gaseous mixture to form XeF 2 .
Claim 5
Dependent Claim
43 words
The method of claim 3 wherein the amount of fluorine present in said gaseous mixture is about 110-150 mole percent of the amount of fluorine required to react with all of the xenon present in said gaseous mixture to form XeF 2 .
Claim 6
Dependent Claim
33 words
The method of claim 4 wherein said irradiation step comprises the step of selecting a photolysis cell comprising at least one window through which light having a wavelength of 250-370 nm can pass.
Claim 7
Dependent Claim
27 words
The process of claim 5 wherein said step of selecting said photolysis cell comprises the step of selecting a photolysis cell comprising at least one salt window.
Claim 8
Dependent Claim
31 words
The process of claim 5 wherein said step of selecting said photolysis cell comprises the step of selecting a photolysis cell comprising at least one salt window comprising a fluoride salt.
Claim 9
Dependent Claim
19 words
The process of claim 7 wherein said irradiation step is performed at between about 200 torr and 1 atmosphere.
Claim 10
Dependent Claim
25 words
The process of claim 3 wherein said irradiation step comprises the step of irradiating said gaseous mixture comprising xenon, krypton and fluorine at 250-350 nm.
Claim 11
Dependent Claim
25 words
The process of claim 3 further comprising the step of isolating krypton from said irradiated gaseous mixture after isolating said crystals of XeF 2 .
Claim 12
Dependent Claim
24 words
The process of claim 3 wherein said step of selecting a light source comprises the step of selecting a light source comprising a laser.
Claim 13
Dependent Claim
25 words
The process of claim 11 wherein the step of selecting a light source comprises the step of selecting a light source comprising a continuous laser.
Claim 14
Dependent Claim
25 words
The process of claim 11 wherein the step of selecting a light source comprises the step of selecting a light source comprising a pulsed laser.
Claim 15
Dependent Claim
25 words
The process of claim 3 wherein the step of selecting a light source comprises the step of selecting a light source comprising a mercury lamp.
Claim 16
Dependent Claim
18 words
The process of claim 3 wherein said gaseous mixture is flowed past and irradiated by said light source.
Claim 17
Dependent Claim
24 words
The process of claim 15 wherein said step of selecting a light source comprises the step of selecting a light source comprising a laser.
Claim 18
Dependent Claim
25 words
The process of claim 16 wherein the step of selecting a light source comprises the step of selecting a light source comprising a continuous laser.
Claim 19
Dependent Claim
25 words
The process of claim 16 wherein the step of selecting a light source comprises the step of selecting a light source comprising a mercury lamp.
Claim 20
Independent Claim
134 words
A method of separating xenon from a mixture comprising xenon and krypton, the steps of which comprise: selecting a gaseous mixture comprising xenon, krypton and fluorine wherein the amount of fluorine present in said gaseous mixture is about 110 to 250 mole percent of that necessary to react stoichiometrically with said xenon present in said gaseous mixture to form XeF 2 ; selecting a photolysis cell having at least one salt window comprising a fluoride salt; admitting said gaseous mixture into said photolysis cell; irradiating said gaseous mixture in said photolysis cell with light having a wavelength of 250-350 nm at about 200 torr to one atmosphere and -120° C. to 20° C. to form crystals of XeF 2 ; decomposing said crystals of XeF 2 to form xenon and fluorine gas; isolating xenon.
Claim 21
Independent Claim
134 words
A method of separating xenon from a mixture comprising xenon and krypton, the steps of which comprise: selecting a gaseous mixture comprising xenon, krypton and fluorine wherein the amount of fluorine present in said gaseous mixture is about 110 to 250 mole percent of that necessary to react stoichiometrically with said xenon present in said gaseous mixture to form XeF 2 ; selecting a photolysis cell having at least one salt window comprising a fluoride salt; admitting said gaseous mixture into said photolysis cell; irradiating said gaseous mixture in said photolysis cell with light having a wavelength of 250-350 nm at about 200 torr to one atmosphere and -120° C. to 20° C. to form crystals of XeF 2 ; decomposing said crystals of XeF 2 to form xenon and fluorine gas; isolating xenon.
Claim 22
Independent Claim
136 words
A method of separating xenon from a mixture comprising xenon and krypton, the steps of which comprise: selecting a gaseous mixture comprising xenon, krypton and fluorine wherein the amount of fluorine present in said gaseous mixture is about 110 to 150 mole percent of that necessary to react stoichiometrically with said xenon present in said gaseous mixture to form XeF 2 ; selecting a photolysis cell having at least one salt window comprising a fluoride salt; admitting said gaseous mixture into said photolysis cell; irradiating said gaseous mixture in said photolysis cell with light having a wavelength of 250-350 nm at about 200 torr to one atmosphere and -120° C. to 20° C. to form crystals of XeF 2 ; decomposing said crystals of XeF 2 to form xenon and fluorine gas; isolating xenon; isolating krypton.
Claim 23
Independent Claim
136 words
A method of separating xenon from a mixture comprising xenon and krypton, the steps of which comprise: selecting a gaseous mixture comprising xenon, krypton and fluorine wherein the amount of fluorine present in said gaseous mixture is about 110 to 150 mole percent of that necessary to react stoichiometrically with said xenon present in said gaseous mixture to form XeF 2 ; selecting a photolysis cell having at least one salt window comprising a fluoride salt; admitting said gaseous mixture into said photolysis cell; irradiating said gaseous mixture in said photolysis cell with light having a wavelength of 250-350 nm at about 200 torr to one atmosphere and -120° C. to 20° C. to form crystals of XeF 2 ; decomposing said crystals of XeF 2 to form xenon and fluorine gas; isolating xenon; isolating krypton.
References Cited (Backward Citations)
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| 3.5 Years (Year 4) | 1988-07-08 | 1989-01-07 | 1989-07-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-07-08 | 1993-01-07 | 1993-07-09 | $3760.00 | Window Closed / Lapsed |
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