US4525383A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for manufacturing multilayer circuit substrate
Assignee: Toshiba Corp
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Filing: 1982-09-08
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Granted: 1985-06-25
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Expires: 2002-09-08
Abstract
Abstract A method for manufacturing a multilayer circuit substrate includes the step of providing an insulating substrate formed of an inorganic oxide and supporting a laminate formed by alternately laminating wiring layers of copper and insulating layers of an inorganic oxide. The uppermost layer of the laminate is constituted by a copper wiring layer. A layer of electrically conductive material capable of being subjected to wire bonding is formed by a low temperature deposition on the surface of the laminate. Subsequently, the conductive material layer is selectively removed by photoetching to allow the portion connected to part of the uppermost copper wiring layer to remain. In this manner, the pattern layer capable of wire bonding can be formed.
Inventors
- 👤 Tamio Saito
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 16:50
CPC Classifications
H; H10; H10W; H10W70/00; H10W70/60; H10W70/611; H05; H05K; H05K3/00; H05K3/46; H05K3/4644; H05K3/4664; H10W70/01; H10W70/05; H10W70/098; H10W70/67; H10W70/68; H10W70/685
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
128 words
A method for manufacturing a multilayer circuit substrate comprising the steps of: providing an insulating substrate formed of an inorganic oxide; successively and alternately forming wiring pattern layers and insulating layers on said insulating substrate, each of said wiring pattern layers consisting of a copper layer and an adhesive layer, said adhesive layer being deposited on said insulating substrate and each of said insulating layers and each of said copper layers being deposited on each of said adhesive layers and wherein said adhesive layer comprises a first metallic material having a free energy of a formation of oxide higher than that of copper; and forming, by a low temperature deposition, a layer of an electrically conductive material capable of being subjected to wire bonding of said copper layer.
Claim 2
Independent Claim
128 words
A method for manufacturing a multilayer circuit substrate comprising the steps of: providing an insulating substrate formed of an inorganic oxide; successively and alternately forming wiring pattern layers and insulating layers on said insulating substrate, each of said wiring pattern layers consisting of a copper layer and an adhesive layer, said adhesive layer being deposited on said insulating substrate and each of said insulating layers and each of said copper layers being deposited on each of said adhesive layers and wherein said adhesive layer comprises a first metallic material having a free energy of a formation of oxide higher than that of copper; and forming, by a low temperature deposition, a layer of an electrically conductive material capable of being subjected to wire bonding of said copper layer.
Claim 3
Dependent Claim
21 words
The method according to claim 1, wherein said adhesive layer is formed of titanium, vanadium, chromium, tungsten or an alloy thereof.
Claim 4
Dependent Claim
20 words
The method according to claim 1, wherein said metallic material forming the stable alloy with copper is nickel or palladium.
Claim 5
Dependent Claim
30 words
The method according to claim 1, further comprising the step of forming a layer of a second metallic material on said adhesive layer for forming a stable alloy with copper.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-06-24 | 1988-12-24 | 1989-06-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-06-24 | 1992-12-24 | 1993-06-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-06-24 | 1996-12-24 | 1997-06-25 | $7700.00 | Window Closed / Lapsed |