US4525335A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of manufacturing crystalline silicon nitride and method of separation thereof
Assignee: Tateho Chemical Industries Co Ltd
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Filing: 1983-03-17
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Granted: 1985-06-25
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Expires: 2003-03-17
Abstract
Abstract A method of manufacturing silicon nitride whiskers in which a carbon and silicon containing material having a thin configuration and sufficient porosity to permit both the passage of a gas therethrough and to provide spaces for growing whiskers therein is charged on a gas-permeable tray, and heated in a furnace of non-oxidizing atmosphere. The tray is moved intermittently through a series of temperature zones, increasing stage-by-stage from about 400° C. to 1,300° C., while a non-oxidizing gas is circulated through the porous material to remove any impurities. Thereafter, the heated tray is intermittently moved through a series of increasing temperature stages from about 1,350° C. to 1,450° C. in the presence of a flow of nitrogen gas to effect whisker growth. The heat-treated silicon nitride-containing material is dispersed in a two-phase mixture of a hydrophobic organic liquid and water. The desired silicon nitride whiskers can be isolated from the aqueous phase.
Inventors
- 👤 Minoru Tanaka
- 👤 Tadashi Kawabe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 22:56
CPC Classifications
C; C30; C30B; C30B25/00; C30B25/005; C30B29/00; C30B29/10; C30B29/38
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
142 words
A method of manufacturing silicon nitride comprising the following steps: (a) providing a silicon and carbon containing material having both a thin cross section and sufficient porosity to permit the passage of a gas therethrough; (b) arranging said material on a gas-permeable, heat-resistant support; (c) placing the material-bearing support in an air tight furnace, said furnace adapted to provide a plurality of temperature zones from a low of about 400 degrees C. through a high in the range 1,350 degrees C. through 1,450 degrees C.; (d) horizontally moving said material-bearing support successively through each of said temperature zones, in the direction of increasing temperature; (e) passing a non-oxidizing gas through the heated material, said gas being nitrogen in zones of the furnace wherein the temperature is in excess of about 1,300 degrees C.; and (f) removing silicon-nitride whisker-containing material from said furnace.
Claim 2
Independent Claim
142 words
A method of manufacturing silicon nitride comprising the following steps: (a) providing a silicon and carbon containing material having both a thin cross section and sufficient porosity to permit the passage of a gas therethrough; (b) arranging said material on a gas-permeable, heat-resistant support; (c) placing the material-bearing support in an air tight furnace, said furnace adapted to provide a plurality of temperature zones from a low of about 400 degrees C. through a high in the range 1,350 degrees C. through 1,450 degrees C.; (d) horizontally moving said material-bearing support successively through each of said temperature zones, in the direction of increasing temperature; (e) passing a non-oxidizing gas through the heated material, said gas being nitrogen in zones of the furnace wherein the temperature is in excess of about 1,300 degrees C.; and (f) removing silicon-nitride whisker-containing material from said furnace.
Claim 3
Dependent Claim
27 words
The method of claim 1, further including the step: treating said silicon and carbon containing material with β-Si 3 N 4 prior to heating in said furnace.
Claim 4
Dependent Claim
58 words
The method of claim 1, further including the steps: dispersing said silicon nitride whisker-containing material in a vessel containing a mixture of a hydrophobic organic liquid and water; maintaining the dispersion containing said whisker-containing material in an unagitated condition whereby the aqueous phase and the organic phase become separated; and separating silicon nitride crystals from said aqueous phase.
Claim 5
Dependent Claim
17 words
The method of claim 3 wherein said vessel contains substantially equal volumes of water and organic liquid.
Claim 6
Dependent Claim
17 words
The method of claim 3, further including the step: isolating silicon nitride powder from said organic phase.
Claim 7
Dependent Claim
21 words
The method of claim 3, wherein said vessel containing a mixture of organic liquid and water further contains a mineral acid.
Claim 8
Dependent Claim
15 words
The method of claim 1, wherein said silicon and carbon containing material comprises rice husks.
Claim 9
Dependent Claim
55 words
The method of claim 1, wherein said silicon and carbon containing material comprises a gas-permeable material selected from the group consisting of: (a) cellulose impregnated with silicone resin; (b) a mixture of volcanic sand, carbon black, and a binder; or (c) a mixture of silica powder, waste powder from glass grinding, silica, and a binder.
Claim 10
Independent Claim
62 words
A method of separating a collection of silicon nitride comprising dispersing materials having generated and grown silicon nitride on the internal and external surfaces thereof into a mixture of a hydrophobic organic liquid, water, and hydrochloric acid, and after keeping it at rest, separately isolating said whiskers in the water phase and the rest of the material in the organic liquid phase.
Claim 11
Independent Claim
62 words
A method of separating a collection of silicon nitride comprising dispersing materials having generated and grown silicon nitride on the internal and external surfaces thereof into a mixture of a hydrophobic organic liquid, water, and hydrochloric acid, and after keeping it at rest, separately isolating said whiskers in the water phase and the rest of the material in the organic liquid phase.
Claim 12
Independent Claim
154 words
A method of manufacturing silicon nitride comprising the following steps: (a) pretreating a quantity of rice husks by heating said husks in concentrated hydrochloric acid; (b) removing said acid from the treated husks; (c) arranging said treated husks on a gas-permeable, heat resistant support in a manner permitting the flow of a gas through said treated husks; (d) placing the treated-husk-bearing support in an air tight furnace, said furnace adapted to provide a plurality of temperature zones from a low of about 400 degrees C. through a high in the range 1,350 degrees C. through 1,450 degrees C.; (e) moving said treated-husk-bearing support successively through each of said temperature zones, in the direction of increasing temperature; (f) passing a non-oxidizing gas through the heated husks, said gas being nitrogen in zones of the furnace wherein the temperature is in excess of about 1,300 degrees C.; and (g) removing silicon-nitride whisker-containing material from said furnace.
Claim 13
Independent Claim
154 words
A method of manufacturing silicon nitride comprising the following steps: (a) pretreating a quantity of rice husks by heating said husks in concentrated hydrochloric acid; (b) removing said acid from the treated husks; (c) arranging said treated husks on a gas-permeable, heat resistant support in a manner permitting the flow of a gas through said treated husks; (d) placing the treated-husk-bearing support in an air tight furnace, said furnace adapted to provide a plurality of temperature zones from a low of about 400 degrees C. through a high in the range 1,350 degrees C. through 1,450 degrees C.; (e) moving said treated-husk-bearing support successively through each of said temperature zones, in the direction of increasing temperature; (f) passing a non-oxidizing gas through the heated husks, said gas being nitrogen in zones of the furnace wherein the temperature is in excess of about 1,300 degrees C.; and (g) removing silicon-nitride whisker-containing material from said furnace.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-06-24 | 1988-12-24 | 1989-06-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-06-24 | 1992-12-24 | 1993-06-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-06-24 | 1996-12-24 | 1997-06-25 | $7700.00 | Window Closed / Lapsed |