Process for producing a layer of a metal silicide by applying multichromatic radiation

Claim 2

A process for forming a layer of a metal silicide, comprising: providing a source of multichromatic radiation; forming a contact region between silicon and a silicide-forming metal; and directing an intense beam of multichromatic radiation from said source to said silicon and said silicide-forming metal in an evacuated chamber at a power level and for a time sufficient to cause formation of a relatively large grain metal silicide and a reduction in sheet resistivity relative to the untreated contact region by a factor of about three or greater, said contact region being raised to a temperature greater than 800° C. for a time on the order of 60 seconds or less.

Claim 3

A process for forming a metal silicide layer in accordance with claim 1 wherein said step of contacting silicon with a metal is accomplished by the step of mixing silicon with said metal.

Claim 4

A process for forming a layer of metal silicide in accordance with claim 2 wherein said step of contacting silicon with a metal is accomplished by the step of depositing metal on a silicon surface.

Claim 5

A process in accordance with claim 3 wherein said step of depositing a metal on a silicon surface is accomplished by the step of depositing a silicide-forming metal on a surface of single crystal silicon.

Claim 6

A process for forming a layer of a metal silicide in accordance with claim 3 wherein said step of depositing metal on a silicon surface is accomplished by the step of depositing a silicide-forming metal on a surface of polycrystalline silicon.

Claim 7

A process for forming a metal silicide layer in accordance with claim 2 wherein said step of mixing silicon with said metal is accomplished by the step of simultaneous codeposition of silicon and metal.

Claim 8

A process for forming a metal silicide layer in accordance with claim 6 wherein said step of mixing silicon with said metal is accomplished by the step of sputtering from a composite metal silicide target.

Claim 9

A process for forming a metal silicide layer in accordance with claim 2 wherein said step of mixing silicon with said metal is accomplished by the step of co-evaporating silicon and a metal from separate sources.

Claim 10

A process for forming a layer of a metal silicide in accordance with claim 1 or 2 wherein said step of providing a source of multichromatic radiation is accomplished by the step of providing a radiator having a relatively uniform energy flux characteristic across a broad bandwidth of IR and visible spectrum.

Claim 11

A process for forming a layer of a metal silicide in accordance with claim 9 wherein said silicon is a polycrystalline silicon.

Claim 12

A process for forming a layer of a metal silicide in accordance with claim 9 wherein said step of directing multichromatic radiation from said source is accomplished by the step of directing multichromatic radiation for a time in the range of 10 to 30 seconds.

Claim 13

A process for forming a layer of a metal silicide on a semiconductor wafer comprising: forming on said semiconductor wafer a contact region between silicon and a silicide-forming metal; providing a source of multichromatic radiation having a generally uniform planar energy flux characteristic across a broad bandwith of IR and visible spectrum, said source being positioned in an evacuated processing chamber; introducing said semiconductor wafer into said processing chamber; and exposing said silicon and said silicide-forming metal to radiation from said source at a power level and for a time selected to cause formation of a relatively large grain metal silicide and a reduction in sheet resistivity relative to the untreated contact region by a factor of about three or greater, said contact region being raised to a temperature greater than greater than 800° C. for 60 seconds or less.

Claim 14

A process for forming a layer of a metal silicide on a semiconductor wafer comprising: forming on said semiconductor wafer a contact region between silicon and a silicide-forming metal; providing a source of multichromatic radiation having a generally uniform planar energy flux characteristic across a broad bandwith of IR and visible spectrum, said source being positioned in an evacuated processing chamber; introducing said semiconductor wafer into said processing chamber; and exposing said silicon and said silicide-forming metal to radiation from said source at a power level and for a time selected to cause formation of a relatively large grain metal silicide and a reduction in sheet resistivity relative to the untreated contact region by a factor of about three or greater, said contact region being raised to a temperature greater than greater than 800° C. for 60 seconds or less.

Claim 15

The process as defined in claim 12 wherein said silicon and said silicide-forming metal are exposed to said multichromatic radiation for a time in the range of 10 to 30 seconds.

Claim 16

The process as defined in claim 12 wherein the power level and time of treatment with said radiation are selected to reduce the sheet resistivity of said metal silicide by a factor of about ten or greater.

Claim 17

The process as defined in claim 14 wherein said contact region is formed by cosputtering of molybdenum and silicon on a single crystal silicon substrate and wherein said contact region is raised to a temperature of about 1000° C. for at least 20 seconds.

Claim 18

The process as defined in claim 14 wherein said contact region is formed by sputtering of TiSi x where x is about 2.5 from a composite target on silicon and wherein said contact region is raised to a temperature above 900° C.

Claim 19

The process as defined in claim 16 wherein said contact region is raised to a temperature of about 1000° C. for at least 10 seconds.

Claim 20

The process as defined in claim 12 wherein said contact region is formed by cosputtering of molybdenum and silicon on a single crystal silicon substrate and wherein said contact region is raised to a temperature above 900° C.

Claim 21

The process as defined in claim 12 wherein said contact region is formed by deposition of TaSi 2 from a composite target on a single crystal silicon substrate and wherein said contact region is raised to a temperature of about 1200° C. for at least 20 seconds.