US4522149A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Reactor and susceptor for chemical vapor deposition process
Assignee: Arris Technology Inc
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Filing: 1983-11-21
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Granted: 1985-06-11
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Expires: 2003-11-21
Abstract
Abstract A reactor for use in a chemical vapor deposition process occurring in a radiant absorption heater system employs a vertical gas flow reaction vessel and a novel substantially solid susceptor configured as a truncated wedge. The susceptor is characterized by a high utilized area, resulting in a high wafer capacity and low power requirement.
Inventors
- 👤 Dennis Garbis
- 👤 Joseph Y. Chan
- 👤 Amedeo J. Granata
- 👤 Robert C. Heller
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 00:27
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/458
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
122 words
A reactor for use in a chemical vapor deposition process comprising: (a) a reaction vessel having a gas inlet, a gas outlet and a substantially vertical gas flow path therebetween; (b) a substantially solid susceptor configured as a truncated wedge, said susceptor comprising a body having a top, a bottom, a pair of longitudinally spaced ends, and a converging pair of opposed faces; each of said faces having means to receive a plurality of wafers and maintain the wafers exposed to said gas flow path, said susceptor being disposed within said reaction vessel with said opposed faces converging in a direction counter to that of said gas flow path; and (c) heating means disposed about said reaction vessel for heating said susceptor.
Claim 2
Dependent Claim
122 words
A reactor for use in a chemical vapor deposition process comprising: (a) a reaction vessel having a gas inlet, a gas outlet and a substantially vertical gas flow path therebetween; (b) a substantially solid susceptor configured as a truncated wedge, said susceptor comprising a body having a top, a bottom, a pair of longitudinally spaced ends, and a converging pair of opposed faces; each of said faces having means to receive a plurality of wafers and maintain the wafers exposed to said gas flow path, said susceptor being disposed within said reaction vessel with said opposed faces converging in a direction counter to that of said gas flow path; and (c) heating means disposed about said reaction vessel for heating said susceptor.
Claim 3
Dependent Claim
25 words
The reactor of claim 1 wherein said reaction vessel has said gas inlet adjacent the top thereof and said gas outlet adjacent the bottom thereof.
Claim 4
Dependent Claim
13 words
The reactor of claim 1 wherein said susceptor ends are trapezoidal in configuration.
Claim 5
Dependent Claim
21 words
The reactor of claim 1 wherein said susceptor top and bottom are generally parallel, and said susceptor ends are generally parallel.
Claim 6
Dependent Claim
25 words
The reactor of claim 1 wherein said susceptor is configured and dimensioned so that over 30% of its surface area may be occupied by wafers.
Claim 7
Dependent Claim
25 words
The reactor of claim 5 wherein said susceptor is configured and dimensioned so that over 40% of its surface area may be occupied by wafers.
Claim 8
Dependent Claim
15 words
The reactor of claim 1 wherein each of said faces extends further horizontally than vertically.
Claim 9
Dependent Claim
18 words
The reactor of claim 1 wherein each of said faces has an equal number of said receiving means.
Claim 10
Dependent Claim
24 words
The reactor of claim 8 wherein each of said faces has means to receive a vertically spaced plurality of horizontally extending rows of wafers.
Claim 11
Dependent Claim
17 words
The reactor of claim 9 wherein each of said faces has three rows of said receiving means.
Claim 12
Dependent Claim
18 words
The reactor of claim 10 wherein each of said faces has three rows of six receiving means each.
Claim 13
Dependent Claim
33 words
The reactor of claim 1 additionally comprising means for positioning said susceptor in said reaction vessel, said susceptor having a groove in each of its ends into which said positioning means is received.
Claim 14
Dependent Claim
15 words
The reactor of claim 1 wherein said heating means comprises a radiant absorption heating system.
Claim 15
Dependent Claim
73 words
The reactor of claim 1 wherein said substantially solid susceptor configured as a truncated wedge for use in a vertical gas flow is characterized by a power requirement of less than 1.1 P, where P is the power requirement of a substantially solid susceptor configured as a rectangular parallelopiped for use in a horizontal gas flow, the rectangular parallelopiped susceptor having dimensions equal to the average corresponding dimensions of said truncated wedge susceptor.
Claim 16
Dependent Claim
97 words
The reactor of claim 1 wherein said substantially solid susceptor configured as a truncated wedge for use in a vertical gas flow is characterized by a capacity of N wafers of given size and a power requirement of P as compared with a substantially solid susceptor configured as a rectangular parallelopiped for use in a horizontal gas flow, the rectangular parallelopiped susceptor having dimensions equal to the average corresponding dimensions of said truncated wedge susceptor and being characterized by a capacity of 0.5N wafers of said given size and a power requirement of at least 0.9 P.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-06-10 | 1988-12-10 | 1989-06-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-06-10 | 1992-12-10 | 1993-06-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-06-10 | 1996-12-10 | 1997-06-11 | $7700.00 | Window Closed / Lapsed |