Photopatternable dielectric compositions, method for making and use

Claim 1

A photosensitive silicone-polyamide acid composition comprising by weight, (A) up to 95% of an inert organic solvent, (B) at least 5% of a modified silicone-aromatic polyamide acid consisting essentially of chemically combined units of the formulas, ##STR9## (C) an effective amount of sensitizer, where Q 1 is a monovalent radical selected from carboxy and acrylate amide groups of the formula, ##STR10## and there are at least 10 mole percent of the acrylate amide groups based on the total carboxy and acrylate amide groups in the silicone-aromatic polyamide, where R is a tetravalent C.sub.(6-30) aromatic radical selected from ##STR11## R 1 is a divalent C.sub.(2-13) organic radical, R 2 is a divalent C.sub.(2-8) organo radical, R 3 is selected from C.sub.(1-3) monovalent hydrocarbon radicals and substituted C.sub.(1-13) monovalent hydrocarbon radicals, Q is a divalent radical having the formula, --ZR.sup.4 Z--, Z is selected from --O-- and --NH--, R 4 and R 5 are selected from C.sub.(2-13) organic radicals, R 6 and R 7 are selected from hydrogen and C.sub.(1-8) alkyl radicals, R 8 is a C.sub.(1-13) divalent organo radical and n is an integer equal to 1 to 20 inclusive.