Patent US1763907A successfully refreshed from Google Patents.
Patent US4515877A successfully refreshed from Google Patents.
US4515877A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Image-recording materials and image-recording carried out using these to produce an optical mask
Assignee: BASF SE
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Filing: 1983-11-22
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Granted: 1985-05-07
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Expires: 2003-11-22
Abstract
Abstract A resist film comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 μm, undergoes an irreversible change in its absorption spectrum in the wavelength range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units. The base of the resist film can also be applied onto the photosensitive relief-forming layer (RL) of a recording material to give a multilayer image-recording material. Imagewise irradiation with heat, for example using an IR laser, produces, in the mask-forming layer (ML) of the resist film, a UV photomask which is very useful for exposing photosensitive recording materials.
Inventors
- 👤 Helmut Barzynski
- 👤 Klaus Holoch
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 20:24
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/68; B; B41; B41M; B41M5/00; B41M5/26; B41M5/28; B41M5/282; B41M5/30; B41M5/333; Y; Y10; Y10S; Y10S428/00; Y10S428/913; Y10S430/00; Y10S430/146; Y10S522/00; Y10S522/907
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
102 words
A resist film which comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is applied on the base, wherein the said layer (ML) is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 μm, undergoes an irreversible change in its absorption spectrum in the range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units.
Claim 2
Dependent Claim
102 words
A resist film which comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is applied on the base, wherein the said layer (ML) is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 μm, undergoes an irreversible change in its absorption spectrum in the range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units.
Claim 3
Dependent Claim
53 words
A resist film as claimed in claim 1, wherein the mask-forming layer (ML) has an optical density in the wavelength range from 300 to 420 nm of not more than 0.5, and, as a result of irradiation with heat, the absorption of actinic light in this wavelength range by the layer (ML) increases.
Claim 4
Dependent Claim
53 words
A resist film as claimed in claim 1, wherein the mask-forming layer (ML) has an optical density in the wavelength range from 300 to 420 nm of not less than 1.8, and, as a result of irradiation with heat, the absorption of actinic light in this wavelength range by the layer (ML) decreases.
Claim 5
Dependent Claim
35 words
A resist film as claimed in claim 1, wherein the mask-forming layer (ML) contains a thermochromic system comprising (a) a sulfonic acid ester and (b) an aromatic amine or the hydrochloride of an aromatic amine.
Claim 6
Dependent Claim
22 words
A resist film as claimed in claim 1, wherein the mask-forming layer contains a polymeric binder in addition to the thermochromic system.
Claim 7
Dependent Claim
20 words
A resist film as claimed in claim 1, wherein the mask-forming layer (ML) additionally contains a visible, thermochromic indicator system.
Claim 8
Dependent Claim
59 words
A process for the production of an optical mask, wherein a resist film consisting of a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) as claimed in claim 1 is exposed imagewise to an IR laser having a wavelength greater than 1.00 μm.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-05-06 | 1988-11-05 | 1989-05-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-05-06 | 1992-11-05 | 1993-05-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-05-06 | 1996-11-05 | 1997-05-07 | $7700.00 | Window Closed / Lapsed |