Electrophotographic photosensitive member and process for production thereof

Claim 2

A process for preparing an electrophotographic photosensitive member which comprises: (a) evacuating a pressure-reducible deposition chamber in which a target composed of silicon and a substrate for electrophotography are disposed in fixed positions, to reduce the pressure, (b) heating said substrate to 50°-350° C., (c) introducing a gas containing a hydrogen atom as a constituent atom into said deposition chamber, (d) causing electric discharge in space of said deposition chamber in which said target is present, by electric energy to ionize said gas, and (e) depositing amorphous silicon on said substrate at a deposition rate of 0.5-100 angstroms/sec. by utilizing said electric discharge while continuing the electric discharge for a period of time sufficient to form an amorphous silicon photoconductive layer of a predetermined thickness.

Claim 3

A process for preparing an electrophotographic photosensitive member according to claim 1, in which said gas containing a hydrogen atom as a constituent atom is silane.

Claim 4

A process for preparing an electrophotographic photosensitive member according to claim 1, in which said gas containing a hydrogen atom as a constituent atom is hydrogen gas.

Claim 5

A process for preparing an electrophotographic photosensitive member according to claim 1, in which said gas containing a hydrogen atom as a constituent atom is a mixture of silane and hydrogen gases.

Claim 6

A process for preparing an electrophotographic photosensitive member according to claim 1, in which said electric discharge is caused with an electric current density of 0.1-10 mA/cm 2 and a voltage of 100-5000 V.

Claim 7

A process for preparing an electrophotographic photosensitive member which comprises: (a) evacuating a deposition chamber in which a target for sputtering and a substrate for electrophotography are disposed in fixed positions, to reduce the pressure, said target being composed of a material containing a silicon atom as a constituent element; (b) introducing a material containing a hydrogen atom as a constituent element, in a gaseous state, into said pressure-reduced deposition chamber; (c) causing electric discharge in said gaseous material to form a photoconductive layer composed of hydrogenated amorphous silicon on said substrate; (d) after completion of formation of said layer, maintaining the interior of said deposition chamber in the reduced pressure state until the temperature of said substrate decreases to a predetermined temperature or below; (e) thereafter connecting the interior of said deposition chamber to atmospheric pressure; and (f) removing said substrate having said layer formed thereon from said deposition chamber.

Claim 8

A process for preparing an electrophotographic photosensitive member which comprises: (a) evacuating a deposition chamber in which a target for sputtering and a substrate for electrophotography are disposed in fixed positions, to reduce the pressure, said target being composed of a material containing a silicon atom as a constituent element; (b) introducing a material containing a hydrogen atom as a constituent element, in a gaseous state, into said pressure-reduced deposition chamber; (c) causing electric discharge in said gaseous material to form a photoconductive layer composed of hydrogenated amorphous silicon on said substrate; (d) after completion of formation of said layer, maintaining the interior of said deposition chamber in the reduced pressure state until the temperature of said substrate decreases to a predetermined temperature or below; (e) thereafter connecting the interior of said deposition chamber to atmospheric pressure; and (f) removing said substrate having said layer formed thereon from said deposition chamber.

Claim 9

A process according to claim 6, wherein said hydrogen containing material is selected from H 2 and silane.

Claim 10

A process according to claim 6, further comprising introducing a gas containing an element of Group IIIA of the Periodic Table into said deposition chamber.

Claim 11

A process according to claim 6, further comprising introducing a gas containing an element of Group VA of the Periodic Table into said deposition chamber.

Claim 12

A process according to claim 6, further comprising raising the temperature of said substrate from the starting temperature (T 1 ) while forming said hydrogenated amorphous silicon layer.

Claim 13

A process according to claim 6, further comprising raising the temperature of said substrate from the starting temperature (T 1 ) to a temperature (T 2 ) and then decreasing the temperature to a temperature lower than the temperature (T 2 ) while forming said hydrogenated amorphous silicon layer.

Claim 14

A process according to claim 2, 4, or 7, wherein said silane is SiH 4 .

Claim 15

A process according to claim 2, 4, or 7 wherein said silane is SiH 6 .

Claim 16

A process according to claim 2, 4, or 7, wherein said silane is Si 4 H 10 .

Claim 17

A process according to claim 8, wherein said gas containing an element of Group IIIA of the Periodic Table is B 2 H 6 .

Claim 18

A process according to claim 9, wherein said gas containing an element of Group VA of the Periodic Table is selected from PH 3 and P 2 H 2 .

Claim 19

A process according to claim 1 or 6, further comprising annealing said formed photoconductive layer for a predetermined period of time at a temperature not higher than the crystallizing temperature.