Amide ether imide block copolymers

Claim 2

An amide ether imide block copolymer wherein the block copolymer consists essentially of polymeric units of the formulas: ##STR10## where "a" represents a whole number in excess of 1, and Z is a member of the class consisting of (1) ##STR11## and (2) divalent organic radicals of the general formula: ##STR12## where X is a member selected from the class consisting of divalent radicals of the formulas: --C y H 2y --, ##STR13## --O-- and --S-- where q is 0 or 1, y is a whole number from 1 to 5, the divalent bonds of the --O--Z--O-- radical are situated on the phthalic anhydride-derived units, in the 3,3'-, 3,4'-,4,3'-or the 4,4'-positions, and R 1 , R 2 and R 3 are divalent organic radicals independently selected from the class consisting of (a) aromatic hydrocarbon radicals having from 6 to about 20 carbon atoms and halogenated derivatives thereof, (b) alkylene radicals and cycloalkylene radicals having from 2 to about 20 carbon atoms, C.sub.(2-8) alkylene terminated polydiorganosiloxane, and (c) divalent radicals included by the formula: ##STR14## where Q is a member selected from the class consisting of: --O--, ##STR15## --S--, and --C x H 2x --, and x is a whole number from 1 to 5 inclusive.

Claim 3

The block copolymer of claim 1 wherein the polymeric unit of Formula I is from about 5 to about 95 mole percent of the block copolymer.

Claim 4

The block copolymer of claim 1, wherein the polymeric unit of Formula I is from about 10 to about 90 mole percent of the block copolymer.

Claim 5

The block copolymer of claim 1, wherein the polymeric unit of Formula I is from about 20 to 80 mole percent of the block copolymer.

Claim 6

The block copolymer of claim 1 wherein R 2 is an alkylene radical having from 2 to about 20 carbon atoms.

Claim 7

The block copolymer of claim 1 wherein R 2 is an aromatic radical having from 6 to about 20 carbon atoms.

Claim 8

The block copolymer of claim 1 wherein R 1 is an alkylene radical having from 2 to about 20 carbon atoms.

Claim 9

The block copolymer of claim 7 wherein R 1 is an aromatic radical having from 6 to about 20 carbon atoms.

Claim 10

The block copolymer of claim 1 where Z is of the formula: ##STR16## where y is a whole number from 1 to about 5.

Claim 11

The block copolymer of claim 9, wherein R 3 is metaphenylene and Z is a group of the formula: ##STR17##

Claim 12

A process for the production of an amide ether imide block copolymer comprising reacting an acid chloride of the formula: ##STR18## with at least a molar equivalent of an organic diamine of the formula: H.sub.2 N--R.sub.1 --NH.sub.2 III. under polymerization conditions to form an amine terminated polyamide of the formula, ##STR19## thereafter reacting said amine terminated amide with an aromatic bis(ether anhydride) of the formula: ##STR20## to form an amide ether imide block copolymer; where Z is a member of the class consisting of (1) ##STR21## and (2) divalent organic radicals of the general formula: ##STR22## where X is a member selected from the class consisting of divalent radicals of the formulas: --C y H 2y --, ##STR23## --O-- and --S-- where q is 0 or 1, y is a whole number from 1 to 5, the divalent bonds of the --O--Z--O-- radical are situated on the phthalic anhydride-derived units, in the 3,3'-, 3,4'-,4,3'-or the 4,4'-positions, and R 1 and R 2 are divalent organic radicals selected from the class consisting of (a) aromatic hydrocarbon radicals having from 6 to about 20 carbon atoms and halogenated derivatives thereof, (b) alkylene radicals and cycloalkylene radicals having from 2 to about 20 carbon atoms, C.sub.(2-8) alkylene terminated polydiorganosiloxane, and (c) divalent radicals included by the formula: ##STR24## where Q is a member selected from the class consisting of: --O--, ##STR25## --S--, and --C x H 2x --, and x is a whole number from 1 to 5 inclusive.

Claim 13

A process for the production of an amide ether imide block copolymer comprising reacting an acid chloride of the formula: ##STR18## with at least a molar equivalent of an organic diamine of the formula: H.sub.2 N--R.sub.1 --NH.sub.2 III. under polymerization conditions to form an amine terminated polyamide of the formula, ##STR19## thereafter reacting said amine terminated amide with an aromatic bis(ether anhydride) of the formula: ##STR20## to form an amide ether imide block copolymer; where Z is a member of the class consisting of (1) ##STR21## and (2) divalent organic radicals of the general formula: ##STR22## where X is a member selected from the class consisting of divalent radicals of the formulas: --C y H 2y --, ##STR23## --O-- and --S-- where q is 0 or 1, y is a whole number from 1 to 5, the divalent bonds of the --O--Z--O-- radical are situated on the phthalic anhydride-derived units, in the 3,3'-, 3,4'-,4,3'-or the 4,4'-positions, and R 1 and R 2 are divalent organic radicals selected from the class consisting of (a) aromatic hydrocarbon radicals having from 6 to about 20 carbon atoms and halogenated derivatives thereof, (b) alkylene radicals and cycloalkylene radicals having from 2 to about 20 carbon atoms, C.sub.(2-8) alkylene terminated polydiorganosiloxane, and (c) divalent radicals included by the formula: ##STR24## where Q is a member selected from the class consisting of: --O--, ##STR25## --S--, and --C x H 2x --, and x is a whole number from 1 to 5 inclusive.

Claim 14

A process for the production of an amide ether imide copolymer comprising polymerizing an organic diamine of the formula, H.sub.2 N--R.sub.1 --NH.sub.2 III. with an acid chloride of the formula, ##STR26## and polymerizing the reaction product with an aromatic bis(ether anhydride) of the formula, ##STR27## where the number of moles of diamine reacted is equal to the total moles of acid chloride and aromatic bis(ether anhydride) combined and Z is a member of the class consisting of (1): ##STR28## and (2) divalent organic radicals of the general formula: ##STR29## where X is a member selected from the class consisting of divalent radicals of the formulas: --C y H 2y --, ##STR30## --O-- and --S-- where q is 0 or 1, y is a whole number from 1 to 5, the divalent bonds of the --O--Z--O-- radical are situated on the phthalic anhydride-derived units, in the 3,3'-, 3,4'-,4,3'-or the 4,4'-positions, and R 1 and R 2 are divalent organic radicals selected from the class consisting of (a) aromatic hydrocarbon radicals having from 6-20 carbon atoms and halogenated derivatives thereof, (b) alkylene radicals and cycloalkylene radicals having from 2-20 carbon atoms, C.sub.(2-8) alkylene terminated polydiorganosiloxane, and (c) divalent radicals included by the formula: ##STR31## where Q is a member selected from the class consisting of: --O--, ##STR32## --S--, and --C x H 2x --, and x is a whole number from 1 to 5 inclusive.

Claim 15

A process for the production of an amide ether imide copolymer comprising polymerizing an organic diamine of the formula, H.sub.2 N--R.sub.1 --NH.sub.2 III. with an acid chloride of the formula, ##STR26## and polymerizing the reaction product with an aromatic bis(ether anhydride) of the formula, ##STR27## where the number of moles of diamine reacted is equal to the total moles of acid chloride and aromatic bis(ether anhydride) combined and Z is a member of the class consisting of (1): ##STR28## and (2) divalent organic radicals of the general formula: ##STR29## where X is a member selected from the class consisting of divalent radicals of the formulas: --C y H 2y --, ##STR30## --O-- and --S-- where q is 0 or 1, y is a whole number from 1 to 5, the divalent bonds of the --O--Z--O-- radical are situated on the phthalic anhydride-derived units, in the 3,3'-, 3,4'-,4,3'-or the 4,4'-positions, and R 1 and R 2 are divalent organic radicals selected from the class consisting of (a) aromatic hydrocarbon radicals having from 6-20 carbon atoms and halogenated derivatives thereof, (b) alkylene radicals and cycloalkylene radicals having from 2-20 carbon atoms, C.sub.(2-8) alkylene terminated polydiorganosiloxane, and (c) divalent radicals included by the formula: ##STR31## where Q is a member selected from the class consisting of: --O--, ##STR32## --S--, and --C x H 2x --, and x is a whole number from 1 to 5 inclusive.