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US4500565A Expired / Lapsed US ⏱️ 0.0 years remaining

Deposition process

Assignee: Ushio Denki KK
•
Filing: 1983-09-28
•
Granted: 1985-02-19
•
Expires: 2003-09-28
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Abstract

Abstract Disclosed herein is a deposition process which comprises, in an air-tight reaction vessel, generating a plasma through a discharge gas by means of a discharge system, disposing a substrate at a position apart from the plasma by a distance greater than the mean free path of species produced by the plasma in such a state that the substrate can be exposed directly to light radiated from the plasma, feeding a carrier gas and photoreactive gas in such a manner that they flow along the substrate, and causing the photoreactive gas to undergo a reaction by the light from the plasma to deposit the reaction product on the substrate. In the deposition process the substrate and a film deposited thereon are prevented from contamination or damage by charged particles. Electrodes are kept free from deposition of the reaction product, thereby allowing to conduct the deposition operation for a long period of time without need for cleaning them frequently.

Inventors

  • 👤 Tatsumi Hiramoto

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 20:56
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/48; C23C16/482; H; H01; H01J; H01J37/00; H01J37/32; H10; H10P; H10P14/00; H10P14/20; H10P14/24; H10P14/29; H10P14/2901; H10P14/2902; H10P14/2905; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411; H10P14/3438; H10P14/3441; H10P14/3442; H10P14/3444

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 116 words
A deposition process which comprises, in an air-tight reaction vessel, generating through a discharge gas by means of a discharge system a light-radiating plasma producing species, disposing a substrate at a position spaced from the plasma by a distance greater than the mean free path of the species produced by the plasma such that the substrate is exposed directly to light radiated from the plasma, feeding a carrier gas and photoreactive gas in such a manner that said carrier gas and photoreactive gas flow along the substrate, and causing the photoreactive gas to undergo a reaction by the light from the plasma to produce a reaction product, and to deposit the reaction product on the substrate.
Claim 2
Dependent Claim 116 words
A deposition process which comprises, in an air-tight reaction vessel, generating through a discharge gas by means of a discharge system a light-radiating plasma producing species, disposing a substrate at a position spaced from the plasma by a distance greater than the mean free path of the species produced by the plasma such that the substrate is exposed directly to light radiated from the plasma, feeding a carrier gas and photoreactive gas in such a manner that said carrier gas and photoreactive gas flow along the substrate, and causing the photoreactive gas to undergo a reaction by the light from the plasma to produce a reaction product, and to deposit the reaction product on the substrate.
Claim 3
Dependent Claim 16 words
The deposition process as claimed in claim 1, wherein the discharge gas is the photoreactive gas.
Claim 4
Dependent Claim 18 words
The deposition process as claimed in claim 1, wherein the photoreactive gas contains a hydride compound of silicon.
Claim 5
Dependent Claim 24 words
The deposition process as claimed in claim 3, wherein the discharge gas contains at least one element selected from mercury, arsenic, phosphorus and boron.
Claim 6
Dependent Claim 17 words
The deposition process as claimed in claim 3, wherein the photoreactive gas contains ammonia or nitrogen oxide.
Claim 7
Dependent Claim 20 words
The deposition process as claimed in claim 3, wherein the photoreactive gas contains boron hydride, arsenic hydride or phosphorus hydride.
Claim 8
Dependent Claim 27 words
The deposition process as claimed in claim 1, wherein a protective gas is fed around electrodes which are exposed in the reaction vessel to generate the plasma.
Claim 9
Dependent Claim 16 words
The deposition process as claimed in claim 7, wherein the protective gas is the discharge gas.

References Cited (Backward Citations)

US3472679A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-02-19 1988-08-20 1989-02-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-02-19 1992-08-20 1993-02-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-02-19 1996-08-20 1997-02-19 $7700.00 Window Closed / Lapsed

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