Abstract A blank is molded from a powdery mixture of silicon, α-silicon nitride, and a sintering agent. The blank is nitrided to nitride the silicon content of the blank, and thereafter the blank is subjected to hot isostatic pressing. The silicon content of the original powdery mixture is between 5% and 60% by weight of the mixture, and the sintering agent, which may be an oxide, is present in the original powdery mixture in the range between 0.1% and 10% by weight. The nitriding is carried out in a nitrogen atmosphere at a temperature between 1100° C. and 1600° C. The nitriding may be carried out in two stages, first at a temperature between 1050° C. and 1400° C., and then at a temperature above the melting point of silicon.
A method of manufacturing silicon nitride ceramic molded articles comprising the steps of: (a) providing a powdery mixture of silicon, α-silicon nitride, and a sintering agent, (b) molding a blank from the powdery mixture, (c) nitriding the silicon content of the blank, and (d) thereafter subjecting the blank to hot isostatic pressing.
Claim 2
Independent Claim
52 words
A method of manufacturing silicon nitride ceramic molded articles comprising the steps of: (a) providing a powdery mixture of silicon, α-silicon nitride, and a sintering agent, (b) molding a blank from the powdery mixture, (c) nitriding the silicon content of the blank, and (d) thereafter subjecting the blank to hot isostatic pressing.
Claim 3
Dependent Claim
29 words
A method as defined in claim 1 wherein the silicon content of the powdery mixture is in the range of 5% to 60% by weight of the powdery mixture.
Claim 4
Dependent Claim
31 words
A method as defined in claim 1 wherein the sintering agent is an oxide present in the powdery mixture in range of 0.1% to 10% by weight of the powdery mixture.
Claim 5
Dependent Claim
42 words
A method as defined in claim 3 wherein the sintering agent is selected from the group consisting of MgO, Al 2 O 3 , Y 2 O 3 , Cr 2 O 3 , Fe 2 O 3 , and FeO. .
Claim 6
Dependent Claim
25 words
A method as defined in claim 1 wherein the blank is nitrided in a nitrogen atmosphere at a temperature between 1100° C. and 1600° C.
Claim 7
Dependent Claim
45 words
A method as defined in claim 1 wherein the blank is nitrided at a relatively low temperature in the range between 1050° C. and 1400° C. during a first phase, and then at a temperature above the melting point of silicon during a second phase.