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Silicon carbide substrates and a method of producing the same

Assignee: Ibiden Co Ltd
•
Filing: 1982-12-21
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Granted: 1985-02-12
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Expires: 2002-12-21
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Abstract

Abstract A silicon carbide substrate having excellent electrical insulation properties is disclosed. The silicon carbide substrate is produced by closely adhering to a surface of a silicon carbide plate body a eutectic oxide layer comprising SiO2 produced by partial oxidation of the plate body and at least one oxide selected from Al2O3, P2O5, B2O3, GeO2, As2O3, Sb2O3, Bi2O3, V2O5, ZnO, PbO, Pb3O4, PbO2, CdO, Na2O, K2O, BeO, CaO, MgO, BaO and SrO.

Inventors

  • 👤 Ryo Enomoto
  • 👤 Hidetoshi Yamauchi
  • 👤 Shoji Tanikawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 04:14
CPC Classifications
H; H10; H10W; H10W99/00; H10W70/00; H10W70/60; H10W70/67; H10W70/69; H10W70/692

Claims Analysis

Total Claims: 19
Claim 1
Independent Claim 121 words
A silicon carbide substrate having excellent electrical insulation properties, comprising: a silicon carbide sintered plate body; and a eutectic oxide layer closely adhered to a surface of said sintered plate body and comprising at least 30% by weight of SiO 2 produced by oxidation of silicon carbide constituting said sintered plate body and Al 2 O 3 and an oxide of at least one element selected from the group consisting of phosphorus, boron, germanium, arsenic, antimony, bismuth, vanadium, zinc, lead, cadmium, sodium, potassium, lithium, beryllium, calcium, magnesium, barium and strontium, said eutectic oxide layer having a molar ratio of Al 2 O 3 to SiO 2 of 0.024-1.800, the thickness of said eutectic layer being in the range of 0.5-100 μm.
Claim 2
Dependent Claim 121 words
A silicon carbide substrate having excellent electrical insulation properties, comprising: a silicon carbide sintered plate body; and a eutectic oxide layer closely adhered to a surface of said sintered plate body and comprising at least 30% by weight of SiO 2 produced by oxidation of silicon carbide constituting said sintered plate body and Al 2 O 3 and an oxide of at least one element selected from the group consisting of phosphorus, boron, germanium, arsenic, antimony, bismuth, vanadium, zinc, lead, cadmium, sodium, potassium, lithium, beryllium, calcium, magnesium, barium and strontium, said eutectic oxide layer having a molar ratio of Al 2 O 3 to SiO 2 of 0.024-1.800, the thickness of said eutectic layer being in the range of 0.5-100 μm.
Claim 3
Dependent Claim 20 words
The silicon carbide substrate of claim 1, wherein said silicon carbide sintered plate body has a thickness of 0.1-30 mm.
Claim 4
Dependent Claim 32 words
The silicon carbide substrate of claim 1, wherein said eutectic oxide layer further contains not more than 60% in total of at least one oxide of alkali metals and alkaline earth metals.
Claim 5
Dependent Claim 14 words
The silicon carbide substrate of claim 1, wherein said eutectic oxide layer is vitreous.
Claim 6
Dependent Claim 18 words
The silicon carbide substrate of claim 1, wherein an outer surface of said eutectic oxide layer is smooth.
Claim 7
Dependent Claim 18 words
The silicon carbide substrate of claim 1, wherein said eutectic oxide layer has a thickness of 1.0-60 μm.
Claim 8
Dependent Claim 32 words
The silicon carbide substrate of claim 1, wherein said eutectic oxide layer further contains not more than 60% in total of at least one oxide of alkali metals and alkaline earth metals.
Claim 9
Dependent Claim 121 words
A silicon carbide substrate having excellent electrical insulation properties, comprising: a silicon carbide sintered plate body; and a eutectic oxide layer closely adhered to a surface of said sintered plate body and comprising at least 30% by weight of SiO 2 produced by oxidation of silicon carbide constituting said sintered plate body and Al 2 O 3 and an oxide of at least one element selected from the group consisting of phosphorus, boron, germanium, arsenic, antimony, bismuth, vanadium, zinc, lead, cadmium, sodium, potassium, lithium, beryllium, calcium, magnesium, barium and strontium, said eutectic oxide layer having a molar ratio of Al 2 O 3 to SiO 2 of 0.5-1.0, the thickness of said eutectic layer being in the range of 0.5-100 μm.
Claim 10
Dependent Claim 121 words
A silicon carbide substrate having excellent electrical insulation properties, comprising: a silicon carbide sintered plate body; and a eutectic oxide layer closely adhered to a surface of said sintered plate body and comprising at least 30% by weight of SiO 2 produced by oxidation of silicon carbide constituting said sintered plate body and Al 2 O 3 and an oxide of at least one element selected from the group consisting of phosphorus, boron, germanium, arsenic, antimony, bismuth, vanadium, zinc, lead, cadmium, sodium, potassium, lithium, beryllium, calcium, magnesium, barium and strontium, said eutectic oxide layer having a molar ratio of Al 2 O 3 to SiO 2 of 0.5-1.0, the thickness of said eutectic layer being in the range of 0.5-100 μm.
Claim 11
Dependent Claim 20 words
The silicon carbide substrate of claim 8, wherein said silicon carbide sintered plate body has a thickness of 0.1-30 mm.
Claim 12
Dependent Claim 18 words
The silicon carbide substrate of claim 8, wherein said eutectic oxide layer has a thickness of 0.5-100.0 μm.
Claim 13
Dependent Claim 18 words
The silicon carbide substrate of claim 8, wherein said eutectic oxide layer has a thickness of 1.0-60.0 μm.
Claim 14
Dependent Claim 14 words
The silicon carbide substrate of claim 8, wherein said eutectic oxide layer is vitreous.
Claim 15
Dependent Claim 18 words
The silicon carbide substrate of claim 8, wherein an outer surface of said eutectic oxide layer is smooth.
Claim 16
Dependent Claim 111 words
A silicon carbide substrate having excellent electrical insulation properties, comprising: a silicon carbide sintered plate body having a thickness of 0.1-30 mm; and a eutectic oxide layer closely adhered to a surface of said sintered plate body, having a thickness of 0.5-100 μm, and comprising at least 30% by weight of SiO 2 produced by oxidation of silicon carbide constituting said sintered plate body and an oxide of at least one element selected from the group consisting of phosphorus, boron, germanium, arsenic, antimony, bismuth, vanadium, zinc, lead, cadmium, sodium, potassium, lithium, beryllium, calcium, magnesium, barium and strontium, said eutectic oxide layer having a molar ratio of alumina to silica of 0.024-1.800.
Claim 17
Dependent Claim 111 words
A silicon carbide substrate having excellent electrical insulation properties, comprising: a silicon carbide sintered plate body having a thickness of 0.1-30 mm; and a eutectic oxide layer closely adhered to a surface of said sintered plate body, having a thickness of 0.5-100 μm, and comprising at least 30% by weight of SiO 2 produced by oxidation of silicon carbide constituting said sintered plate body and an oxide of at least one element selected from the group consisting of phosphorus, boron, germanium, arsenic, antimony, bismuth, vanadium, zinc, lead, cadmium, sodium, potassium, lithium, beryllium, calcium, magnesium, barium and strontium, said eutectic oxide layer having a molar ratio of alumina to silica of 0.024-1.800.
Claim 18
Dependent Claim 14 words
The silicon carbide substrate of claim 14, wherein said eutectic oxide layer is vitreous.
Claim 19
Dependent Claim 18 words
The silicon carbide substrate of claim 14, wherein an outer surface of said eutectic oxide layer is smooth.

References Cited (Backward Citations)

US1653123A Cited
US1653918A Cited
US1818904A Cited
US1975069A Cited
US2943008A Cited
US2874067A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-02-12 1988-08-13 1989-02-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-02-12 1992-08-13 1993-02-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-02-12 1996-08-13 1997-02-12 $7700.00 Window Closed / Lapsed

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