Infrared sensitive photo diode
Abstract
Abstract A photo diode formed by a substrate of Cd x Hg 1-x Te covered with a layer of CdTe forming a p-n junction. The substrate may be p-type in which case the layer is n-type or vice versa. An array of photo diodes may be formed by covering the substrate with semi-insulating CdTe and forming islets of In on the CdTe. Heating causes In to diffuse into the CdTe doping it n-type. This results in regions of n-type CdTe surrounded by semi-insulating CdTe each region forming, with the substrate, a photo diode. The heating also causes diffusion between the Cd x Hg 1-x Te and CdTe to give a graded heterostructure. Electrical connections are made to the substrate, and each n-type region. The n-type CdTe region may alternatively be formed by molecular beam epitaxial growth techniques using a beam of In dopant.
Inventors
- 👤 Anthony B. Dean
- 👤 Robin F. C. Farrow
- 👤 Piero Migliorato
- 👤 Anthony M. White
- 👤 Gerald M. Williams
Bibliographic Details
Claims Analysis
Total Claims: 13References Cited (Backward Citations)
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