US4491629A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Water soluble photoresist composition with bisazide, diazo, polymer and silane
Assignee: Toshiba Corp
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Filing: 1983-02-18
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Granted: 1985-01-01
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Expires: 2003-02-18
Abstract
Abstract Photoresist compositions based upon a water-soluble polymer are disclosed together with a water-soluble bisazide compound as a cross-linker, a water-soluble adhesion-improving diazo compound are characterized in that a water-soluble silane compound is included. The compositions are photosensitive, particularly to ultraviolet rays, and adhere well to the substrates to which they are applied. The compositions of the invention are used as photoresists.
Inventors
- 👤 Norio Koike
- 👤 Takeo Ito
- 👤 Shingo Watanabe
- 👤 Kunihiro Ikari
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 21:44
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/52; G03C1/60; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0751; G03F7/008; G03F7/0085
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
91 words
A photoresist composition comprising: a photosensitive composition comprising an admixture of a film-forming amount of a water-soluble, film-forming polymer comprising the combination of polyvinylpyrrolidone and polyvinyl alcohol; a cross-linking amount of a polymer-cross-linking, water-soluble photosensitive bisazide compound; a cross-linking amount of a polymer-cross-linking, adhesion-improving water-soluble photosensitive diazo compound; and an adhesion-activating amount of a water-soluble polyazamidesilane compound having the following formula: ##STR2## wherein R 1 , R 2 and R 3 are independently alkylenes containing carbon 1 to 10 carbon atoms, and x and y are integers from 1 to 10.
Claim 2
Dependent Claim
91 words
A photoresist composition comprising: a photosensitive composition comprising an admixture of a film-forming amount of a water-soluble, film-forming polymer comprising the combination of polyvinylpyrrolidone and polyvinyl alcohol; a cross-linking amount of a polymer-cross-linking, water-soluble photosensitive bisazide compound; a cross-linking amount of a polymer-cross-linking, adhesion-improving water-soluble photosensitive diazo compound; and an adhesion-activating amount of a water-soluble polyazamidesilane compound having the following formula: ##STR2## wherein R 1 , R 2 and R 3 are independently alkylenes containing carbon 1 to 10 carbon atoms, and x and y are integers from 1 to 10.
Claim 3
Dependent Claim
53 words
The photoresist composition according to claim 1, wherein said water-soluble polymer comprises a mixture of polyvinyl pyrrolidone and polyvinyl alcohol, the weight ratio of said polyvinyl alcohol to said polyvinyl pyrrolidone is 1:0.5 to 1:3.0, and the weight ratio of said water-soluble diazo compound to said water-soluble bisazide compound is 1:3.0 to 1:7.0.
Claim 4
Dependent Claim
52 words
The photoresist composition according to claim 1, wherein the weight ratio of said polymer to said bisazide compound is 1:0.01 to 1:0.3, the weight ratio of said diazo compound to said bisazide compound is 1:1 to 1:10, and the weight ratio of said polymer to said silane compound is 1:0.001 to 1:0.2.
Claim 5
Dependent Claim
84 words
A photoresist composition comprising: a photosensitive composition comprising an admixture of a film-forming amount of a water-soluble, film-forming polymer comprising the combination of polyvinylpyrrolidone and polyvinyl alcohol; a cross-linking amount of a polymer-cross-linking, water-soluble photosensitive bisazide compound; a cross-linking amount of a polymer-cross-linking, adhesion-improving water-soluble photosensitive diazo compound; and an adhesion-activating amount of a water-soluble polyaminosilane compound having the following formula: H.sub.2 N(CH.sub.2 CH.sub.2 NH).sub.n CH.sub.2 CH.sub.2 CH.sub.2 Si(OR').sub.3 wherein R' is methyl or ethyl, and n is an integer from 2 to 10.
Claim 6
Dependent Claim
84 words
A photoresist composition comprising: a photosensitive composition comprising an admixture of a film-forming amount of a water-soluble, film-forming polymer comprising the combination of polyvinylpyrrolidone and polyvinyl alcohol; a cross-linking amount of a polymer-cross-linking, water-soluble photosensitive bisazide compound; a cross-linking amount of a polymer-cross-linking, adhesion-improving water-soluble photosensitive diazo compound; and an adhesion-activating amount of a water-soluble polyaminosilane compound having the following formula: H.sub.2 N(CH.sub.2 CH.sub.2 NH).sub.n CH.sub.2 CH.sub.2 CH.sub.2 Si(OR').sub.3 wherein R' is methyl or ethyl, and n is an integer from 2 to 10.
Claim 7
Dependent Claim
53 words
The photoresist composition according to claim 4, wherein said water-soluble polymer comprises a mixture of polyvinyl pyrrolidone and polyvinyl alcohol, the weight ratio of said polyvinyl alcohol to said polyvinyl pyrrolidone is 1:0.5 to 1:3.0, and the weight ratio of said water-soluble diazo compound to said water-soluble bisazide compound is 1:3.0 to 1:7.0.
Claim 8
Dependent Claim
96 words
A photoresist composition comprising: a photosensitive composition comprising an admixture of a film forming amount of a water-soluble, film-forming polymer comprising the combination of polyvinylpyrrolidone and polyvinyl alcohol; a cross-linking amount of a polymer-cross-linking, water soluble photosensitive 4,4-bisazidestilbene-2,2'-disulfonicacid disodium salt; a cross-linking amount of a polymer-cross-linking, adhesion-improving water-soluble photosensitive diazodiphenylamine formaldehyde condensation product; and an adhesion-activating amount of a water-soluble polyazamidesilane compound having the following formula: ##STR3## wherein R 1 , R 2 and R 3 are independently alkylenes containing carbon 1 to 10 carbon atoms, and x and y are integers from 1 to 10.
Claim 9
Dependent Claim
96 words
A photoresist composition comprising: a photosensitive composition comprising an admixture of a film forming amount of a water-soluble, film-forming polymer comprising the combination of polyvinylpyrrolidone and polyvinyl alcohol; a cross-linking amount of a polymer-cross-linking, water soluble photosensitive 4,4-bisazidestilbene-2,2'-disulfonicacid disodium salt; a cross-linking amount of a polymer-cross-linking, adhesion-improving water-soluble photosensitive diazodiphenylamine formaldehyde condensation product; and an adhesion-activating amount of a water-soluble polyazamidesilane compound having the following formula: ##STR3## wherein R 1 , R 2 and R 3 are independently alkylenes containing carbon 1 to 10 carbon atoms, and x and y are integers from 1 to 10.
Claim 10
Dependent Claim
54 words
The photoresist composition according to claim 6, wherein said water-soluble polymer comprises a mixture of polyvinylpyrrolidone and polyvinyl alcohol, the weight ratio of said polyvinyl alcohol to said polyvinylpyrrolidone is 1:0.5 to 1:3.0, and the weight ratio of said water-soluble diazodiphenylamine formaldehyde condensation product to said water-soluble 4,4'-bisazidestilbene-2,2'-disulfonicacid disodium salts is 1:3.0 to 1:7.0.
Claim 11
Dependent Claim
88 words
A photoresist composition comprising: a photosensitive composition comprising an admixture of a film-forming amount of a water-soluble, film-forming polymer comprising the combination of polyvinylpyrrolidone and polyvinyl alcohol; a cross-linking amount of a polymer-cross-linking, water-soluble photosensitive 4,4-bisazidestilbene-2,2'-disulfonicacid photosensitive disodium salt; a cross-linking amount of a polymer-cross-linking, adhesion-improving water-soluble photosensitive diazodiphenylamine formaldehyde condensation product; and an adhesion-activating amount of a water-soluble polyaminosilane compound having the following formula: H.sub.2 N(CH.sub.2 CH.sub.2 NH).sub.n CH.sub.2 CH.sub.2 CH.sub.2 Si(OR').sub.3 wherein R' is methyl or ethyl, and n is an integer from 1 to 10.
Claim 12
Dependent Claim
88 words
A photoresist composition comprising: a photosensitive composition comprising an admixture of a film-forming amount of a water-soluble, film-forming polymer comprising the combination of polyvinylpyrrolidone and polyvinyl alcohol; a cross-linking amount of a polymer-cross-linking, water-soluble photosensitive 4,4-bisazidestilbene-2,2'-disulfonicacid photosensitive disodium salt; a cross-linking amount of a polymer-cross-linking, adhesion-improving water-soluble photosensitive diazodiphenylamine formaldehyde condensation product; and an adhesion-activating amount of a water-soluble polyaminosilane compound having the following formula: H.sub.2 N(CH.sub.2 CH.sub.2 NH).sub.n CH.sub.2 CH.sub.2 CH.sub.2 Si(OR').sub.3 wherein R' is methyl or ethyl, and n is an integer from 1 to 10.
Claim 13
Dependent Claim
54 words
The photoresist composition according to claim 8, wherein said water-soluble polymer comprises a mixture of polyvinylpyrrolidone and polyvinyl alcohol, the weight ratio of said polyvinyl alcohol to said polyvinylpyrrolidone is 1:0.5 to 1:3.0, and the weight ratio of said water-soluble diazodiphenylamine formaldehyde condensation product to said water-soluble 4,4'-bisazidestilbene-2,2'-disulfonicacid disodium salts is 1:3.0 to 1:7.0.
References Cited (Backward Citations)
US2937085A
Cited
US3387975A
Cited
US3549368A
Cited
US3615538A
Cited
US3679419A
Cited
GB1376114A
Cited
US3917794A
Cited
US4099973A
Cited
JPS5119982A
Cited
JPS5148946A
Cited
JPS5359506A
Cited
JPS566530A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-01-01 | 1988-07-02 | 1989-01-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-01-01 | 1992-07-02 | 1993-01-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-01-01 | 1996-07-02 | 1997-01-01 | $7700.00 | Window Closed / Lapsed |