US4486526A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials
Assignee: Imperial Metal and Chemical Co
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Filing: 1983-06-09
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Granted: 1984-12-04
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Expires: 2003-06-09
Abstract
Abstract A photopolymerizable coating over a diazo resin provides a high-speed lithographic plate or photoresist while improving the printing life of the plate while making its development simpler than that of most other photopolymer plates. The photopolymer is a cinnamoylated resin which is placed over a diazo based material.
Inventors
- 👤 Daniel C. Thomas
- 👤 Jack L. Sorkin
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 06:41
CPC Classifications
C; C08; C08G; C08G18/00; C08G18/06; C08G18/83; C08G18/831; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/095; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/107
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
63 words
A high-speed presensitized plate for lithography or photoresist etching, including in combination a plate base, a sub-base coating over said plate base, a layer of a light sensitive diazo resin condensation product of an aldehyde and a diazonium compound over the sub-base coating and a cinnamate photopolymer coating over said diazo resin layer, wherein the photopolymer coating contains phenol-blocked isocyanate polyurethane cinnamate polymer.
Claim 2
Dependent Claim
63 words
A high-speed presensitized plate for lithography or photoresist etching, including in combination a plate base, a sub-base coating over said plate base, a layer of a light sensitive diazo resin condensation product of an aldehyde and a diazonium compound over the sub-base coating and a cinnamate photopolymer coating over said diazo resin layer, wherein the photopolymer coating contains phenol-blocked isocyanate polyurethane cinnamate polymer.
Claim 3
Independent Claim
69 words
A method of converting an unlacquered negative-working diazo resin lithographic or photoresist plate wherein the diazo resin is a light sensitive condensation product of an aldehyde and a diazonium compound to a high-speed negative-working lithographic or photoresist plate, which method comprises coating the diazo resin with a cinnamate photopolymer coating wherein said photopolymer coating comprises phenol-blocked isocyanate polyurethane cinnamate photopolymer, said method including unblocking said photopolymer by heating same.
Claim 4
Independent Claim
69 words
A method of converting an unlacquered negative-working diazo resin lithographic or photoresist plate wherein the diazo resin is a light sensitive condensation product of an aldehyde and a diazonium compound to a high-speed negative-working lithographic or photoresist plate, which method comprises coating the diazo resin with a cinnamate photopolymer coating wherein said photopolymer coating comprises phenol-blocked isocyanate polyurethane cinnamate photopolymer, said method including unblocking said photopolymer by heating same.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-12-04 | 1988-06-04 | 1988-12-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-12-04 | 1992-06-04 | 1992-12-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-12-04 | 1996-06-04 | 1996-12-04 | $7700.00 | Window Closed / Lapsed |