Integrated circuit method

Claim 2

Process for manufacturing an integrated circuit including a plurality of transistors, comprising the steps of: a. forming a monocrystalline semiconductor substrate of P or N type conductivity with an epitaxial layer of the same type of conductivity; b. etching isolation trenches completely through the epitaxial layer into the substrate to form with each trench two epitaxial regions which are separated from each other by said trench; c. coating the inner surface including the bottom of the trenches with a layer of semiconductor oxide to provide coated trenches; d. depositing a filling of unoxidized polycrystalline semiconductor material within the coated trenches on the layer of semiconductor oxide to form therewith a dielectric isolation region within said trench and to completely fill said coated trench with unoxidized polycrystalline semiconductor material so that air gaps are prevented from being formed in said isolation region; and e. forming a plurality of pairs of transistors in said epitaxial layer, each pair of transistors having different transistors formed in the two epitaxial regions separated by said trench so that said pair of transistors are electrically isolated from each other by said isolation region.

Claim 3

Process in accordance with claim 1 in which the etching is reactive ion etching which forms the trench with substantially vertical sides.

Claim 4

Process in accordance with claim 1 in which the pair of transistors are formed as complementary transistors of opposite types of conductivity.

Claim 5

Process in accordance with claim 3 in which the pair of complementary transistors are insulated gate field effect transistors formed with channels of opposite types of conductivity by depositing in one of said two epitaxial regions a well portion of opposite type of conductivity to that of the epitaxial layer.

Claim 6

Process in accordance with claim 4 which also includes depositing a channel region on the other of said two epitaxial regions which is the same type of conductivity as that of the epitaxial layer but is of a lower resistivity.

Claim 7

Process in accordance with claim 5 which also includes forming a gate insulating layer of semiconductor oxide on the surfaces of said channel region and said well region, and depositing two separate gate regions of doped polycrystalline semiconductor material on said gate insulating layer above different ones of said channel region and said well region.

Claim 8

Process in accordance with claim 1 in which the semiconductor substrate and epitaxial layer are formed of silicon and a mask layer of silicon dioxide is formed on the epitaxial layer with mask openings through which the isolation trenches are etched.

Claim 9

Process in accordance with claim 2 in which the reactive ion etching forms the trench sides with a positive slope so that the opposite sides slope outward continuously from the bottom to the top of the trench.

Claim 10

A process for manufacturing an integrated circuit including a plurality of insulated gate field effect transistors free of bird's beak distortion, comprising the steps of: forming a monocrystalline semiconductor substrate of P or N type conductivity with an epitaxial layer of the same type of conductivity including a raised channel portion; forming a gate insulation layer of semiconductor oxide on the channel portion of said epitaxial layer and on channel side walls extending upward from the epitaxial layer; depositing a nitride layer of semiconductor nitride over said gate insulation layer including nitride side wall portions over said channel side walls; depositing a dielectric isolation region of semiconductor oxide on the epitaxial layer around said channel portion and on the nitride side wall portion covering the channel side walls so that said nitride layer prevents lateral diffusion of the oxygen atoms between said isolation region and the gate insulation layer to stop the growth of bird's beak distortion in said gate insulation layer; etching the nitride layer from the portion of the gate insulation layer over the channel portion without removing the nitride layer from the side walls of the channel portion; depositing source and drain elements in the channel portion of opposite type of conductivity to said channel portion; forming a gate element of polycrystalline semiconductor material on the gate insulation layer over the channel region; and depositing metal contacts on the source, drain and gate portions.

Claim 11

A process for manufacturing an integrated circuit including a plurality of insulated gate field effect transistors free of bird's beak distortion, comprising the steps of: forming a monocrystalline semiconductor substrate of P or N type conductivity with an epitaxial layer of the same type of conductivity including a raised channel portion; forming a gate insulation layer of semiconductor oxide on the channel portion of said epitaxial layer and on channel side walls extending upward from the epitaxial layer; depositing a nitride layer of semiconductor nitride over said gate insulation layer including nitride side wall portions over said channel side walls; depositing a dielectric isolation region of semiconductor oxide on the epitaxial layer around said channel portion and on the nitride side wall portion covering the channel side walls so that said nitride layer prevents lateral diffusion of the oxygen atoms between said isolation region and the gate insulation layer to stop the growth of bird's beak distortion in said gate insulation layer; etching the nitride layer from the portion of the gate insulation layer over the channel portion without removing the nitride layer from the side walls of the channel portion; depositing source and drain elements in the channel portion of opposite type of conductivity to said channel portion; forming a gate element of polycrystalline semiconductor material on the gate insulation layer over the channel region; and depositing metal contacts on the source, drain and gate portions.

Claim 12

Process of claim 9 in which the semiconductor substrate is made of silicon and the nitride layer is of silicon nitride.

Claim 13

Process of claim 9 which also includes depositing an outer insulating layer of semiconductor oxide over the gate element, the gate insulation layer, the source and the drain elements and forming said electrical contacts through apertures in said outer insulating layer.

Claim 14

Process of claim 9 in which the nitride layer is etched by reactive ion etching.

Claim 15

Process of claim 9 in which the nitride layer is in the form of an inverted cup covering the gate insulation layer on the raised channel portion.

Claim 16

Process of claim 9 in which the nitride layer is of greater thickness over the channel portion than over the surrounding epitaxial layer portion before etching and after etching the nitride layer is completely removed over said surrounding portion while part of the nitride layer remains on the channel portion and the side wall portion.