← Back to Patent Explorer
US4484995A Expired / Lapsed US ⏱️ 0.0 years remaining

Thermally controlled sputtering of high anisotropy magnetic material

Assignee: Grumman Corp
•
Filing: 1984-02-07
•
Granted: 1984-11-27
•
Expires: 2004-02-07
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A substrate coating of a ferromagnetic alloy of a rare earth-transition element mixture is prepared by a hollow cathode sputtering deposition method to produce near single domain films on various substrates.

Inventors

  • 👤 Ronald G. Pirich
  • 👤 David J. Larson, Jr.

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 15:31
CPC Classifications
H; H01; H01F; H01F10/00; H01F10/08; H01F10/10; H01F10/12; H01F10/126; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; C23C14/3414; H01F41/00; H01F41/14; H01F41/18

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 84 words
A method of coating a substrate with a magnetic material composed of a ferromagnetic alloy of a rare earth-transition element mixture which comprises hollow cathode sputtering a ferromagnetic alloy of a rare earth-transition element mixture from multiple sources, wherein each component of said mixture is sputtered from one of said multiple sources, at a temperature of from 200° C. to 1000° C. in an inert atmosphere onto a substrate to provide a coating thickness on said substrate of from 0.1 microns to 100 microns.
Claim 2
Independent Claim 84 words
A method of coating a substrate with a magnetic material composed of a ferromagnetic alloy of a rare earth-transition element mixture which comprises hollow cathode sputtering a ferromagnetic alloy of a rare earth-transition element mixture from multiple sources, wherein each component of said mixture is sputtered from one of said multiple sources, at a temperature of from 200° C. to 1000° C. in an inert atmosphere onto a substrate to provide a coating thickness on said substrate of from 0.1 microns to 100 microns.
Claim 3
Dependent Claim 21 words
The method of claim 1 wherein said sputtering is effected at a deposition rate of from 1 micron/hr to 50 microns/hr.
Claim 4
Dependent Claim 19 words
The method of claim 1 wherein the particle size of said substrate coating is less than about 2 microns.
Claim 5
Dependent Claim 32 words
The method of claim 1 wherein said inert atmosphere is provided by a gas selected from the group consisting of argon, helium, or neon or a suitable mixture of said inert gases.
Claim 6
Dependent Claim 39 words
The method of claim 1 wherein said hollow cathode sputtering is effected in a hollow cathode sputtering apparatus which employs a pressure in the range of from 10 microns to 200 microns, inert gas or mixture of inert gases.
Claim 7
Dependent Claim 23 words
The method of claim 1 wherein said substrate is contained in a substrate holder comprised of copper block having resistive heaters embedded therein.
Claim 8
Dependent Claim 23 words
The method of claim 6 further comprising containing said substrate holder in a static magnetic field which produces in-plane or out-of-plane magnetic alignment.
Claim 9
Dependent Claim 29 words
The method of claim 1 wherein said substrate is selected from copper, aluminum, aluminum oxide, titanium, glass or a transition metal element such as iron, Mn, Co, and Ni.
Claim 10
Dependent Claim 32 words
The method of claim 1 wherein said ferromagnetic alloy is selected from a mixture of Sm 2 Co 17 and Co and Sm and produced at an Ar pressure of 150 microns.
Claim 11
Dependent Claim 19 words
The method of claim 9 wherein said substrate temperature during processing is maintained in the range of 900° C.
Claim 12
Dependent Claim 30 words
The method of claim 1 wherein said ferromagnetic alloy is selected from a mixture of SmFe 17 and Fe and Sm and produced at an Ar pressure of 10 microns.
Claim 13
Dependent Claim 19 words
The method of claim 11 wherein said substrate temperature during processing is maintained in the range of 800°-900° C.

References Cited (Backward Citations)

US3625849A Cited
US4024299A Cited
US4367253A Cited
US4347112A Cited
US4324631A Cited
US4347086A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-11-27 1988-05-28 1988-11-27 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-11-27 1992-05-28 1992-11-27 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-11-27 1996-05-28 1996-11-27 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag