US4481233A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for producing solid-state color image pickup array
Assignee: Canon Inc
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Filing: 1983-02-16
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Granted: 1984-11-06
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Expires: 2003-02-16
Abstract
Abstract A process for producing a solid-state color pickup array, which comprises forming a resist mask on a wafer having a solid image pickup array; vapor-depositing a colorant on the wafer having the resist mask and on the resist mask; and removing the resist mask by dissolution, thereby eliminating selectively the colorant film vapor-deposited on the resist mask.
Inventors
- 👤 Hajime Sakata
- 👤 Kojiro Yokono
- 👤 Seiichi Takahashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0005; G03F7/0007; B; B05; B05D; B05D1/00; B05D1/32; B05D1/322; B05D1/327; B05D1/60
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
92 words
A process for producing a solid-state color pickup array, which comprises: (a) forming a resist mask on a wafer having a solid-state image pickup array wherein the portion of the wafer having the resist mask formed thereon is the unexposed portion of the wafer and the remainder of the wafer is the exposed portion; (b) vapor-depositing a colorant on the exposed wafer and on the resist mask on the wafer; and (c) removing by dissolution the resist mask thereby also eliminating the portion of the colorant film vapor-deposited on the resist mask.
Claim 2
Dependent Claim
92 words
A process for producing a solid-state color pickup array, which comprises: (a) forming a resist mask on a wafer having a solid-state image pickup array wherein the portion of the wafer having the resist mask formed thereon is the unexposed portion of the wafer and the remainder of the wafer is the exposed portion; (b) vapor-depositing a colorant on the exposed wafer and on the resist mask on the wafer; and (c) removing by dissolution the resist mask thereby also eliminating the portion of the colorant film vapor-deposited on the resist mask.
Claim 3
Dependent Claim
18 words
The process according to claim 1, wherein the resist mask is formed of a positive type of resist.
Claim 4
Dependent Claim
16 words
The process according to claim 1, wherein the colorant film has a thickness of 1000-10,000 Å.
Claim 5
Dependent Claim
26 words
The process according to claim 1, further comprising forming a transparent protective coating after the step for removing the colorant film vapor-deposited on the resist mask.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-11-06 | 1988-05-07 | 1988-11-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-11-06 | 1992-05-07 | 1992-11-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-11-06 | 1996-05-07 | 1996-11-06 | $7700.00 | Window Closed / Lapsed |