Patent US3736178A successfully refreshed from Google Patents.
Patent US4477182A successfully refreshed from Google Patents.
US4477182A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Pattern exposing apparatus
Assignee: Hitachi Ltd
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Filing: 1982-07-09
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Granted: 1984-10-16
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Expires: 2002-07-09
Abstract
Abstract A pattern exposing apparatus comprising means for projecting a semiconductor device mask pattern onto the photoresist layer coated on a semiconductor substrate, and means for projecting an identification mark which is specific to each substrate onto a part of the photoresist layer.
Inventors
- 👤 Akihiro Takanashi
- 👤 Norikazu Hashimoto
- 👤 Hisashi Maejima
- 👤 Shuji Sugiyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 04:46
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70491; G03F7/70541
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
79 words
A pattern exposing apparatus comprising means for projecting a semiconductor device mask pattern onto a photo-sensitive layer coated on a semiconductor substrate; optical positioning means including an optical system for pre-aligning a semiconductor substrate to be exposed next; and means for projecting an identification mark which is specific to each semiconductor substrate onto a part of said photo-sensitive layer, said identification mark projecting means being arranged to share a part of the optical system of said optical positioning means.
Claim 2
Dependent Claim
79 words
A pattern exposing apparatus comprising means for projecting a semiconductor device mask pattern onto a photo-sensitive layer coated on a semiconductor substrate; optical positioning means including an optical system for pre-aligning a semiconductor substrate to be exposed next; and means for projecting an identification mark which is specific to each semiconductor substrate onto a part of said photo-sensitive layer, said identification mark projecting means being arranged to share a part of the optical system of said optical positioning means.
Claim 3
Dependent Claim
28 words
A pattern exposing apparatus according to claim 1, wherein said identification mark projecting means is provided as an optical system separately from said device mask pattern projecting means.
Claim 4
Dependent Claim
36 words
A pattern exposing apparatus according to claim 1, wherein said identification mark projecting means includes a plurality of members each being capable of presenting a character or symbol selected from a variety of characters or symbols.
Claim 5
Dependent Claim
27 words
A pattern exposing apparatus according to claim 3, wherein said members are rotary discs each carrying a variety of characters or symbols in a peripheral portion thereof.
Claim 6
Dependent Claim
26 words
A pattern exposing apparatus according to claim 3, wherein said members are disposed in proximity to each other and jointly provide characters forming an identification mark.
Claim 7
Dependent Claim
23 words
A pattern exposing apparatus according to claim 1, wherein said optical positioning means includes monitor means for pre-aligning a semiconductor substrate with cursors.
Claim 8
Dependent Claim
34 words
A pattern exposing apparatus according to claim 1, wherein said shared part of said optical system includes a stage capable of mounting and rotating the semiconductor substrate in the process of effecting alignment thereof.
Claim 9
Independent Claim
89 words
A method of exposing a pattern on a semiconductor substrate, comprising the steps of supplying a semiconductor substrate having a photo-sensitive layer coated on a surface thereof to an alignment station; aligning said semiconductor substrate at said alignment station; projecting an identification mark which is specific to said semiconductor substrate at said alignment station onto said photo-sensitive layer; moving said semiconductor substrate from said alignment station to a main projection station; and projecting a mask pattern onto the photo-sensitive layer of said semiconductor substrate at said main projection station.
Claim 10
Independent Claim
89 words
A method of exposing a pattern on a semiconductor substrate, comprising the steps of supplying a semiconductor substrate having a photo-sensitive layer coated on a surface thereof to an alignment station; aligning said semiconductor substrate at said alignment station; projecting an identification mark which is specific to said semiconductor substrate at said alignment station onto said photo-sensitive layer; moving said semiconductor substrate from said alignment station to a main projection station; and projecting a mask pattern onto the photo-sensitive layer of said semiconductor substrate at said main projection station.
Claim 11
Dependent Claim
43 words
A method according to claim 8, wherein said step of aligning said semiconductor substrate is carried out using an optical system, and wherein said step of projecting an identification mark onto said photo-sensitive layer employs at least a part of said optical system.
Claim 12
Dependent Claim
49 words
A method according to claim 9, wherein said step of projecting an identification mark onto said photo-sensitive layer includes selectively positioning in an optical path of said optical system a member carrying a plurality of identification marks so that a selected identification mark is projected onto said photo-sensitive layer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-10-16 | 1988-04-16 | 1988-10-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-10-16 | 1992-04-16 | 1992-10-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-10-16 | 1996-04-16 | 1996-10-16 | $7700.00 | Window Closed / Lapsed |