Abstract In the manufacture of a CMOS device, oxide is etched away from polysilicon gate-level interconnects, and from source or drain regions of either conductivity type to which the polysilicon gate-level interconnect is desired to be connected. A metal is then deposited, and silicide is formed to connect the gate-level interconnect to the respective source and drain regions. To ensure continuity of the silicide connection, the gate oxide beneath the gate level interconnect is slightly undercut by a wet etching process, additional polysilicon is deposited conformally overall, and the additional polysilicon is anisotropically etched so that it is removed from all areas except those within the undercut region beneath the gate-level interconnect thus a continuous surface of silicon, from which a continuous layer of silicide is then grown, exists between the polysilicon gate-level interconnect and the respective source and drain regions. Thus, self-aligned contacts are created, and no unwanted pn junctions are created.
An integrated circuit buried contact structure comprising: a silicon substrate; a thin insulator layer, said thin insulator layer exposing contact regions of said substrate; a layer of gate-level polysilicon on said insulator layer, said polysilicon including respective portions adjacent to said respective contact regions of said substrate; said insulator layer defining a recess beneath said polysilicon adjacent to said contact area of said substrate, said recess containing a material comprising high-resistivity polysilicon; and a metal silicide layer which is in contact both with said contact area of said substrate and with said gate-level polysilicon and is continuous therebetween.
Claim 2
Dependent Claim
98 words
An integrated circuit buried contact structure comprising: a silicon substrate; a thin insulator layer, said thin insulator layer exposing contact regions of said substrate; a layer of gate-level polysilicon on said insulator layer, said polysilicon including respective portions adjacent to said respective contact regions of said substrate; said insulator layer defining a recess beneath said polysilicon adjacent to said contact area of said substrate, said recess containing a material comprising high-resistivity polysilicon; and a metal silicide layer which is in contact both with said contact area of said substrate and with said gate-level polysilicon and is continuous therebetween.
Claim 3
Dependent Claim
23 words
The structure of claim 1, wherein said metal silicide is selected from the group consisting of: titanium silicide, platinum silicide, and tungsten silicide.
Claim 4
Dependent Claim
20 words
The structure of claim 1, wherein said gate-level polysilicon comprises a dopant concentration greater than 10 16 atoms per cc.
Claim 5
Dependent Claim
19 words
The structure of claim 1, wherein said lightly-doped polysilicon comprises a dopant concentration less than 10 15 per cc.
Claim 6
Dependent Claim
15 words
The structure of claim 1, wherein said insulator layer is less than one micron thick.
Claim 7
Dependent Claim
15 words
The structure of claim 1, wherein said contact area of said substrate is heavily doped.
Claim 8
Dependent Claim
20 words
The structure of claim 1, wherein said gate-level polysilicon and said contact area of said substrate comprise opposite conductivity types.
Claim 9
Dependent Claim
38 words
The structure of claim 1, wherein said gate-level polysilicon is elongated to make contact both to a first-conductivity-type one of said contact areas of said substrate and to a second-conductivity-type one of said contact areas of said substrate.