US4475811A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Overlay test measurement systems
Assignee: SVG LITHOGRAPHY Inc A CORP OF
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Filing: 1983-04-28
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Granted: 1984-10-09
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Expires: 2003-04-28
Abstract
Abstract This invention relates to overlay test measurement systems which are useful for testing lithographic instruments used in making microcircuits, which includes a single second-level pattern set in the middle of a checkerboard-like arrangement of first level patterns alternating with opaque patterns, the patterns being constructed and arranged so that if a second substantially identical cluster is imaged on the first cluster with the second level pattern of the second cluster aligned with any one of the first level patterns on the first cluster then the opaque patterns of the second cluster would be aligned with the other first level patterns on the first cluster thereby protecting them from exposure. According to a feature of the invention there is provided a method of making a test wafer of the type described as well as a method of testing the alignment of lithographic tools using the aforesaid test mask and test wafer.
Inventors
- 👤 Timothy A. Brunner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 11:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70605; G03F7/70616; G03F7/70633
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
133 words
A test wafer for testing the overlay for alignment of a second level pattern over a first level pattern for testing lithographic instruments used in making microcircuits comprising: a wafer having a cluster in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively, said patterns being constructed and arranged so that if a second substantially identical cluster is imaged on said first cluster with said second level pattern of the second cluster aligned with any one of said first level patterns on said first cluster then the opaque patterns of the second cluster would be aligned with the other first level patterns on said first cluster.
Claim 2
Dependent Claim
133 words
A test wafer for testing the overlay for alignment of a second level pattern over a first level pattern for testing lithographic instruments used in making microcircuits comprising: a wafer having a cluster in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively, said patterns being constructed and arranged so that if a second substantially identical cluster is imaged on said first cluster with said second level pattern of the second cluster aligned with any one of said first level patterns on said first cluster then the opaque patterns of the second cluster would be aligned with the other first level patterns on said first cluster.
Claim 3
Dependent Claim
31 words
A test wafer according to claim 1 wherein said test wafer has a plurality of clusters similar to the first cluster disposed in spaced relationship one with respect to the others.
Claim 4
Dependent Claim
16 words
A test wafer according to claim 1 wherein said patterns are disposed in a checkerboard-like configuration.
Claim 5
Dependent Claim
139 words
A master test mask usable for making a test wafer for testing the overlay alignment of a second level pattern over a first level pattern for testing lithographic equipment used in making microcircuits comprising: a mask having a cluster in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively, said patterns being constructed and arranged so that if said patterns are imaged onto a second substantially identical cluster with said second level pattern of the first cluster aligned with any one of said first level patterns on said second cluster then the opaque patterns of said first cluster would be aligned with the other first level patterns on said second cluster respectively.
Claim 6
Dependent Claim
139 words
A master test mask usable for making a test wafer for testing the overlay alignment of a second level pattern over a first level pattern for testing lithographic equipment used in making microcircuits comprising: a mask having a cluster in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively, said patterns being constructed and arranged so that if said patterns are imaged onto a second substantially identical cluster with said second level pattern of the first cluster aligned with any one of said first level patterns on said second cluster then the opaque patterns of said first cluster would be aligned with the other first level patterns on said second cluster respectively.
Claim 7
Dependent Claim
32 words
A master test mask according to claim 4 wherein said test mask has a plurality of clusters similar to the first cluster disposed in spaced relationship one with respect to the others.
Claim 8
Dependent Claim
17 words
A master test mask according to claim 4 wherein said patterns are disposed in a checkerboard-like configuration.
Claim 9
Independent Claim
172 words
A method of making a test wafer for testing the overlay alignment of a second level pattern over a first level pattern for testing lithographic equipment used in making microcircuits comprising the steps of: imaging a master test mask onto a photoresist coated test wafer, said test mask having a cluster in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively; exposing said test wafer to form an image of said test mask patterns on said test wafer, said patterns being constructed and arranged so that if the patterns on said master test mask are imaged on said test wafer with said second level pattern of said test mask being aligned with any one of said first level patterns on said test wafer than the opaque patterns of the test mask would be aligned with the other first level patterns on said test wafer respectively.
Claim 10
Independent Claim
172 words
A method of making a test wafer for testing the overlay alignment of a second level pattern over a first level pattern for testing lithographic equipment used in making microcircuits comprising the steps of: imaging a master test mask onto a photoresist coated test wafer, said test mask having a cluster in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively; exposing said test wafer to form an image of said test mask patterns on said test wafer, said patterns being constructed and arranged so that if the patterns on said master test mask are imaged on said test wafer with said second level pattern of said test mask being aligned with any one of said first level patterns on said test wafer than the opaque patterns of the test mask would be aligned with the other first level patterns on said test wafer respectively.
Claim 11
Independent Claim
180 words
A method of making a test wafer for testing the overlay alignment of a second level pattern over a first level pattern for testing lithographic equipment used in making microcircuits comprising the steps of: inserting a master test mask into a projection mask aligner, said test mask having a cluster in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively; inserting a photoresist coated test wafer into said projection mask aligner, exposing said test wafer to form an image of said patterns on said test wafer; said patterns being constructed and arranged so that if the patterns on said master test mask are imaged on said test wafer with said second level pattern of said test mask being aligned with any one of said first level patterns on said test wafer then the opaque patterns of the test mask would be aligned with the other first level patterns on said test wafer respectively.
Claim 12
Independent Claim
180 words
A method of making a test wafer for testing the overlay alignment of a second level pattern over a first level pattern for testing lithographic equipment used in making microcircuits comprising the steps of: inserting a master test mask into a projection mask aligner, said test mask having a cluster in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively; inserting a photoresist coated test wafer into said projection mask aligner, exposing said test wafer to form an image of said patterns on said test wafer; said patterns being constructed and arranged so that if the patterns on said master test mask are imaged on said test wafer with said second level pattern of said test mask being aligned with any one of said first level patterns on said test wafer then the opaque patterns of the test mask would be aligned with the other first level patterns on said test wafer respectively.
Claim 13
Dependent Claim
34 words
A method of making a test wafer according to claim 8 wherein said mask has a plurality of clusters similar to the first cluster disposed in spaced relationship one with respect to the others.
Claim 14
Dependent Claim
20 words
A method of making a test wafer according to claim 8 wherein said patterns are disposed in a checkerboard-like configuration.
Claim 15
Independent Claim
169 words
A method of testing the alignment of lithographic instruments comprising the steps of: inserting a master test mask into a lithographic instrument, said test mask having a cluster of patterns in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively; inserting a photoresist coated test wafer into said lithographic instrument, said test wafer having an image of the cluster of patterns on the test mask; aligning said test mask so that the second level pattern of the test mask is aligned with a preselected one of said first level patterns on said test wafer, said patterns being constructed and arranged so that the opaque patterns of the test mask are aligned with the other first level patterns on said test wafer respectively; exposing and developing said test wafer and electrically testing said exposed test wafer to thereby test the accuracy of alignment.
Claim 16
Independent Claim
169 words
A method of testing the alignment of lithographic instruments comprising the steps of: inserting a master test mask into a lithographic instrument, said test mask having a cluster of patterns in the form of a plurality of first level patterns alternating with a plurality of opaque patterns and a single second level pattern, said first level patterns and said opaque patterns being of substantially equal areas respectively; inserting a photoresist coated test wafer into said lithographic instrument, said test wafer having an image of the cluster of patterns on the test mask; aligning said test mask so that the second level pattern of the test mask is aligned with a preselected one of said first level patterns on said test wafer, said patterns being constructed and arranged so that the opaque patterns of the test mask are aligned with the other first level patterns on said test wafer respectively; exposing and developing said test wafer and electrically testing said exposed test wafer to thereby test the accuracy of alignment.
Claim 17
Dependent Claim
31 words
A method of testing according to claim 11 wherein said mask has a plurality of clusters similar to the first cluster disposed in spaced relationship one with respect to the others.
Claim 18
Dependent Claim
15 words
A method according to claim 11 wherein said patterns are disposed in a checkerboard-like configuration.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-10-09 | 1988-04-09 | 1988-10-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-10-09 | 1992-04-09 | 1992-10-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-10-09 | 1996-04-09 | 1996-10-09 | $7700.00 | Window Closed / Lapsed |