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MESFET Using a shallow junction gate structure on GaInAs

Assignee: Nokia Bell Labs
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Filing: 1981-12-04
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Granted: 1984-09-11
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Expires: 2001-12-04
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Abstract

Abstract A thin and highly doped Ga 0 .47 In 0 .53 As layer disposed on a Ga 0 .47 In 0 .53 As layer increases the barrier height and produces useful device characteristics. For example, the structure may be used as the gate electrode in an InGaAs field effect transistor.

Inventors

  • 👤 Chung Y. Chen
  • 👤 Alfred Y. Cho

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 20:07
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/60; H10D30/67; H10D30/6729; H10D30/6737; H10D30/6738; H10D30/674; H10D30/675; H10D30/80; H10D30/87; H10D62/00; H10D62/80; H10D62/85; H10D62/852; H10D64/00; H10D64/60; H10D64/64; H10D8/00; H10D8/60

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 85 words
A semiconductor device comprising a InP substrate, and disposed on said substrate a first epitaxial layer comprising InGaAs having a N conductivity type, a second epitaxial layer comprising InGaAs having a P conductivity type, said second layer having a thickness between approximately 70 and 1000 Angstroms, a first electrical contact to said second layer; second and third electrical contacts to said first epitaxial layer deposited on and extending through said second layer, said first electrical contact being intermediate said second and said third electrical contacts.
Claim 2
Dependent Claim 85 words
A semiconductor device comprising a InP substrate, and disposed on said substrate a first epitaxial layer comprising InGaAs having a N conductivity type, a second epitaxial layer comprising InGaAs having a P conductivity type, said second layer having a thickness between approximately 70 and 1000 Angstroms, a first electrical contact to said second layer; second and third electrical contacts to said first epitaxial layer deposited on and extending through said second layer, said first electrical contact being intermediate said second and said third electrical contacts.
Claim 3
Dependent Claim 15 words
A device as recited in claim 1 further comprising an electrical contact to said substrate.
Claim 4
Dependent Claim 20 words
A device as recited in claim 2 in which said second epitaxial layer is essentially completely depleted at thermal equilibrium.
Claim 5
Dependent Claim 19 words
A device as recited in claim 3 in which said second layer has a thickness less than 150 Angstroms.
Claim 6
Dependent Claim 27 words
A device as recited in claim 1 in which said second epitaxial layer intermediate said first and second electrical contacts has a thickness less than 150 Angstroms.

References Cited (Backward Citations)

US3943552A Cited
US4075651A Cited
US4424525A Cited
US4350993A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-09-11 1988-03-12 1988-09-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-09-11 1992-03-12 1992-09-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-09-11 1996-03-12 1996-09-11 $7700.00 Window Closed / Lapsed

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