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US4467341A Expired / Lapsed US ⏱️ 0.0 years remaining

Charge transfer imaging device with blooming overflow drain beneath transfer channel

Assignee: Toshiba Corp
•
Filing: 1983-01-27
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Granted: 1984-08-21
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Expires: 2003-01-27
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Abstract

Abstract A charge trasfer imaging device is disclosed, which comprises photosensitive sites formed in and continuous to the surface of a semiconductor substrate for generating and storing signal charge in response to an incident light signal, a shift electrode for controlling the transfer of the signal charge through the semiconductor substrate, and a charge transfer shift register for reading out the signal charge by transferring the same from the shift electrode through transfer channels formed in and continuous to the semiconductor substrate surface. Semiconductor region of the opposite conductivity type to the semiconductor substrate is formed in the substrate other than a portion of the substrate below the photosensitive sites and at least under the transfer channels of the shift register, and a reverse bias voltage is applied between these semiconductor regions and the semiconductor substrate.

Inventors

  • 👤 Nobuo Suzuki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 23:43
CPC Classifications
H; H10; H10F; H10F39/00; H10F39/10; H10F39/12; H10F39/15; H10F39/158; H10F39/152

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 145 words
A charge transfer imaging device comprising: a semiconductor substrate of a first conductivity type; photosensitive sites formed in superficial portions of said semiconductor substrate for generating and storing signal charge in response to an incident light signal, said photosensitive sites being first semiconductor regions of a second conductivity type; a shift electrode for controlling the transfer of said signal charge through said semiconductor substrate; a charge transfer shift register for reading out said signal charge by transferring the same from said shift electrode through transfer channels formed in and continuous to the surface of said semiconductor substrate; a second semiconductor region formed in said semiconductor substrate other than a portion of the substrate below said photosensitive sites and at least under said transfer channels of said shift register; and means for applying a reverse bias voltage between said second semiconductor region and said semiconductor substrate.
Claim 2
Dependent Claim 145 words
A charge transfer imaging device comprising: a semiconductor substrate of a first conductivity type; photosensitive sites formed in superficial portions of said semiconductor substrate for generating and storing signal charge in response to an incident light signal, said photosensitive sites being first semiconductor regions of a second conductivity type; a shift electrode for controlling the transfer of said signal charge through said semiconductor substrate; a charge transfer shift register for reading out said signal charge by transferring the same from said shift electrode through transfer channels formed in and continuous to the surface of said semiconductor substrate; a second semiconductor region formed in said semiconductor substrate other than a portion of the substrate below said photosensitive sites and at least under said transfer channels of said shift register; and means for applying a reverse bias voltage between said second semiconductor region and said semiconductor substrate.
Claim 3
Dependent Claim 57 words
A charge transfer imaging device according to claim 1, wherein: said transfer channels are of the same conductivity type as said semiconductor substrate and are each formed in a third semiconductor region containing a higher concentration of impurity than said semiconductor substrate, and said second semiconductor region is formed under and contiguous to said third semiconductor region.
Claim 4
Dependent Claim 21 words
A charge transfer imaging device according to claim 1, wherein: said transfer channels form p-n junctions with said first semiconductor region.

References Cited (Backward Citations)

US3896474A Cited
US3896485A Cited
US4373167A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-08-21 1988-02-20 1988-08-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-08-21 1992-02-20 1992-08-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-08-21 1996-02-20 1996-08-21 $7700.00 Window Closed / Lapsed

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