US4459216A
Expired / Lapsed
US
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Chemical dissolving solution for metals
Assignee: Mitsubishi Gas Chemical Co Inc
•
Filing: 1983-05-06
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Granted: 1984-07-10
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Expires: 2003-05-06
Abstract
Abstract An aqueous acidic chemical dissolving solution comprising hydrogen peroxide, an inorganic acid and a specific aromatic compound is applicable to etching, pickling and surface treatment of various kinds of metals with a good stabilization effect and a good life, giving a metal surface with good luster.
Inventors
- 👤 Toshihiro Nakazato
- 👤 Itaru Ikeya
- 👤 Sadao Iida
- 👤 Toshihiko Yamazaki
- 👤 Yutaka Oshida
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 00:43
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/10; C23F1/14; C23F1/16; C23F1/28; C23F1/18; C23F3/00; C23F3/04; C23F3/06; C23G; C23G1/00; C23G1/02; C23G1/10; C23G1/103
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
64 words
An aqueous acidic chemical dissolving solution for metals, which comprises hydrogen peroxide, an inorganic acid and at least one aromatic compound having at least one amino group directly bonded to the benzene nucleus represented by the general formula: ##STR2## wherein X and Y are hydrogen atom, hydroxyl group, nitro group, amino group, carboxyl group and lower alkyl group of C 1 -C 4 .
Claim 2
Dependent Claim
64 words
An aqueous acidic chemical dissolving solution for metals, which comprises hydrogen peroxide, an inorganic acid and at least one aromatic compound having at least one amino group directly bonded to the benzene nucleus represented by the general formula: ##STR2## wherein X and Y are hydrogen atom, hydroxyl group, nitro group, amino group, carboxyl group and lower alkyl group of C 1 -C 4 .
Claim 3
Dependent Claim
25 words
The aqueous acidic chemical dissolving solution according to claim 1 wherein the aromatic compound is aniline aminophenol, diaminobenzene, aminobenzoic acid, toluidine, nitroaniline or aminosalicylic acid.
Claim 4
Dependent Claim
19 words
The aqueous acidic chemical dissolving solution according to claim 2, wherein the aromatic compound is aminophenol or aminobenzoic acid.
Claim 5
Dependent Claim
22 words
The aqueous acidic chemical dissolving solution according to claim 1 wherein the aromatic compound is in an amount of 0.01 g/l-100 g/l.
Claim 6
Dependent Claim
22 words
The aqueous acidic chemical dissolving solution according to claim 1, wherein the hydrogen peroxide is in an amount of 1 g/l-350 g/l.
Claim 7
Dependent Claim
22 words
The aqueous acidic chemical dissolving solution according to claim 1, wherein the inorganic acid is in an amount of 1 g/l-300 g/l.
Claim 8
Dependent Claim
90 words
An aqueous acidic chemical dissolving solution for etching or pickling copper or copper alloy, which comprises 5 g/l-100 g/l of hydrogen peroxide, 100 g/l-300 g/l of an inorganic acid containing at least 50 g/l of sulfuric acid as the essential component, and at least one aromatic compound having at least one amino group directly bonded to the benzene nucleus represented by the general formula: ##STR3## where X and Y are hydrogen atom, hydroxyl group, nitro group, amino group, carboxyl group, and lower alkyl group of C 1 -C 4 .
Claim 9
Dependent Claim
90 words
An aqueous acidic chemical dissolving solution for etching or pickling copper or copper alloy, which comprises 5 g/l-100 g/l of hydrogen peroxide, 100 g/l-300 g/l of an inorganic acid containing at least 50 g/l of sulfuric acid as the essential component, and at least one aromatic compound having at least one amino group directly bonded to the benzene nucleus represented by the general formula: ##STR3## where X and Y are hydrogen atom, hydroxyl group, nitro group, amino group, carboxyl group, and lower alkyl group of C 1 -C 4 .
Claim 10
Dependent Claim
88 words
An aqueous acidic chemical dissolving solution for polishing copper or copper alloy, which comprises 50 g/l-300 g/l of hydrogen peroxide, 1 g/l-100 g/l of an inorganic acid containing at least 0.5 g/l of sulfuric acid as the essential component, and at least one aromatic compound having at least one amino group directly bonded at the benzene nucleus represented by the general formula: ##STR4## wherein X and Y are hydrogen atom, hydroxyl group, nitro group, amino group, carboxyl group, and lower alkyl group of C 1 -C 4 .
Claim 11
Dependent Claim
88 words
An aqueous acidic chemical dissolving solution for polishing copper or copper alloy, which comprises 50 g/l-300 g/l of hydrogen peroxide, 1 g/l-100 g/l of an inorganic acid containing at least 0.5 g/l of sulfuric acid as the essential component, and at least one aromatic compound having at least one amino group directly bonded at the benzene nucleus represented by the general formula: ##STR4## wherein X and Y are hydrogen atom, hydroxyl group, nitro group, amino group, carboxyl group, and lower alkyl group of C 1 -C 4 .
Claim 12
Dependent Claim
92 words
An aqueous acidic chemical dissolving solution for treating iron or iron alloy, which comprises 30 g/l-300 g/l of hydrogen peroxide, 10 g/l-200 g/l of an inorganic acid containing at least 5 g/l of hydrofluoric acid or its acidic salt as the essential component, and at least one aromatic compound having at least one amino group directly bonded to the benzene nucleus represented by the general formula: ##STR5## wherein X and Y are hydrogen atom, hydroxyl group, nitro group, amino group, carboxyl group, and lower alkyl group of C 1 -C 4 .
Claim 13
Dependent Claim
92 words
An aqueous acidic chemical dissolving solution for treating iron or iron alloy, which comprises 30 g/l-300 g/l of hydrogen peroxide, 10 g/l-200 g/l of an inorganic acid containing at least 5 g/l of hydrofluoric acid or its acidic salt as the essential component, and at least one aromatic compound having at least one amino group directly bonded to the benzene nucleus represented by the general formula: ##STR5## wherein X and Y are hydrogen atom, hydroxyl group, nitro group, amino group, carboxyl group, and lower alkyl group of C 1 -C 4 .
Claim 14
Dependent Claim
26 words
The aqueous acidic chemical dissolving solution according to claim 7, 8 or 9, wherein the aromatic amine compound is in an amount of 0.01 g/l-100 g/l.
Claim 15
Dependent Claim
28 words
The aqueous acidic chemical dissolving solution according to claim 7, 8 or 9, wherein the aromatic compound is aniline aminophenol; diaminobenzene, aminobenzoic acid, toluidine, nitroaniline or aminosalicylic acid.
Claim 16
Dependent Claim
19 words
The aqueous acidic chemical dissolving solution according to claim 11, wherein the aromatic compound is aminophenol or aminobenzoic acid.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-07-10 | 1988-01-09 | 1988-07-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-07-10 | 1992-01-09 | 1992-07-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-07-10 | 1996-01-09 | 1996-07-10 | $7700.00 | Window Closed / Lapsed |