Patent US4451544A successfully refreshed from Google Patents.
US4451544A
Expired / Lapsed
US
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Mask structure for X-ray lithography and method for manufacturing the same
Assignee: Toshiba Corp
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Filing: 1982-06-17
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Granted: 1984-05-29
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Expires: 2002-06-17
Abstract
Abstract The invention provides a mask structure for X-ray lithography, having a mask substrate of an X-ray transmitting material, a mask pattern of an X-ray absorbing material which is formed on the surface of the mask substrate or therein, a support ring for supporting the rear periphery of the mask substrate, and a lattice-shaped metal film embedded in a lattice-shaped slit in the mask substrate. The mask structure with a large area has a dimensional stability.
Inventors
- 👤 Katsuhiro Kawabuchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 17:11
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/22; H; H10; H10P; H10P95/00; Y; Y10; Y10S; Y10S430/00; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
92 words
A mask structure for X-ray lithography, comprising; a mask substrate of an X-ray transmitting material; a lattice-shaped metal film for reinforcing said mask substrate, and which is embedded in a lattice-shaped slit formed corresponding to the positions of the dicing lines of the mask structure; a mask pattern of an X-ray absorbing material which is formed on one of a surface of said mask substrate and in said substrate, and in the area surrounded by said lattice-shaped metal film; and a support ring for supporting a rear periphery of said mask substrate.
Claim 2
Dependent Claim
92 words
A mask structure for X-ray lithography, comprising; a mask substrate of an X-ray transmitting material; a lattice-shaped metal film for reinforcing said mask substrate, and which is embedded in a lattice-shaped slit formed corresponding to the positions of the dicing lines of the mask structure; a mask pattern of an X-ray absorbing material which is formed on one of a surface of said mask substrate and in said substrate, and in the area surrounded by said lattice-shaped metal film; and a support ring for supporting a rear periphery of said mask substrate.
Claim 3
Dependent Claim
34 words
A structure according to claim 1, wherein said X-ray transmitting material is a member selected from the group consisting of silicon oxide, silicon nitride, polycrystalline silicon, boron nitride, a multi-layer structure thereof, and polyimide.
Claim 4
Dependent Claim
23 words
A structure according to claim 1, wherein said X-ray absorbing material is a member selected from the group consisting of gold and platinum.
Claim 5
Dependent Claim
27 words
A structure according to claim 3, wherein said lattice-shaped metal film is a member selected from the group consisting of a gold film and a platinum film.
Claim 6
Dependent Claim
22 words
A structure according to claim 1, wherein said support ring comprises a material selected from the group consisting of silicon and glass.
Claim 7
Dependent Claim
22 words
A structure according to claim 1, wherein said mask pattern is formed to be embedded in a slit formed in said substrate.
Claim 8
Independent Claim
109 words
A method for manufacturing a mask structure for X-ray lithography, comprising the steps of: (a) forming a mask substrate of an X-ray transmitting material on surfaces of a support plate; (b) forming a lattice-shaped slit in said mask substrate; (c) forming a lattice-shaped metal film by filling said lattice-shaped slit with a metal; (d) forming a mask pattern of an X-ray absorbing material on a surface of said mask substrate or therein after or simultaneously with the formation of said lattice-shaped metal film; and (e) forming a support ring on a rear periphery of said mask substrate by selectively etching said support plate to leave a peripheral portion thereof.
Claim 9
Independent Claim
109 words
A method for manufacturing a mask structure for X-ray lithography, comprising the steps of: (a) forming a mask substrate of an X-ray transmitting material on surfaces of a support plate; (b) forming a lattice-shaped slit in said mask substrate; (c) forming a lattice-shaped metal film by filling said lattice-shaped slit with a metal; (d) forming a mask pattern of an X-ray absorbing material on a surface of said mask substrate or therein after or simultaneously with the formation of said lattice-shaped metal film; and (e) forming a support ring on a rear periphery of said mask substrate by selectively etching said support plate to leave a peripheral portion thereof.
Claim 10
Dependent Claim
55 words
A method according to claim 7, wherein step (b) comprises the step of forming a slit pattern in said mask substrate so as to correspond to said mask pattern, and steps (c) and (d) comprise the step of filling said lattice-shaped slit and said slit pattern in said mask substrate with an X-ray absorbing metal.
Claim 11
Dependent Claim
43 words
A method according to claim 8, wherein said support plate comprises a conductive material, said mask substrate comprises an insulating material, and the step of filling said X-ray absorbing metal comprises the step of subjecting a structure obtained in step (b) to electroplating.
Claim 12
Dependent Claim
39 words
A method according to claim 9, wherein said support plate comprises silicon, and said mask substrate is made of a member selected from the group consisting of silicon oxide, silicon nitride, boron nitride, a multi-layer structure thereof, and polyimide.
Claim 13
Dependent Claim
67 words
A method according to claim 8, wherein the step of filling said X-ray absorbing metal comprises the steps of depositing said X-ray absorbing metal to cover the entire surface to a predetermined thickness, forming a smooth surface by coating a resist film, and etching said resist film and said X-ray absorbing metal to leave said X-ray absorbing metal only in said lattice-shaped slit and said slit pattern.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-05-29 | 1987-11-28 | 1988-05-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-05-29 | 1991-11-28 | 1992-05-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-05-29 | 1995-11-28 | 1996-05-29 | $7700.00 | Window Closed / Lapsed |