Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
119 words
Polymer etching apparatus, for patterning a film of polymer on a sample, including a reaction chamber having an electrode, portions of which electrode are in the vicinity of the sample being etched, characterized by: a coating, on portions of electrode in the vicinity of the sample being etched, which portions are to be exposed to accelerated particles which cause sputtering of electrode material, of a layer of material of the same material as the material being etched, whereby the coating on the electrode etches at a rate comparable to the etch rate of the film to be etched from the surface of the sample, eliminating the effect of backscattering of electrode material onto the etch areas of the sample.
Claim 2
Dependent Claim
119 words
Polymer etching apparatus, for patterning a film of polymer on a sample, including a reaction chamber having an electrode, portions of which electrode are in the vicinity of the sample being etched, characterized by: a coating, on portions of electrode in the vicinity of the sample being etched, which portions are to be exposed to accelerated particles which cause sputtering of electrode material, of a layer of material of the same material as the material being etched, whereby the coating on the electrode etches at a rate comparable to the etch rate of the film to be etched from the surface of the sample, eliminating the effect of backscattering of electrode material onto the etch areas of the sample.
Claim 3
Dependent Claim
28 words
Apparatus according to claim 1, wherein said coating is (poly)para-xylylene having an etch rate corresponding to the etch rate of the film on the sample to be etched.
Claim 4
Dependent Claim
28 words
Apparatus according to claim 1, wherein said coating is photoresist having an etch rate corresponding to the etch rate of the film on the sample to be etched.
Claim 5
Dependent Claim
29 words
Apparatus according to claim 1, wherein said coating is polyimide polymer having an etch rate corresponding to the etch rate of the film on the sample to be etched.
Claim 6
Dependent Claim
21 words
Apparatus according to claim 1, wherein said coating is (poly)para-xylylene and the film on the sample to be etched is (poly)para-xylylene.
Claim 7
Dependent Claim
23 words
Apparatus according to claim 4, wherein said coating is polyimide polymer and the film on the sample to be etched is polyimide polymer.
Claim 8
Dependent Claim
14 words
Apparatus according to claim 1, wherein said coating is aproximately 50 microns in thickness.
Claim 9
Dependent Claim
83 words
Polymer etching apparatus, for patterning a film of polymer on a sample, including a reaction chamber having an electrode, portions of which electrode are in the vicinity of the sample being etched, characterized by: a coating, on portions of electrode in the vicinity of the sample being etched, which portions are to be exposed to accelerated particles which cause sputtering of electrode material, of a layer of different material having an etch rate similar to the etch rate of the material being etched.
Claim 10
Dependent Claim
83 words
Polymer etching apparatus, for patterning a film of polymer on a sample, including a reaction chamber having an electrode, portions of which electrode are in the vicinity of the sample being etched, characterized by: a coating, on portions of electrode in the vicinity of the sample being etched, which portions are to be exposed to accelerated particles which cause sputtering of electrode material, of a layer of different material having an etch rate similar to the etch rate of the material being etched.
Claim 11
Dependent Claim
14 words
Apparatus according to claim 8 wherein said coating is approximately 50 microns in thickness.