Patent US4444868A successfully refreshed from Google Patents.
← Back to Patent Explorer
US4444868A Expired / Lapsed US ⏱️ 0.0 years remaining

Photosensitive composition

Assignee: ANGENCY OF Industrial SCIENCE & TECHNOLOGY MINISTRY OF INERNATIONAL TRADE & INDUSTRY
•
Filing: 1982-08-03
•
Granted: 1984-04-24
•
Expires: 2002-08-03
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A photosensitive composition, comprising a photo-insolubilizable resin having a styryl type nitrogen-containing heterocyclic residue and an acid and a photosensitive high molecular compound, having high sensitivity for an extremely small photosensitive group content.

Inventors

  • 👤 Kunihiro Ichimura

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 21:54
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0388

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 96 words
A photo-insolubilizable composition, comprising a photo-insolubilizable resin containing at least 0.2 mol% of a nitrogen-containing heterocyclic residue represented by the general formula: ##STR14## wherein, n 0 is 0 or 1, R 0 denotes a divalent organic residue, R 1 denotes one member selected from the class consisting of a hydrogen atom and an alkoxy group and Z 1 denotes an atomic group forming an aromatic heterocyclic ring and 0.5 to 10 moles, per mole of said residue of said resin, of at least one member selected from the group consisting of organic acids and inorganic acids.
Claim 2
Dependent Claim 96 words
A photo-insolubilizable composition, comprising a photo-insolubilizable resin containing at least 0.2 mol% of a nitrogen-containing heterocyclic residue represented by the general formula: ##STR14## wherein, n 0 is 0 or 1, R 0 denotes a divalent organic residue, R 1 denotes one member selected from the class consisting of a hydrogen atom and an alkoxy group and Z 1 denotes an atomic group forming an aromatic heterocyclic ring and 0.5 to 10 moles, per mole of said residue of said resin, of at least one member selected from the group consisting of organic acids and inorganic acids.
Claim 3
Dependent Claim 33 words
A photo-insolubilizable composition according to claim 1, wherein the organic acids are acetic acid, chloroacetic acid, lactic acid, tartaric acid, benzoic acid, nitrobenzoic acid, benzenesulfonic acid, naphthalenesulfonic acid, p-toluenesulfonic acid, and methanesulfonic acid.
Claim 4
Dependent Claim 23 words
A photo-insolubilizable composition according to claim 1, wherein the inorganic acids are hydrochloric acid, perchloric acid, phosphoric acid, sulfuric acid, and nitric acid.
Claim 5
Dependent Claim 23 words
A photo-insolubilizable composition according to claim 1, wherein the molecular weight of the photo-insolubilizable resin is in the range of 2,000 to 1,000,000.

References Cited (Backward Citations)

US888007A Cited
UST888007I4 Cited
US3912697A Cited
JPS565761A Cited
JPS5611906A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-04-24 1987-10-24 1988-04-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-04-24 1991-10-24 1992-04-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-04-24 1995-10-24 1996-04-24 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag