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US4442197A
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Photocurable compositions
Assignee: General Electric Co
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Filing: 1982-01-11
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Granted: 1984-04-10
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Expires: 2002-01-11
Abstract
Abstract Photocurable compositions are provided which can be cured with ultraviolet light at a wave length greater than 300 nm. The photocurable compositions are based on the use of cationically polymerizable organic materials, for example, an epoxy resin and a photoinitiator in the form of a dialkylphenacyl sulfonium salt or hydroxyaryldialkyl sulfonium salt which have been sensitized with a particular dye sensitizer.
Inventors
- 👤 James V. Crivello
- 👤 Julia L. Lee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 17:40
CPC Classifications
C; C08; C08G; C08G59/00; C08G59/18; C08G59/68; C08G59/687; C08G85/00; G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/028; G03F7/029; G03F7/038; G03F7/0385; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/115; Y10S430/116; Y10S430/122; Y10S430/123
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
117 words
Compositions which are photocurable at wave lengths greater than 300 nm comprising a cationically polymerizable organic material and an effective amount of a photoinitiator having the formula ##STR9## sensitized with an effective amount of a sensitizer selected from perylene, anthracene, mixture thereof, phenothiazene, where R is a member selected from C.sub.(6-13) monovalent aromatic organic radicals and substituted C.sub.(6-13) monovalent aromatic organic radicals, R 1 is a monovalent radical selected from hydrogen, C.sub.(1-8) alkyl and mixtures thereof, R 2 is a C.sub.(1-13) monovalent organic radical, or a divalent organic radical which can form a cyclic structure selected from the group consisting of ##STR10## M is a metal or metalloid, Q is halogen and d is equal to 4-6.
Claim 2
Dependent Claim
117 words
Compositions which are photocurable at wave lengths greater than 300 nm comprising a cationically polymerizable organic material and an effective amount of a photoinitiator having the formula ##STR9## sensitized with an effective amount of a sensitizer selected from perylene, anthracene, mixture thereof, phenothiazene, where R is a member selected from C.sub.(6-13) monovalent aromatic organic radicals and substituted C.sub.(6-13) monovalent aromatic organic radicals, R 1 is a monovalent radical selected from hydrogen, C.sub.(1-8) alkyl and mixtures thereof, R 2 is a C.sub.(1-13) monovalent organic radical, or a divalent organic radical which can form a cyclic structure selected from the group consisting of ##STR10## M is a metal or metalloid, Q is halogen and d is equal to 4-6.
Claim 3
Dependent Claim
15 words
A photocurable composition in accordance with claim 1, where the arylonium salt is phenacyltetramethylenesulfonium hexafluoroarsenate.
Claim 4
Dependent Claim
23 words
A photocurable composition in accordance with claim 1, where the cationically polymerizable organic material is an epoxy resin or mixture of epoxy resins.
Claim 5
Dependent Claim
15 words
A photocurable composition in accordance with claim 1, where the polynuclear aromatic compound is perylene.
Claim 6
Dependent Claim
19 words
A photocurable composition is accordance with claim 1, where the cationically polymerizable organic material is a difunctional vinyl ether.
Claim 7
Dependent Claim
15 words
A photocurable composition in accordance with claim 1, where the polynucler aromatic compound is anthracene.
Claim 8
Dependent Claim
13 words
A photocurable composition in accordance with claim 1, where the photosensitizer is phenothiazine.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-04-10 | 1987-10-10 | 1988-04-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-04-10 | 1991-10-10 | 1992-04-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-04-10 | 1995-10-10 | 1996-04-10 | $7700.00 | Window Closed / Lapsed |