Patent US4435496A successfully refreshed from Google Patents.
US4435496A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photopolymer cleavage imaging system
Assignee: CNA Holdings LLC
•
Filing: 1982-09-22
•
Granted: 1984-03-06
•
Expires: 2002-09-22
Abstract
Abstract Disclosed are novel photosensitive compositions containing a compound consisting essentially of repeating structural units of an alkyl aryl ether, which are end-capped with a substituent functional group containing an ethylenically unsaturated moiety, and a photosensitizing effective amount of a free radical generating compound. Through the selected exposure of films and coatings prepared from the above composition, it is possible to record information in such materials in a manner as to alter the physical and/or chemical properties of such films and coatings. This selective modification can then be simply manifested by contacting the exposed surface of the film or coating, subsequent to such exposure, with an alkaline developing solution. These compositions are useful in the graphic arts and in the manufacture of printed curcuit boards for the electronics industry.
Inventors
- 👤 John E. Walls
- 👤 Tulay Duyal
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:07
CPC Classifications
C; C08; C08G; C08G16/00; C08G16/02; C08G16/04; C08G16/0212; C08G16/0218; C08G16/0225; C08G61/00; C08G61/12; G; G03; G03F; G03F7/00; G03F7/004; G03F7/039
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
183 words
A photosensitive composition comprising (a) a polymer of the formula ##STR7## Wherein: E is selected from the group consisting of one or more of: ##STR8## R 1 , R 2 is ##STR9## R 5 is H 1 or CH 3 R 6 is H, aryl, alkyl, aralkyl or phenoxy phenyl W is --O-- when Z is ═O or is absent when Z is H 2 Z is H 2 or ═O R 3 is selected from the group consisting of ##STR10## --CH 2 I, --CH 2 Cl, --CH 2 Br or R 1 . where q=0 to 3; and M is an aromatic radical selected from the group consisting diaryl aliphatic hydrocarbon, diaryl ethers, diaryl sulfides, diaryl sulfones, diaryl amines, diaryl ketones and diaryl diketones; and R 4 =R 3 G=X or Y R 7 =R 4 when S=X or is absent when S=Y m=1 to 3 p=1 to 8 Y=--CH 2 OCH 2 -- X=--CH 2 --; and (b) a free radical generating photosensitizer in an amount effective to cause the cleavage of said part (a) polymer upon exposure to actinic radiation.
Claim 2
Dependent Claim
183 words
A photosensitive composition comprising (a) a polymer of the formula ##STR7## Wherein: E is selected from the group consisting of one or more of: ##STR8## R 1 , R 2 is ##STR9## R 5 is H 1 or CH 3 R 6 is H, aryl, alkyl, aralkyl or phenoxy phenyl W is --O-- when Z is ═O or is absent when Z is H 2 Z is H 2 or ═O R 3 is selected from the group consisting of ##STR10## --CH 2 I, --CH 2 Cl, --CH 2 Br or R 1 . where q=0 to 3; and M is an aromatic radical selected from the group consisting diaryl aliphatic hydrocarbon, diaryl ethers, diaryl sulfides, diaryl sulfones, diaryl amines, diaryl ketones and diaryl diketones; and R 4 =R 3 G=X or Y R 7 =R 4 when S=X or is absent when S=Y m=1 to 3 p=1 to 8 Y=--CH 2 OCH 2 -- X=--CH 2 --; and (b) a free radical generating photosensitizer in an amount effective to cause the cleavage of said part (a) polymer upon exposure to actinic radiation.
Claim 3
Dependent Claim
9 words
The composition of claim 1, wherein M is ##STR11##
Claim 4
Dependent Claim
15 words
The composition of claim 1, wherein the photosensitizer is benzophenone or an analogue of benzophenone.
Claim 5
Dependent Claim
24 words
The composition of claim 1, wherein the weight ratio of photosensitizer to polymer is in the range of from about 1:10 to about 5:6.
Claim 6
Dependent Claim
25 words
The composition of claim 1 further comprising one or more ingredients selected from the group consisting of binding resins, colorants, light speed accelerators and photostabilizers.
Claim 7
Dependent Claim
26 words
The composition of claim 1 wherein said photosensitizer comprising one or more compounds selected from the group consisting of benzophenone, benzil, benzoin, acetophenone, thioxanthone and anthroquinone.
Claim 8
Dependent Claim
43 words
The composition of claim 1 wherein M is diphenyl ether or benzophenone, R 1 and R 2 are methylene cinnamate or phenoxy cinnamate, R 3 and R 4 are methoxy methyl, m=2, P=3 and the ratio of X to Y is about 2:1.
Claim 9
Dependent Claim
37 words
A photographic element which comprises a substrate which is adapted for the support of a photosensitive coating, having the composition of claim 1, 2, 3, 4, 5, 6 or 7 applied to at least one surface thereof.
Claim 10
Dependent Claim
32 words
The composition of claim 1 wherein M is diphenyl ether or benzophenone, R 6 is phenyl or phenoxy phenyl, R 5 is H 1 , Z is ═O and W is --O--.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-03-06 | 1987-09-05 | 1988-03-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-03-06 | 1991-09-05 | 1992-03-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-03-06 | 1995-09-05 | 1996-03-06 | $7700.00 | Window Closed / Lapsed |