US4431304A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for the projection copying of mask patterns on a workpiece
Assignee: MERCOTRUST AKTIENGESELLSCHAFT A CORP OF LIECOTENSTEIN
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Filing: 1981-11-25
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Granted: 1984-02-14
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Expires: 2001-11-25
Abstract
Abstract An apparatus for the projection copying of patterns defined by masks on a workpiece, e.g. a semiconductor wafer coated with a photoresist in the production of integrated circuit units, comprises a stage with a cross-feed for positioning a wafer chuck in the X and Y direction in a horizontal wafer plane at which the projection beam is focused. According to the invention, the stage is supported on a base plate which, in turn, is mounted on three spaced-apart posts capable of infinitesimal vertical adjustment, guide surfaces or lines between the base plate and the structure on which it is supported having normals some of which intersect substantially in the wafer plane so that the axis of tilt, which can be generated by differentially adjusting the posts, is located substantially in the wafer plane.
Inventors
- 👤 Herbert E. Mayer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 06:26
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/70716; H; H10; H10P; H10P72/00; H10P72/50; H10P72/57
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
193 words
In an apparatus for the copying of patterns of a mask by projection of an image thereof along an optical axis upon a workpiece adapted to be displaced to dispose successive imaging regions in line with said axis, the improvement which comprises a workpiece stage having in combination: A workpiece holder adapted to removably receive said workpiece and disposed generally along said optical axis; a cross-feed table carrying said holder and operable for displacement thereof along X- and Y-axes for successively positioning said regions in alignment with said optical axis; a base plate carrying said table; a support below said table; three extensible and contractible spaced-apart posts between said support and said base plate for differential adjustment generally parallel to a Z-axis for vertical displacement of said base plate and tilting thereof; and guide surfaces and lines between said posts and said base plate and constraining said base plate, said surfaces and lines having normals at least some of which intersect in a plane of said workpiece whereby variation in extension of posts tilts said workpiece about a pivot axis substantially in said plane to level the region aligned with said optical axis.
Claim 2
Dependent Claim
193 words
In an apparatus for the copying of patterns of a mask by projection of an image thereof along an optical axis upon a workpiece adapted to be displaced to dispose successive imaging regions in line with said axis, the improvement which comprises a workpiece stage having in combination: A workpiece holder adapted to removably receive said workpiece and disposed generally along said optical axis; a cross-feed table carrying said holder and operable for displacement thereof along X- and Y-axes for successively positioning said regions in alignment with said optical axis; a base plate carrying said table; a support below said table; three extensible and contractible spaced-apart posts between said support and said base plate for differential adjustment generally parallel to a Z-axis for vertical displacement of said base plate and tilting thereof; and guide surfaces and lines between said posts and said base plate and constraining said base plate, said surfaces and lines having normals at least some of which intersect in a plane of said workpiece whereby variation in extension of posts tilts said workpiece about a pivot axis substantially in said plane to level the region aligned with said optical axis.
Claim 3
Dependent Claim
40 words
The improvement defined in claim 1 wherein said workpiece is a semiconductor wafer and said images are adapted to form patterns in a photosensitive layer applied to said wafer in said plane, said holder being a chuck receiving said wafer.
Claim 4
Dependent Claim
14 words
The improvement defined in claim 2 wherein said pivot axis intersects said optical axis.
Claim 5
Dependent Claim
40 words
The improvement defined in claim 2 wherein on the underside of said base plate three substantially parallel guide surfaces are provided which are also parallel to the plane of said wafer and are engaged by rolling bearings of said posts.
Claim 6
Dependent Claim
39 words
The improvement defined in claim 4 wherein said base plate and said support are provided with juxtaposed upright flanges, further comprising roller means between said flanges preventing rotation of said base plate about an axis parallel to said Z-axis.
Claim 7
Dependent Claim
31 words
The improvement defined in claim 5 wherein said roller means includes a ball received between pairs of cylinders fixed on each of said flanges, said flanges being spring-biased toward one another.
Claim 8
Dependent Claim
34 words
The improvement defined in claim 5, further comprising an additional roller means offset from said first roller means for preventing rotation of said plate about an axis of said ball parallel to said Z-axis.
Claim 9
Dependent Claim
70 words
The improvement defined in claim 5, further comprising three guide surfaces formed on the underside of said base plate and positioned to lie along an imaginary sphere having a center at the point of intersection of said optical axis with the plane of said wafer, and respective balls engaging the latter guide surfaces and carried by a support member, said support member being mounted for vertical movement on said support.
Claim 10
Dependent Claim
29 words
The improvement defined in claim 5 wherein each of said posts has a wedge member bearing via rollers upon a vertically displaceable member and driven by a threaded spindle.
Claim 11
Dependent Claim
21 words
The improvement defined in claim 9 wherein said support member is mounted on said support for vertical movement by leaf springs.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-02-13 | 1987-08-15 | 1988-02-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-02-13 | 1991-08-15 | 1992-02-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-02-13 | 1995-08-15 | 1996-02-14 | $7700.00 | Window Closed / Lapsed |