← Back to Patent Explorer
US4428871A Expired / Lapsed US ⏱️ 0.0 years remaining

Stripping compositions and methods of stripping resists

Assignee: Avantor Performance Materials LLC
•
Filing: 1982-08-17
•
Granted: 1984-01-31
•
Expires: 2002-08-17
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract Stripping compositions for removing resist materials from substrates comprise compositions of a 2-pyrrolidinone compound and a diethylene glycol monoalkyl ether compound. Polyethylene glycol may be added to provide even more effective stripping compositions.

Inventors

  • 👤 Irl E. Ward
  • 👤 Lisa G. Hallquist
  • 👤 Thomas J. Hurley

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 10:50
CPC Classifications
B; B41; B41C; B41C1/00; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/425

Claims Analysis

Total Claims: 21
Claim 1
Independent Claim 92 words
A stripping composition comprising from about 55 to about 80 weight percent of a 2-pyrrolidinone compound of the formula ##STR2## wherein R is selected from the group consisting of hydrogen, alkyl of 1 to 3 carbon atoms and hydroxyalkyl of 1 to 3 carbon atoms, from about 20 to about 45 weight percent of diethylene glycol monoalkylether of the formula HOCH 2 CH 2 --O--CH 2 CH 2 --O--R 1 wherein R 1 is alkyl of 1 to 4 carbon atoms, and from about 5 to about 25 weight percent polyethylene glycol.
Claim 2
Dependent Claim 92 words
A stripping composition comprising from about 55 to about 80 weight percent of a 2-pyrrolidinone compound of the formula ##STR2## wherein R is selected from the group consisting of hydrogen, alkyl of 1 to 3 carbon atoms and hydroxyalkyl of 1 to 3 carbon atoms, from about 20 to about 45 weight percent of diethylene glycol monoalkylether of the formula HOCH 2 CH 2 --O--CH 2 CH 2 --O--R 1 wherein R 1 is alkyl of 1 to 4 carbon atoms, and from about 5 to about 25 weight percent polyethylene glycol.
Claim 3
Dependent Claim 35 words
A composition of claim 1 comprising from about 55 to about 80 weight percent 1-methyl-2-pyrrolidinone, from about 20 to about 45 weight percent 2-(2-ethoxyethoxy)ethanol and from about 5 to about 25 weight percent polyethylene glycol.
Claim 4
Dependent Claim 22 words
A composition of claim 2 comprising about 60 to 75% 1-methyl-2-pyrrolidinone, 25 to 40% 2-(2-ethoxyethoxy)ethanol and 6 to 15 percent polyethylene glycol.
Claim 5
Dependent Claim 18 words
A composition of claim 2 comprising about 50% 1-methyl-2-pyrrolidinone, about 25% 2-(2-ethoxyethoxy) ethanol and about 25% polyethylene glycol.
Claim 6
Dependent Claim 18 words
A composition of claim 2 comprising about 70% 1-methyl-2-pyrrolidinone, about 24% 2-(2-ethoxyethoxy) ethanol and about 6% polyethylene glycol.
Claim 7
Dependent Claim 18 words
The composition of claim 1 wherein the polyethylene glycol is polyethylene glycol of molecular weight of about 200.
Claim 8
Dependent Claim 18 words
The composition of claim 2 wherein the polyethylene glycol is polyethylene glycol of molecular weight of about 200.
Claim 9
Dependent Claim 18 words
The composition of claim 3 wherein the polyethylene glycol is polyethylene glycol of molecular weight of about 200.
Claim 10
Dependent Claim 18 words
The composition of claim 4 wherein the polyethylene glycol is polyethylene glycol of molecular weight of about 200.
Claim 11
Dependent Claim 18 words
The composition of claim 5 wherein the polyethylene glycol is polyethylene glycol of molecular weight of about 200.
Claim 12
Dependent Claim 32 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition the composition of claim 1.
Claim 13
Dependent Claim 32 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition the composition of claim 2.
Claim 14
Dependent Claim 32 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition the composition of claim 3.
Claim 15
Dependent Claim 32 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition the composition of claim 4.
Claim 16
Dependent Claim 30 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition of claim 5.
Claim 17
Dependent Claim 32 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition the composition of claim 6.
Claim 18
Dependent Claim 32 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition the composition of claim 7.
Claim 19
Dependent Claim 32 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition the composition of claim 8.
Claim 20
Dependent Claim 32 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition the composition of claim 9.
Claim 21
Dependent Claim 32 words
A method wherein unexposed photoresist is stripped from a substrate by contacting the unexposed photoresist with a stripping composition, the improvement comprising utilizing as the stripping composition the composition of claim 10.

References Cited (Backward Citations)

US3551204A Cited
US3813309A Cited
US3673099A Cited
US3796602A Cited
US4055515A Cited
US4276186A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1987-01-30 1987-08-01 1988-01-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1991-01-30 1991-08-01 1992-01-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1995-01-30 1995-08-01 1996-01-31 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag