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US4420401A Expired / Lapsed US ⏱️ 0.0 years remaining

Solution waste treatment

Assignee: Shipley Co Inc
•
Filing: 1981-06-22
•
Granted: 1983-12-13
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Expires: 2001-06-22
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Abstract

Abstract A process is provided for the waste treatment of metal plating solutions. One embodiment of the process comprises removal of the metal values contained in solution and inactivation or destruction of the complexing agent's ability to complex heavy metals. A second embodiment comprises inactivation or destruction of the complexing agent as a first step, formation of a sludge if not formed by inactivation of the complexing agent and sludge removal. Either embodiment permits direct discharge of spent plating solutions into the environment without violation of federal or municipal regulation.

Inventors

  • 👤 George A. Kretas
  • 👤 Irving R. Ireland

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 16:11
CPC Classifications
C; C02; C02F; C02F9/00; C02F1/00; C02F1/58; C02F1/62; C02F1/66; C02F1/70; C02F1/72; C02F1/76; C02F2101/00; C02F2101/10; C02F2101/20; C02F2101/30; C02F2101/303; C02F2103/00; C02F2103/16; C02F2209/00; C02F2209/06; Y; Y10; Y10S; Y10S204/00; Y10S204/13; Y10S210/00; Y10S210/902; Y10S210/911; Y10S210/912

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 195 words
A process for removing dissolved metal from spent copper or nickel plating solutions containing a dissolved metal selected from the group of nickel and copper ions, and active complexing agent, said process comprising the steps of rendering said solution an electroless metal plating solution by adjusting the pH of the solution and adding a reducing agent to the solution in an amount sufficient to cause plate-out of the dissolved metal in solution and contacting the solution with a seeder for a time sufficient to plate substantially all of said metal from solution onto said seeder, said seeder comprising a particulate material of large surface area having a colloidal noble metal catalytic to deposition of the dissolved metal in solution absorbed on its surface, said particulate material with said absorbed colloidal noble metal having a thin layer of metal over at least 50 percent of its surface, said thin layer of metal being selected from the group of copper and nickel and being copper when said spent metal plating solution is a copper plating solution and being nickel when said spent plating solution is a nickel plating solution and separating said seeder from said plating solution.
Claim 2
Dependent Claim 195 words
A process for removing dissolved metal from spent copper or nickel plating solutions containing a dissolved metal selected from the group of nickel and copper ions, and active complexing agent, said process comprising the steps of rendering said solution an electroless metal plating solution by adjusting the pH of the solution and adding a reducing agent to the solution in an amount sufficient to cause plate-out of the dissolved metal in solution and contacting the solution with a seeder for a time sufficient to plate substantially all of said metal from solution onto said seeder, said seeder comprising a particulate material of large surface area having a colloidal noble metal catalytic to deposition of the dissolved metal in solution absorbed on its surface, said particulate material with said absorbed colloidal noble metal having a thin layer of metal over at least 50 percent of its surface, said thin layer of metal being selected from the group of copper and nickel and being copper when said spent metal plating solution is a copper plating solution and being nickel when said spent plating solution is a nickel plating solution and separating said seeder from said plating solution.
Claim 3
Dependent Claim 11 words
The process of claim 1 where the noble metal is palladium.
Claim 4
Dependent Claim 13 words
The process of claim 1 where the particulate material is a filter aid.
Claim 5
Dependent Claim 11 words
The process of claim 1 where the particulate material is carbon.
Claim 6
Dependent Claim 25 words
The process of claim 1 where the layer of metal over the particulate material is nickel and the plating solution is a nickel plating solution.
Claim 7
Dependent Claim 23 words
The process of claim 1 where the metal over the particulate material is copper and the plating solution is a copper plating solution.
Claim 8
Dependent Claim 17 words
The process of claim 1 where the particulate material is retained on a 200 mesh tyler sieve.

References Cited (Backward Citations)

US3494760A Cited
GB1267586A Cited
US3666447A Cited
US3770630A Cited
US3767572A Cited
US3802910A Cited
US3957506A Cited
US4072605A Cited
US4172785A Cited
US4159309A Cited
US4260493A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-12-12 1987-06-13 1987-12-13 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-12-12 1991-06-13 1991-12-13 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-12-12 1995-06-13 1995-12-13 $7700.00 Window Closed / Lapsed

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