US4420386A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for pure ion plating using magnetic fields
Assignee: White Engineering Corp
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Filing: 1983-04-22
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Granted: 1983-12-13
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Expires: 2003-04-22
Abstract
Abstract A method for ion plating a substrate (b 40) within a chamber (52) with a plating material (20) is provided. The method includes evacuating the chamber (52) and vaporizing the plating material (20) within the evacuated chamber (52). An electron saturated magnetic field (30) is placed adjacent the substrate (40) for positive ionization of the evaporant atoms of the vaporized plating material (20). A negative bias (61, 62) is applied to the substrate (40) for attracting positive ions of the vaporized plating material (20).
Inventors
- 👤 Gerald W. White
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 16:56
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; C; C23; C23C; C23C14/00; C23C14/22; C23C14/24; C23C14/32; H01J37/3266; H05; H05K; H05K3/00; H05K3/10; H05K3/14
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
65 words
A method for ion plating a substrate within a chamber with a plating material comprising the steps of: evacuating said chamber; vaporizing plating material in the evacuated chamber; placing an electron saturated magnetic field adjacent the substrate for positive ionization of evaporant atoms of the vaporized plating material; and applying a negative bias on the substrate for attracting positive ions of the vaporized plating material.
Claim 2
Independent Claim
65 words
A method for ion plating a substrate within a chamber with a plating material comprising the steps of: evacuating said chamber; vaporizing plating material in the evacuated chamber; placing an electron saturated magnetic field adjacent the substrate for positive ionization of evaporant atoms of the vaporized plating material; and applying a negative bias on the substrate for attracting positive ions of the vaporized plating material.
Claim 3
Dependent Claim
15 words
The method of claim 1 wherein the magnetic field is provided by a permanent magnet.
Claim 4
Dependent Claim
14 words
The method of claim 1 wherein the magnetic field is provided by an electromagnet.
Claim 5
Dependent Claim
32 words
The method of claim 1 wherein the step of applying a negative bias on the substrate includes: applying a direct current negative bias on the substrate wherein the substrate is conductive material.
Claim 6
Dependent Claim
58 words
The method of claim 1 wherein the substrate is held by a fixture within the chamber and further including the step of: applying a radio frequency signal to the substrate fixture for generating a negative self bias on the surface of the substrate for attracting positive ions of the vaporized plating material wherein the substrate is nonconductive materials.
Claim 7
Dependent Claim
30 words
The method of claim 1 wherein the magnetic field attracts a deposition mask for securing the substrate during the plating process as well as generating a pattern on the substrate.
Claim 8
Dependent Claim
13 words
The method of claim 5 wherein the substrate comprises a printed circuit board.
Claim 9
Dependent Claim
19 words
The method of claim 6 and further including the step of plating holes contained within the printed circuit board.
Claim 10
Dependent Claim
31 words
The method of claim 1 and further including the step of applying a positive charge to in the area of the saturated magnetic field to direct the flow of positive ions.
Claim 11
Dependent Claim
17 words
The method of claim 1 wherein the substrate is ceramic material and the plating material is copper.
Claim 12
Dependent Claim
17 words
The method of claim 1 wherein the substrate is ceramic material and the plating material is gold.
Claim 13
Dependent Claim
17 words
The method of claim 1 wherein the substrate is ceramic material and the plating material is silver.
Claim 14
Dependent Claim
17 words
The method of claim 1 wherein the substrate is silicon material and the plating material is aluminum.
Claim 15
Dependent Claim
27 words
The method of claim 1 and further including the step of: injecting argon gas having a partial pressure of less than approximately 5 microns into the chamber.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-12-12 | 1987-06-13 | 1987-12-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-12-12 | 1991-06-13 | 1991-12-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-12-12 | 1995-06-13 | 1995-12-13 | $7700.00 | Window Closed / Lapsed |