Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
138 words
A method of forming a thin gallium arsenide solar cell of improved efficiency, which comprises the steps of: providing a self-supporting photovoltaic cell comprising gallium arsenide having a thickness of at least about 250 micrometers; forming a pattern of contact lines across the front surface of said photovoltaic cell and a bus bar contact along one edge of said front surface; bonding a thin visible-light transparent coverslide to said front surface; initially etching the back surface of said photovoltaic cell to uniformly reduce the thickness of said photovoltaic cell to a minimum useful thickness; applying a stop-etch material to said back surface except in the area corresponding to said bus; further etching said back surface down to said bus; removing said stop-etch material, and applying a light reflective electrically conductive material to the surface protected by said stop-etch.
Claim 2
Independent Claim
138 words
A method of forming a thin gallium arsenide solar cell of improved efficiency, which comprises the steps of: providing a self-supporting photovoltaic cell comprising gallium arsenide having a thickness of at least about 250 micrometers; forming a pattern of contact lines across the front surface of said photovoltaic cell and a bus bar contact along one edge of said front surface; bonding a thin visible-light transparent coverslide to said front surface; initially etching the back surface of said photovoltaic cell to uniformly reduce the thickness of said photovoltaic cell to a minimum useful thickness; applying a stop-etch material to said back surface except in the area corresponding to said bus; further etching said back surface down to said bus; removing said stop-etch material, and applying a light reflective electrically conductive material to the surface protected by said stop-etch.
Claim 3
Independent Claim
192 words
A method of forming a thin gallium arsenide solar cell of improved efficiency, which comprises the steps of: providing a self-supporting photovoltaic cell having a thickness of at least about 250 nanometers comprising a substrate layer of Al 0 .2 GaAs, a stop-etch layer of Al 0 .9 GaAs extending uniformly over the front surface of said first layer except for an edge area along one edge of said first layer, a layer of GaAs including oppositely doped regions forming a junction therebetween, and a second layer of Al 0 .2 GaAs extending entirely over said stop-etch layer and said edge area; forming a pattern of contact lines across the outer surface of said second layer and a bus bar contact along one edge of said second layer corresponding to said edge area; bonding a thin visible-light transparent coverslide to said outer surface; etching the back surface of said substrate layer up to the stop-etch layer and up to the bus in said edge area not protected by said stop-etch layer; removing said stop-etch; and applying a light reflective electrically conductive material to the surface previously covered by said stop etch layer.
Claim 4
Independent Claim
192 words
A method of forming a thin gallium arsenide solar cell of improved efficiency, which comprises the steps of: providing a self-supporting photovoltaic cell having a thickness of at least about 250 nanometers comprising a substrate layer of Al 0 .2 GaAs, a stop-etch layer of Al 0 .9 GaAs extending uniformly over the front surface of said first layer except for an edge area along one edge of said first layer, a layer of GaAs including oppositely doped regions forming a junction therebetween, and a second layer of Al 0 .2 GaAs extending entirely over said stop-etch layer and said edge area; forming a pattern of contact lines across the outer surface of said second layer and a bus bar contact along one edge of said second layer corresponding to said edge area; bonding a thin visible-light transparent coverslide to said outer surface; etching the back surface of said substrate layer up to the stop-etch layer and up to the bus in said edge area not protected by said stop-etch layer; removing said stop-etch; and applying a light reflective electrically conductive material to the surface previously covered by said stop etch layer.
Claim 5
Dependent Claim
15 words
The method according to claim 1 wherein said photovoltaic cell comprises Al 0 .2 GaAs.
Claim 6
Dependent Claim
59 words
The method according to claim 1 wherein said front surface contact pattern comprises a plurality of substantially parallel lines about 8 microns wide, spaced about 135 microns apart, and connected to a bus bar contact having an area of about 0.177 by 0.065 cm, said pattern and said bus bar comprising gold and having thicknesses of about 2 microns.
Claim 7
Dependent Claim
19 words
The method according to claim 1 or 2 wherein said photovoltaic cell is formed by organometallic chemical vapor deposition.
Claim 8
Dependent Claim
35 words
The method according to claim 1 or 2 wherein said coverslide has a thickness of from about 25 to 100 microns and said photovoltaic cell has a thickness of from about 5 to 25 microns.
Claim 9
Dependent Claim
36 words
The method according to claim 1 or 2 wherein said photovoltaic cell includes a single layer Si 3 N 4 anti-reflection coating having a thickness of about 60 nanometers located between the solar cell and coverslide.