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US4415794A Expired / Lapsed US ⏱️ 0.0 years remaining

Laser scanning method for annealing, glass flow and related processes

Assignee: National Semiconductor Corp
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Filing: 1981-03-16
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Granted: 1983-11-15
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Expires: 2001-03-16
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Abstract

Abstract A method for scanning the top surface of a semiconductor wafer prevents damage to the wafer (11) by ensuring that the laser beam (13) does not cross over the edge (11a) of the wafer during the scanning process nor approach within one (1) to two (2) millimeters to the edge of the wafer.

Inventors

  • 👤 Michelangelo Delfino
  • 👤 Timothy Reifsteck

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 21:56
CPC Classifications
H; H10; H10P; H10P34/00; H10P34/40; H10P34/42; H10P95/00

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 52 words
The method of laser scanning a semiconductor wafer which comprises the steps of: directing the beam from the laser across the top surface of the wafer in a selected pattern while at the same time preventing the laser beam from coming within a selected distance, d, of the edge of the wafer.
Claim 2
Independent Claim 52 words
The method of laser scanning a semiconductor wafer which comprises the steps of: directing the beam from the laser across the top surface of the wafer in a selected pattern while at the same time preventing the laser beam from coming within a selected distance, d, of the edge of the wafer.
Claim 3
Dependent Claim 12 words
The method of claim 1 wherein d is about one (1) millimeter.
Claim 4
Dependent Claim 34 words
The method of claim 1 wherein said laser beam covers the top surface of the wafer but comes no closer than about one (1) to two (2) millimeters to the edge of the wafer.
Claim 5
Dependent Claim 27 words
The method of claim 1 wherein said laser beam is prevented from coming closer than about one and a half millimeters from the edge of the wafer.
Claim 6
Dependent Claim 13 words
The product produced by the method of claim 1, 2, 3 or 4.

References Cited (Backward Citations)

US3900737A Cited
US4131487A Cited
US4316074A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-11-14 1987-05-16 1987-11-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-11-14 1991-05-16 1991-11-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-11-14 1995-05-16 1995-11-15 $7700.00 Window Closed / Lapsed

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