Patent US4414085A successfully refreshed from Google Patents.
US4414085A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of depositing a high-emissivity layer
Assignee: United States Department of Energy
•
Filing: 1981-10-08
•
Granted: 1983-11-08
•
Expires: 2001-10-08
Abstract
Abstract A method of depositing a high-emissivity layer on a substrate comprising RF sputter deposition of a carbide-containing target in an atmosphere of a hydrocarbon gas and a noble gas. As the carbide is deposited on the substrate the hydrocarbon gas decomposes to hydrogen and carbon. The carbon deposits on the target and substrate causing a carbide/carbon composition gradient to form on the substrate. At a sufficiently high partial pressure of hydrocarbon gas, a film of high-emissivity pure carbon will eventually form over the substrate.
Inventors
- 👤 Charles E. Wickersham
- 👤 Ellis L. Foster
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 16:47
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3435; C23C14/345; C23C14/0021; C23C14/0036; C23C14/0084; C23C14/02; C23C14/027; C23C16/00; C23C16/22; C23C16/26
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
141 words
A method for depositing a carbon layer on a substrate comprising: providing a chamber for RF reactive sputter deposition, providing within the chamber a substrate and a target comprised of a carbide compound, providing a noble gas and a hydrocarbon gas to the chamber, applying RF power to the target to sputter deposit the carbide compound onto the substrate and to decompose the hydrocarbon gas to hydrogen and carbon such that carbon deposits on the target and substrate whereby a layer having a carbide/carbon composition gradient develops on the substrate, and maintaining the partial pressure of hydrocarbon gas sufficiently high so that the carbon accumulation rate on the target is greater than the sputter removal rate, whereby a continuous layer of carbon will form on the target and a layer of carbon will form over the carbide/carbon gradient on the substrate.
Claim 2
Independent Claim
141 words
A method for depositing a carbon layer on a substrate comprising: providing a chamber for RF reactive sputter deposition, providing within the chamber a substrate and a target comprised of a carbide compound, providing a noble gas and a hydrocarbon gas to the chamber, applying RF power to the target to sputter deposit the carbide compound onto the substrate and to decompose the hydrocarbon gas to hydrogen and carbon such that carbon deposits on the target and substrate whereby a layer having a carbide/carbon composition gradient develops on the substrate, and maintaining the partial pressure of hydrocarbon gas sufficiently high so that the carbon accumulation rate on the target is greater than the sputter removal rate, whereby a continuous layer of carbon will form on the target and a layer of carbon will form over the carbide/carbon gradient on the substrate.
Claim 3
Dependent Claim
11 words
The method of claim 1 wherein the hydrocarbon gas is acetylene.
Claim 4
Dependent Claim
15 words
The method of claim 2 wherein the partial pressure of acetylene at least 0.034 Pa.
Claim 5
Dependent Claim
17 words
The method of claim 3 wherein the total pressure in the chamber is at least 3.33 Pa.
Claim 6
Dependent Claim
36 words
The method of claim 1 wherein the target is comprised of a carbide of at least one element selected from the group consisting of Si, B, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W.
Claim 7
Dependent Claim
13 words
The method of claim 5 wherein the target is comprised of tungsten carbide.
Claim 8
Dependent Claim
24 words
The method of claim 1 wherein the substrate material is selected from the group consisting of iridium, aluminum, carbon/carbon composite, iron, and stainless steel.
Claim 9
Dependent Claim
20 words
The method of claim 1 wherein the noble gas is selected from the group consisting of argon, krypton, and xenon.
References Cited (Backward Citations)
US3709809A
Cited
US4309261A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-11-07 | 1987-05-09 | 1987-11-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-11-07 | 1991-05-09 | 1991-11-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-11-07 | 1995-05-09 | 1995-11-08 | $7700.00 | Window Closed / Lapsed |