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Method of preparing zinc oxide film

Assignee: Murata Manufacturing Co Ltd
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Filing: 1982-01-05
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Granted: 1983-10-18
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Expires: 2002-01-05
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Abstract

Abstract A method of making zinc oxide film comprises the steps of forming a zinc oxide layer on a substrate by carrying out radio-frequency sputtering with a target of zinc oxide, forming a zinc oxide layer on said zinc oxide layer by carrying out reactive, direct-current or radio-frequency sputtering with a target of zinc metal.

Inventors

  • 👤 Suehiro Kato
  • 👤 Kenji Ando

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 23:06
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/086; C23C14/0021; C23C14/0036; C23C14/02

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 64 words
A method of making zinc oxide film comprising the steps of forming a first zinc oxide layer on a substrate by radio-frequency sputtering of zinc oxide from a target of zinc oxide and then forming a second zinc oxide layer on said first zinc oxide layer by reactive direct-current or radio-frequency sputtering of zinc from a target of zinc metal in an oxidizing atmosphere.
Claim 2
Independent Claim 64 words
A method of making zinc oxide film comprising the steps of forming a first zinc oxide layer on a substrate by radio-frequency sputtering of zinc oxide from a target of zinc oxide and then forming a second zinc oxide layer on said first zinc oxide layer by reactive direct-current or radio-frequency sputtering of zinc from a target of zinc metal in an oxidizing atmosphere.
Claim 3
Dependent Claim 27 words
The method of claim 1 wherein the oxidizing atmosphere consists essentially of 50 to 90 volume percent of argon and 10 to 50 volume percent of oxygen.
Claim 4
Dependent Claim 26 words
The method of claim 2 wherein the reactive direct-current or radio-frequency sputtering of zinc is effected at a pressure of 10 -1 to 5×10 -4 Torr.
Claim 5
Dependent Claim 33 words
The method of claim 3 wherein the second zinc oxide layer is formed by reactive direct-current sputtering at a voltage of 1-7 KV and a current of 0.15 to 1.5 mA/cm 2 .
Claim 6
Dependent Claim 23 words
The method of claim 4 wherein the first zinc oxide layer is formed at a pressure of 10 -1 to 10 -3 Torr.
Claim 7
Dependent Claim 34 words
The method of claim 5 wherein the first zinc oxide layer is formed by radio-frequency sputtering of zinc oxide in an atmosphere consisting essentially of 80-90 volume percent argon and 20-10 volume percent oxygen.

References Cited (Backward Citations)

US4336120A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-10-17 1987-04-18 1987-10-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-10-17 1991-04-18 1991-10-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-10-17 1995-04-18 1995-10-18 $7700.00 Window Closed / Lapsed

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