Process for producing high-purity silica glass

Claim 2

A process for producing a high-purity silica glass by flame oxidation using a burner comprised of coaxial cylindrical channels, comprising the steps of: supplying silicon chlorides, hydrogen gas, oxygen gas, and inert gas; decomposing the silicon chlorides by flame oxidation to form a soot of silica glass; depositing the soot on a starter member; and sintering the deposited soot to provide a transparent vitreous substance; the silicon chlorides being supplied from the innermost cylinder of the burner; the oxygen gas being supplied from a channel adjacent to the channel for supplying the silicon chlorides and the inert gas being supplied from a channel between channels of the oxygen gas and the hydrogen gas, the volume ratio of said oxygen gas to the sum of twice said chlorides plus the hydrogen gas being greater than 0.665 and less than about 20.

Claim 3

A process for producing a high-purity doped silica glass, comprising the steps of: supplying silicon chlorides, hydrogen gas, oxygen gas and inert gas from a burner, and also supplying doping agent chlorides selected from the group consisting of BCl 3 , GeCl 4 , PCl 3 , POCl 3 , PCl 5 ; decomposing the silicon chlorides and the doping agent chlorides by flame oxidation to form fine grains of doped silica glass; depositing the decomposed fine grains of doped silica glass on a starting member; and sintering the deposited glass on the starting member to provide a transparent vitreous substance, wherein the burner comprises coaxial channels and the silicon chlorides along with the doping agent chlorides being supplied from the innermost cylinder of the burner; the oxygen gas being supplied from a channel adjacent to the channel for supplying the chlorides and the inert gas being supplied from a channel between channels of the oxygen gas and the hydrogen gas, the volume ratio of said oxygen gas to the sum of twice said chlorides plus the hydrogen gas being greater than 0.665 and less than about 20.

Claim 4

A process for producing a high-purity doped silica glass, comprising the steps of: supplying silicon chlorides, hydrogen gas, oxygen gas and inert gas from a burner, and also supplying doping agent chlorides selected from the group consisting of BCl 3 , GeCl 4 , PCl 3 , POCl 3 , PCl 5 ; decomposing the silicon chlorides and the doping agent chlorides by flame oxidation to form fine grains of doped silica glass; depositing the decomposed fine grains of doped silica glass on a starting member; and sintering the deposited glass on the starting member to provide a transparent vitreous substance, wherein the burner comprises coaxial channels and the silicon chlorides along with the doping agent chlorides being supplied from the innermost cylinder of the burner; the oxygen gas being supplied from a channel adjacent to the channel for supplying the chlorides and the inert gas being supplied from a channel between channels of the oxygen gas and the hydrogen gas, the volume ratio of said oxygen gas to the sum of twice said chlorides plus the hydrogen gas being greater than 0.665 and less than about 20.

Claim 5

The process for producing a high-purity doped silica glass, as claimed in claims 1 or 2, wherein the silicon chlorides are selected from a group consisting of SiCl 4 , SiHCl 3 , and mixtures thereof.