US4399015A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for fabricating an indium tin oxide film for a transparent electrode
Assignee: Sharp Corp
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Filing: 1982-02-01
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Granted: 1983-08-16
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Expires: 2002-02-01
Abstract
Abstract A method for fabricating an indium tin oxide (ITO) film comprises depositing the ITO film on a heat-resisting substrate by sputtering using a metal alloy target of In-Sn in an atmosphere including an active gas, and heat-treating the ITO film at about 550-650 degrees Centigrade in an oxygen-free atmosphere. Preferably, the heat-resisting substrate comprises an aluminoborosilicate glass. Further, sputtering, preferably reactive sputtering, is employed.
Inventors
- 👤 Yoshihiro Endo
- 👤 Yoshito Yamashita
- 👤 Hiroshi Kishishita
- 👤 Hisashi Uede
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 09:52
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/086; C03; C03C; C03C17/00; C03C17/22; C03C17/23; C03C17/245; C03C17/2453; C23C14/58; C23C14/5806; G; G02; G02F; G02F1/00; G02F1/01; G02F1/13; G02F1/133; G02F1/1333; G02F1/1343; G02F1/13439
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
58 words
A method for fabricating an indium tin oxide (ITO) film, comprising: depositing the ITO film on a heated substrate which is heat-resistant by sputtering using a metal alloy target of In-Sn in an atmosphere including an active gas having a moderate partial pressure of oxygen; and heat-treating the ITO film at about 550°-650° C. in an oxygen-free atmosphere.
Claim 2
Independent Claim
58 words
A method for fabricating an indium tin oxide (ITO) film, comprising: depositing the ITO film on a heated substrate which is heat-resistant by sputtering using a metal alloy target of In-Sn in an atmosphere including an active gas having a moderate partial pressure of oxygen; and heat-treating the ITO film at about 550°-650° C. in an oxygen-free atmosphere.
Claim 3
Dependent Claim
13 words
The method of claim 1, wherein the heat-resistant substrate comprises an aluminoborosilicate glass.
Claim 4
Dependent Claim
17 words
The method of claim 1, wherein the sputtering of the ITO film is effected by reaction sputtering.
Claim 5
Dependent Claim
19 words
The method of claim 3, wherein the sputtering of the ITO film is effected by D.C. planar magnetron sputtering.
Claim 6
Dependent Claim
9 words
A product produced by the method of claim 1.
Claim 7
Dependent Claim
9 words
A product produced by the method of claim 2.
Claim 8
Dependent Claim
9 words
A product produced by the method of claim 3.
Claim 9
Dependent Claim
9 words
A product produced by the method of claim 4.
Claim 10
Dependent Claim
13 words
The method of claim 1, wherein the active gas includes argon and oxygen.
Claim 11
Dependent Claim
19 words
The method of claim 1, wherein the partial pressure of oxygen is about 1×10 -4 to 1×10 -3 Torr.
References Cited (Backward Citations)
US3749658A
Cited
US4010291A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-08-15 | 1987-02-14 | 1987-08-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-08-15 | 1991-02-14 | 1991-08-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-08-15 | 1995-02-14 | 1995-08-16 | $7700.00 | Window Closed / Lapsed |