Patent US4397937A successfully refreshed from Google Patents.
US4397937A
Expired / Lapsed
US
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Positive resist compositions
Assignee: International Business Machines Corp
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Filing: 1982-02-10
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Granted: 1983-08-09
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Expires: 2002-02-10
Abstract
Abstract Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.
Inventors
- 👤 Nicholas J. Clecak
- 👤 Dennis R. McKean
- 👤 Robert D. Miller
- 👤 Terry C. Tompkins
- 👤 Robert J. Twieg
- 👤 Carlton G. Willson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 09:45
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
60 words
A positive resist composition comprising a phenolic resin transparent to radiation used for imaging and a sensitizer, characterized in that the sensitizer is a bisester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diasterioisomers, the sensitizer being present at a concentration of from 0.05 to 0.95 molal.
Claim 2
Dependent Claim
60 words
A positive resist composition comprising a phenolic resin transparent to radiation used for imaging and a sensitizer, characterized in that the sensitizer is a bisester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diasterioisomers, the sensitizer being present at a concentration of from 0.05 to 0.95 molal.
Claim 3
Dependent Claim
14 words
A composition as claimed in claim 1 wherein the phenolic resin is a novolak.
Claim 4
Dependent Claim
17 words
A composition as claimed in claim 2 wherein the novolak is formed from cresylic acid and formaldehyde.
Claim 5
Dependent Claim
13 words
A composition as claimed in claim 1 wherein the phenolic resin is poly(p-hydroxystyrene).
Claim 6
Dependent Claim
20 words
A composition as claimed in claim 1 wherein the sensitizer is present at a concentration of 0.15 to 0.65 molal.
Claim 7
Dependent Claim
15 words
A composition as claimed in claim 1 wherein the diazonaphthalene moiety is a 5 sulfonate.
Claim 8
Dependent Claim
15 words
A composition as claimed in claim 1 wherein the diazonaphthalene moiety is a 4 sulfonate.
Claim 9
Dependent Claim
22 words
A composition as claimed in claim 1 wherein one diazonaphthalene moiety is a 4 sulfonate and one moiety is a 5 sulfonate.
Claim 10
Dependent Claim
18 words
A composition as claimed in claim 1 wherein the sensitizer comprises a mixture of 4,4-bissulfonates, 4,5-bissulfonates and 5,5-bissulfonates.
Claim 11
Dependent Claim
17 words
A composition as claimed in claim 1 wherein the diol is tricyclo [5.2.1.0 2 ,6 ] decane-4,8-dimethanol.
Claim 12
Dependent Claim
18 words
A composition as claimed in claim 1 wherein the diol is 4,8-bis(hydroxyeth-1-yl) tricyclo [5.2.1.0 2 ,6 ] decane.
Claim 13
Dependent Claim
19 words
A composition as claimed in claim 1 wherein the sensitizer is 4,8-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalene sulfonyl oxymethyl)tricyclo [5.2.1.0 2 ,6 ] decane.
References Cited (Backward Citations)
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US3666473A
Cited
US3823130A
Cited
US4123279A
Cited
US4005437A
Cited
US4308368A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-08-08 | 1987-02-07 | 1987-08-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-08-08 | 1991-02-07 | 1991-08-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-08-08 | 1995-02-07 | 1995-08-09 | $7700.00 | Window Closed / Lapsed |