Patent US4389084A successfully refreshed from Google Patents.
US4389084A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Observing apparatus
Assignee: Canon Inc
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Filing: 1980-04-14
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Granted: 1983-06-21
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Expires: 2000-04-14
Abstract
Abstract An observing apparatus for observing if a mask for producing semiconductor circuit element and a wafer are aligned to a determined positional relationship. The apparatus is featured in eliminating the light reflected by the mask by the use of a phase mirror and an optical analyzer, thus allowing to observe the mask and wafer without difference in brightness.
Inventors
- 👤 Mikichi Ban
- 👤 Susumu Ito
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 12:57
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7065; G02; G02B; G02B23/00
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
139 words
An observing apparatus comprising: illuminating means for emitting a linearly polarized light to illuminate a mask for manufacture of a semiconductor circuit element; a reflective imaging optical system comprising plural mirrors for focusing an image of said mask onto a wafer, at least one of said plural mirrors being a phase mirror having a reflecting surface which is adapted for causing the direction of polarization of light passed through said mask, then reflected by said wafer and again passed through said mask to be different from the direction of polarization of aforementioned linearly polarized light; an observing system for observing said mask and wafer from the side of said illuminating means with respect to said mask; and polarizing means, located in said observing optical system, for differentiating a light reflected by said wafer from the aforementioned linearly polarized light.
Claim 2
Dependent Claim
139 words
An observing apparatus comprising: illuminating means for emitting a linearly polarized light to illuminate a mask for manufacture of a semiconductor circuit element; a reflective imaging optical system comprising plural mirrors for focusing an image of said mask onto a wafer, at least one of said plural mirrors being a phase mirror having a reflecting surface which is adapted for causing the direction of polarization of light passed through said mask, then reflected by said wafer and again passed through said mask to be different from the direction of polarization of aforementioned linearly polarized light; an observing system for observing said mask and wafer from the side of said illuminating means with respect to said mask; and polarizing means, located in said observing optical system, for differentiating a light reflected by said wafer from the aforementioned linearly polarized light.
Claim 3
Dependent Claim
18 words
An apparatus according to the claim 1 wherein said reflecting surface is composed of a metallic reflecting surface.
Claim 4
Dependent Claim
16 words
An apparatus according to the claim 2 wherein said metallic reflecting surface is composed of aluminum.
Claim 5
Dependent Claim
132 words
An observing apparatus comprising: illuminating means for emitting a predetermined polarized light to illuminate a mask for manufacture of a semiconductor circuit element; a reflective imaging optical system for focusing an arc-shaped area image of said mask onto a wafer, said reflective imaging optical system including at least one phase mirror adapted for causing the state of polarization of light passed through said mask, then reflected by said wafer and again passed through said mask to be different from the state of polarization of said predetermined polarized light; an observing optical system for observing said mask and wafer from the side of said illuminating means with respect to said mask; and polarizing means, located in said observing optical system for differentiating a light reflected by said wafer from said predetermined polarized light.
Claim 6
Dependent Claim
132 words
An observing apparatus comprising: illuminating means for emitting a predetermined polarized light to illuminate a mask for manufacture of a semiconductor circuit element; a reflective imaging optical system for focusing an arc-shaped area image of said mask onto a wafer, said reflective imaging optical system including at least one phase mirror adapted for causing the state of polarization of light passed through said mask, then reflected by said wafer and again passed through said mask to be different from the state of polarization of said predetermined polarized light; an observing optical system for observing said mask and wafer from the side of said illuminating means with respect to said mask; and polarizing means, located in said observing optical system for differentiating a light reflected by said wafer from said predetermined polarized light.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-06-20 | 1986-12-20 | 1987-06-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-06-20 | 1990-12-20 | 1991-06-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-06-20 | 1994-12-20 | 1995-06-21 | $7700.00 | Window Closed / Lapsed |